磁场增强大气压等离子体射流对镍钴合金泡沫的表面改性

用磁场增强大气压等离子体射流（APPJ）限域改性镍钴合金泡沫（NCF）,并在纯水中原位生长镍钴氢氧化物(NiCo（OH）2),探讨等离子体射流对氢氧化物纳米材料电催化性能的影响。结果表明：磁场可有效提高APPJ改性位置的放电强度和活性粒子浓度,提升镍钴氢氧化物纳米晶核的形成密度,加速后续纯水中氢氧化物生长速度。此外,氧化物纳米六方体镶嵌在纳米片边缘,有利于增强电催化稳定性。制备的MOx-M（OH）2/PMNCF电极材料在碱性溶液中(1 mol·L-1 KOH)传递析氢（HER）析氧（OER）电流密度为100 mA·cm-2时,过电位分别为248和385 mV,优于其他化学法制备的同类材料。本文为过渡金属化合物电催化材料的绿色构建提供了一种新方法。     

ZnO-Si不同退火条件对生长ZnSe薄膜的影响

研究了作为缓冲层的ZnO薄膜在不同的退火时间、退火温度下退火对Si衬底上生长ZnSe膜质量的影响。当溅射有ZnO膜的Si(111)衬底的退火条件变化时，从X射线衍射谱（XRD）和光致发光谱（PL）中可见，ZnSe(111)膜的晶体质量有较大的变化。变温的PL谱表明，Si衬底上生长的具有ZnO缓冲层的ZnSe膜的近带边发射峰起源于自由激子发射。     

非晶氧化钛薄膜形成过程中钛离子能量对表面结构影响的机理

研究了非晶氧化钛薄膜沉积过程中入射钛离子能量对表面结构形成机理以及薄膜特性的影响.模拟结果表明,通过提高入射钛离子能量,可以有效降低成膜表面粗糙度,从而减小薄膜表面的光学散射损耗.研究发现,当入射离子能量提高后,薄膜生长模式从"岛"状生长过渡到了"层"状生长,且离子入射点附近的平均扩散系数也有显著增加,这有利于形成更加平整的高质量薄膜表面.     

He-Ne激光诱变的香菇变异株遗传稳定性分析

对三株香菇菌种采用He-Ne激光(λ=6328nm)进行两次照射,筛选出三株比出发菌株菌丝生长速率分别提高173%、737%和426%的变异株,经传代培养及酯酶同工酶谱分析,变异株具有良好的遗传稳定性表明激光作为微生物新型诱变因子与传统化因子相比,具有正变率高、回复突变率低、遗传稳定性好的特点.     

EACVD中用氢原子谱线测定电子平均能量

采用蒙特卡罗方法，对EACVD中氢原子的发射过程进行了模拟。给出了由氢原子谱线测定电子平均能量的方法，结果对EACVD生长金刚石薄膜过程中实时监测电子平均能量，进而可以有效地控制工艺条件，生长出高质量的金刚石薄膜具有重要意义。     

Nano-Crystalline Diamond Films with Pineapple-Like Morphology Grown by the DC Arcjet vapor Deposition Method

A nano-crystlline diamond film is grown by the dc arcjet chemical vapor deposition method. The film is characterized by scanning electron microscopy, high-resolution transmission electron microscopy （HRTEM）, x-ray diffraction （XRD） and Ftaman spectra, respectively. The nanocrystalline grains are averagely with 80hm in the size measured by XRD, and further proven by Raman and HRTEM. The observed novel morphology of the growth surface, pineapple-like morphology, is constructed by cubo-octahedral growth zones with a smooth faceted top surface and coarse side surfaces. The as-grown film possesses （100） dominant surface containing a little amorphous sp2 component, which is far different from the nano-crystalline film with the usual cauliflower-like morphology.     

A MOCVD-Growth Multi-Wavelength Laser Monolithically Integrated on InP

We present an arrayed waveguide grating multi-wavelength laser （MWL）. The device is operated with five wave- length channels of 194 GHz spacing around a central wavelength of 1.57μm. A side mode suppression ratio of better than 35 dB for all channels is demonstrated. A very attractive feature of the MWL is that it has been realized by a novel one step regrowth approach to achieve a high quality active and passive interface.     

N型4H-SiC同质外延生长

利用水平式低压热壁CVD (LP-HW-CVD) 生长系统,台阶控制生长和衬底旋转等优化技术,在偏晶向的4H-SiC Si(0001) 晶面衬底上进行4H-SiC同质外延生长,生长温度和压力分别为1550℃和10⁴ Pa,用高纯N₂作为n型掺杂剂的4H-SiC原位掺杂技术,生长速率控制在5μm/h左右.采用扫描电镜(SEM)、原子力显微镜(AFM),傅里叶变换红外光谱(FTIR)和Hg/4H-SiC肖特基结构对同质外延表面形貌、厚度、掺杂浓度以及均匀性进行了测试.实验结果表明,4H-SiC同质外延在表面无明显缺陷,厚度均匀性1.74%, 1.99% 和1.32%(σ/mean),掺杂浓度均匀性为3.37%,2.39%和2.01%.同种工艺条件下,样品间的厚度和掺杂浓度误差为1.54%和3.63%,有很好的工艺可靠性. 关键词： 4H-SiC 同质外延生长 水平热壁CVD 均匀性     

Improved crystal quality of GaN film with the in-plane lattice-matched Ino.17Alo.s3N interlayer grown on sapphire substrate using pulsed metal-organic chemical vapor deposition

We report on an improvement in the crystal quality of GaN film with an Ino.17Alo.83N interlayer grown by pulsed metal-organic chemical vapor deposition, which is in-plane lattice-matched to GaN films. The indium composition of about 17% and the reductions of both screw and edge threading dislocations （TDs） in GaN film with the InA1N interlayer are estimated by high resolution X-ray diffraction. Transmission electron microscopy （TEM） measurements are employed to understand the mechanism of reduction in TD density. Raman and photoluminescence measurements indicate that the InA1N interlayer can improve the crystal quality of GaN film, and verify that there is no additional residual stress induced into the GaN film with InA1N interlayer. Atomic force microscopy measurement shows that the InA1N interlayer brings in a smooth surface morphology of GaN film. All the results show that the insertion of the InA1N interlayer is a convenient method to achieve excellent crystal quality in GaN epitaxy.     

薄膜生长荧光显微图像实时采集与分析系统

设计了一套具有一定实用意义和科学价值的薄膜生长荧光显微图像实时采集与分析系统,可以实现透明衬底上有机荧光分子薄膜生长的实时原位监测。进一步阐明了系统的硬件构筑思路和软件设计架构,并依据薄膜的形貌特征,给出8个主要生长信息参数及其求取算法,并利用自行搭建的实验系统,针对联六苯(p-6P)分子在云母衬底上的纳米纤维生长过程,得出了其准一维的线性生长规律。该系统作为重要的薄膜生长成像监测技术,有望在薄膜与衬底表面相互作用和衬底微区结构特性研究等方面起到积极的作用。