晶体硅太阳电池表面纳米线阵列减反射特性研究

为增强晶体硅太阳电池的光利用率, 提高光电转换效率, 研究了硅纳米线阵列的光学散射性质. 运用严格耦合波理论对硅纳米线阵列在310—1127 nm波段的反射率进行了模拟计算, 用田口方法对硅纳米线阵列的表面传输效率进行了优化. 结果表明, 当硅纳米线阵列的周期为50 nm, 占空比为0.6, 高度约1000 nm时减反射效果最佳; 该结构在上述波段的平均反射率约为2%, 且在较大入射角度范围保持不变. 采用金属催化化学腐蚀法, 于室温、室压条件下在单晶硅表面制备周期为60 nm,占空比为0.53, 高度为500 nm的硅纳米线阵列结构, 其反射率的实验测试结果与计算模拟值相符, 在上述波段的平均反射率为4%—5%, 相对于单晶硅35%左右的反射率, 减反射效果明显. 这种减反射微结构能够在降低太阳电池成本的同时有效减小单晶硅表面的光反射损失, 提高光电转换效率.     

Degradation of flexible thin-film solar cells due to a mechanical strain

Many variants of thin film technology are nowadays part of the photovoltaic market. The most popular are amorphous silicon, CIS (Copper Indium Selenide)/CIGS (Copper Indium Gallium Selenide)/CIGSS (Copper Indium Gallium Sulphur Selenide), and CdS/CdTe (Cadmium Sulphide/Cadmium-Telluride) cells. All mentioned types allow potentially for a flexible cell structure. Most emitter contacts are currently based on TCOs (Transparent Conductive Oxides), however, wider approach with alternative carbon nanoforms, silver nanolayers and polymer materials, called TCLs (Transparent Conductive Layers) are also in use. Authors decided to investigate influence of mechanical stresses on physical and electrical behaviour of these layers. Consequently, the aim of work is to determine the level and possible mechanisms of flexible a-Si cell parameters degradation due to a deterioration of transparent contact properties.     

硅探测器的数字化脉冲形状甄别

介绍了利用硅探测器的脉冲形状甄别进行粒子鉴别的原理。详细叙述了基于数字化方法的脉冲形状甄别的实现。采样频率和位数是数字化方法的两个重要参数。对于硅探测器信号,采用100 MS/s,12 bit的Digitizer可以满足脉冲形状甄别法对时间分辨的要求。同时对该方法粒子鉴别的特征和能量阈值做了简要的分析和对比。粒子背面入射硅探测器的所得的阈值低于正面入射的情况。例如对于氖周围的同位素,背面入射情况的阈值约为100 MeV,为正面入射情况下鉴别阈值的二分之一,相当与ΔE-E方法中ΔE探测器厚度约为60 μm情况下的阈值。最后定性讨论了硅探测器的电阻率不均匀性和沟道效应对粒子鉴别性能的影响。In this paper Pulse Shape Discrimination(PSD) for silicon detector has been briefly introduced. The emerging digital method successfully applied to detector signal processing makes digital PSD method one of the most promising particle identification methods. Sampling frequency and the number of bits are two key parameters of digital method. For silicon detector signal, adopting 100 Ms/s, 12 bit Digitizer can satisfy the time resolution requirement of PSD method. The identification characteristic and energy threshold of this method have been discussed and compared with both front injection and rear injection cases. Energy threshold with rear injection usually is much lower than that with front injection. For example, around for Neon isotope energy threshold with rear injection is about 100 MeV which is only half of the threshold with front injection, also equivalent to thickness of about 60 μm silicon detector threshold in ΔE-E method. At the end the impact of silicon detector's resistivity nonuniformity and channel effect on the identification capacity of PSD method has been discussed in detail.     

