等离子体浸没注入超低能注入掺杂研究

A plasma immersion ion implantation(PIII) system based on inductively coupled plasma(ICP) technology was designed. The PIII system had a cylindrical chamber, and a radio frequency(RF) power was used to sustain discharge and a pulsed voltage source was provided to bias the wafer. The RF power was coupled into chamber by a non-coplanar two-turn circular structure coil. A Langmuir probe was connected to the PIII system to diagnose the plasma parameters. The probe diagnosis indicated that plasma ion density of the system achieves 10¹⁷m^-3, the uniformity of the ion density along radial direction achieves 3.53%. Boron (B) and phosphorus (P) doping experiments were performed on the system. Results from second ion mass spectrum (SIMS) tests showed that the measured injection depth is about 10nm and the shallowest is 8.6 nm (at 10¹⁸cm^-3), the peak ion concentration is below the surface of the wafer, and the ion dose reaches above10¹⁵cm^-2 and the abrupt 2.5 nm/decade.     

CP~n中具有循环调和序列的平坦极小环面

研究具有循环调和序列的平坦极小浸入ψ:T2→CPn。证明了存在T2的一个有限覆盖p:T2→T2和一个全迷向的平坦极小浸入φ:T2→CPn使得ψ。p=A。φ,其中A:CPn→CPn:[v]→[vA]是线性全纯同胚。     

到欧氏空间的等距极小浸入

本文研究了欧氏空间极小子流形的测地球的体积增长,给出了一个黎曼流形可等距极小浸入到欧氏空间的一个必要条件,并给出了具非正截曲率的欧氏空间极小超曲面的一个分类．     

用于浸没式工艺的光刻胶研究进展

浸没式光刻技术是在原干法光刻的基础上采用高折射率浸没液体取代原来空气的空间,从而提高光刻分辨率的一种先进技术.此项技术的实际应用,为当前IC产业的飞速发展起到了关键的作用.本文概述了浸没式光刻技术的发展历程和浸没式光刻胶遇到的挑战及要求;对浸没式光刻胶主体树脂、光致产酸剂及添加剂的研究进展进行了综述;最后对浸没式光刻胶的研究发展方向作了进一步的探讨及初步预测.     

关于Udo Simon猜测的注记

设ψ:S2→Sn为线性满的极小浸入,Gauss曲率K满足1/10≤K≤1/6。若K不是常数,则n=6,且ψ的准线φ0至少有2个不同的分歧点。作为它的推论,如果1/7相似文献   

乐山泥岩的水土曲线和崩解特征试验研究

红层软岩的崩解性引发显著的软岩风化破裂现象,经常导致坡体不稳定、岩石崩落等不良地质现象。为深入理解泥岩的水土特征曲线（soil and water characteristic curve,SWCC）和浸水崩解特征,以乐山红层泥岩为例,采用滤纸法、浸水法等试验方法系统研究了泥岩的SWCC以及其在水中崩解的特征,构建了适合于该地区的SWCC模型,并讨论了浸水时间对泥岩崩解质量、颗粒级配的影响。结果表明：（1）泥岩的SWCC呈单峰曲线,随着含水率的减少,基质吸力增大。（2）通过与4种典型率定曲线的拟合比较,基质吸力拟合结果表现出良好的相关性（R²≥92%）,其中Fredlund &; Xing模型能够更准确地反映该地区泥岩的SWCC（R²=96%）。（3）浸水试验表明,0~6 h为快速崩解期,6~12 h为慢速崩解期,12 h后为长期崩解期。干湿交替浸水可以加速泥岩在亲水初期的崩解速率,但在最终崩解量方面与持续浸水基本一致。（4）浸水崩解后,颗粒粒径变化主要集中在2～20 mm范围内,级配曲线D₆₀,D₃₀,D₁₀和C_u值随着浸水时间的增大而减少,表明泥岩颗粒粒径随时间逐渐减小。（5）该泥岩耐崩解指数拟合公式为${y}$=1.17e^–0.22x,拟合度良好（R²≥99%）,根据I_d2=0.76判断该地区泥岩崩解性为弱~中等崩解性。该成果可为该地区泥岩的水土特性和崩解特性提供重要的定量数据支持,以及为该地区工程建设提供理论依据。

     

阴极透镜层流电子枪调制特性

通过求解第一类边界条件的拉普拉斯方程,获得了典型的三电极阴极透镜中轴上电位的解析表达式。以此为基础,分析了阴极透镜各几何参数及电位参数对其聚焦性能的影响,得知通过增大调制极电位或其孔径、增加调制极与加速极的间距或缩小调制极与阴极的间距的方法,可以保证在改善初始粒子时间、空间弥散特性的基础上,相对减小轴向电场的非均匀性以减弱其会聚电场强度,从而使带电粒子束在阴极透镜区域中不能形成交叠点,达到构成其中电子运动具有层流性质的阴极透镜层流电子枪的工程应用目的。另外也获得了采用厚度较小的调制极有助于整个电子光学系统性能优化的结论。     

Plasma‐Activated Substrate with a Tropoelastin Anchor for the Maintenance and Delivery of Multipotent Adult Progenitor Cells

Conventional wound therapy utilizes wound coverage to prevent infection, trauma, and fluid and thermal loss. However, this approach is often inadequate for large and/or chronic wounds, which require active intervention via therapeutic cells to promote healing. To address this need, a patch which delivers multipotent adult progenitor cells (MAPCs) is developed. Medical‐grade polyurethane (PU) films are modified using plasma immersion ion implantation (PIII), which creates a radical‐rich layer capable of rapidly and covalently attaching biomolecules. It is demonstrated that a short treatment duration of 400 s maximizes surface activation and wettability, minimizes reduction in gas permeability, and preserves the hydrolytic resistance of the PU film. The reactivity of PIII‐treated PU is utilized to immobilize the extracellular matrix protein tropoelastin in a functional conformation that stably withstands medical‐grade ethylene oxide sterilization. The PIII‐treated tropoelastin‐functionalized patch significantly promotes MAPC adhesion and proliferation over standard PU, while fully maintaining cell phenotype. Topical application of the MAPC‐seeded patch transfers cells to a human skin model, while undelivered MAPCs repopulate the patch surface for subsequent cell transfer. The potential of this new wound patch as a reservoir for the sustained delivery of therapeutic MAPCs and cell‐secreted factors for large and/or non‐healing wounds is indicated in the findings.     

How a minimal surface leaves a thin obstacle

We prove the optimal regularity and a detailed analysis of the free boundary of the solutions to the thin obstacle problem for nonparametric minimal surfaces with flat obstacles.