氢化非晶硅薄膜退火形成的纳米硅及其光致发光

本文报道对氢化非晶硅(a-Si:H)薄膜在600～620℃温度下快速退火10s可以形成纳米晶硅(nc-Si),其Raman散射表明,在所形成的nc-Si在薄膜中的分布是随机的,直径在1.6～15nm范围内,并且在强激光辐照下观察了nc-Si在薄膜中的结晶和生长情况.经退火所形成的nc-Si可见光辐射较弱,不能检测到它们的光致发光(PL),但用氢氟酸腐蚀钝化后则可检测到较强的红PL,并且钝化后的nc-Si在空气中暴露一定的时间后,其辐射光波长产生了蓝移.文中就表面钝化和量子限制对可见光辐射的重要性作了讨论.     

Semi-quantitative study on the Staebler--Wronski effect of hydrogenated amorphous silicon films prepared with HW-ECR-CVD system

The method of numerical simulation is used to fit the relationship between the photoconductivity in films and the illumination time. The generation and process rule of kinds of different charged defect states during illumination are revealed. It is found surprisingly that the initial photoconductivity determines directly the total account of photoconductivity degradation of sample.     

Formation of Fe i –B pairs in silicon at high temperatures

We report on the detection of Fe _i –B pairs in heavily B doped silicon using ⁵⁷Fe emission Mössbauer spectroscopy following implantation of radioactive ⁵⁷Mn⁺ parent ions (T _1/2?=?1.5 min) at elevated temperatures >?850 K. The Fe _i –B pairs are formed upon the dissociation of Fe _i –V pairs during the lifetime of the Mössbauer state (T _1/2?=?100 ns). The resulting free interstitial Fe_i diffuses over sufficiently large distances during the lifetime of the Mössbauer state to encounter a substitutional B impurity atom, forming Fe _i –B pairs, which are stable up to ～1,050 K on that time scale.     

Surface plasmon enhanced light emission of silicon-rich silicon nitride: Dependence on metal island size

Surface plasmon coupled light emission of silicon-rich silicon nitride (SRSN) was investigated as a function of metal island size. It was found that the emission intensity was enhanced by surface plasmon (SP) and the enhancement factors increase greatly with the increase of metal island size. Moreover, SP coupled emission spectral shape was found also correlating with Ag island size. By calculating the extinction characteristics of the Ag islands, it was believed that SP scattering and absorption efficiency of the metal islands decide the photoluminescence (PL) changes including emission intensity enhancement and band position shift.     

基于静力悬浮原理的单晶硅球间微量密度差异精密测量方法研究

单晶硅球间微量密度差异测量是阿伏伽德罗常数量子基准定义的重要研究内容, 也是半导体产业中高纯度单晶硅制备工艺质量控制的主要方法. 为了改善现有非接触相移干涉法测量装置复杂和静力称重法测量不确定度低的特点, 根据单晶硅密度精密测量需要, 实现了一种基于静力悬浮原理的单晶硅球密度相对参比测量方法. 通过改变静压力和温度进行三溴丙烷和二溴乙烷混合液体密度的微量调节, 分别使两个待测单晶硅球在液体中悬浮, 根据悬浮状态时的液体温度和悬浮高度计算出待测单晶硅球密度差值. 通过双循环水浴和PID温度控制系统实现±100 μK的恒温液体测量环境. 通过图像识别和迭代拟合算法实现单晶硅球悬浮高度的测量. 使用PID静压力控制系统实现单晶硅球的稳定悬浮控制, 同时减少Joule-Thomson效应引起的液体温度改变. 利用静力悬浮模型中的温度变化和静压力变化线性关系准确测量出标准液体的压缩系数. 试验结果表明, 这种测量方法可以避免液体液面张力的影响, 测量相对标准不确定度达到2.1×10^-7, 能够实现单晶硅球密度差值的精密测量.     

单晶硅薄膜法向热导率分子动力学研究

采用非平衡分子动力学方法（NEMD）研究了平均温度为 500K、厚度为 2～32nm的单晶硅薄膜的法向热导率。模拟结果表明,薄膜热导率显著低于对应温度下的体硅单晶的实验值,并随膜厚度减小以接近线性的规律减小。用声子气动力论模型的分析结果与NEMD模拟相一致,表明纳米单晶硅薄膜中声子平均自由程显著减小。