氧化锌/硅纳米孔柱阵列的结构和光致发光特性研究

以硅纳米孔柱阵列(Si-NPA)为衬底、用化学气相沉积法制备了具有规则阵列结构特征的ZnO/Si-NPA纳米复合体系，并对其结构和光致发光性质进行了表征. 实验结果显示，组成ZnO/Si-NPA表面阵列的每个柱子均呈现层壳结构. 不同于衬底Si-NPA的红光和蓝光发射，ZnO/Si-NPA在紫外光区和蓝绿光区呈现出两个强的宽发光峰. 分析表明，紫外光发射应归因于ZnO晶体的带边激子跃迁；而蓝绿光发射则来自于ZnO晶体本征缺陷所形成的两类深能级复合中心上载流子的辐射跃迁.     

铕配合物Eu( UVA)3Phen与PVK掺杂体系发光特性的研究

将一种新型稀土铕配合物Eu(UVA)3 Phen作为掺杂剂与基质PVK按不同质量比进行掺杂,对混合薄膜的光致发光(PL)和电致发光(EL)特性进行了研究.实验结果表明,共掺杂体系中存在从PVK到Eu(UVA)3 Phen的F(o)rster能量传递.通过优化主客体材料的配比浓度,当掺杂浓度为4％时,得到了色纯度较好地红...     

应力导致InAs/In0.15Ga0.85As量子点结构中 In0.15Ga0.85As阱层的合金分解效应研究

利用固源分子束外延技术,在In0.15Ga0.85As/GaAs量子阱生长了两个InAs/In0.15Ga0.85As量子点(DWELL)样品.通过改变其中一个InAs DWELL样品中的In0.15Ga0.85As阱层的厚度和生长温度,获得了量子点尺寸增大而且尺寸分布更均匀的结果.结合光致发光光谱(PL)和压电调制光谱(PzR)实验结果,发现该样品量子点的光学性质也同时得到了极大的优化.基于有效质量近似的数值计算结果表明:量子点后生长过程中应力导致In0.15Ga0.85As阱层合金分解机理是导致量子点尺寸和光学性质得到优化的主要原因.     

Photoinduced Resistance Change in an Oxygen-Deficient La 0.9 Sr 0.1 MnO 3-δ Thin Film

Photoinduced resistance change （ △ R/R） in an oxygen-deficient La0.9Sr0.1MnO3-δ thin film is studied. At room temperature, the resistance change of about 30% and response time of about 75 ns are observed under the illumination with a 532nm laser pulse of 7ns and light power of 750mW. It is also found that △ R/R changes with the light power. The phenomena are explained in terms of the photoinduced hole carriers and localized insulator-to-metal transition, which may have potential applications in optoelectronic devices.     

Photoluminescence Property of Co3O4 Nanowires

Co3O4 nanowire arrays are fabricated by electrodeposition with following heat-treatment in atmosphere ambient. Photoluminescence is investigated at 295K. In the experiment, when increasing the excitation light wavelength from 260 nm to 360 nm, two kinds of emissions corresponding to the increasing excitation light wavelength are observed. One of them alters the excited emission position, another keeps its emission position. The distinct behaviour of excited emissions related to the increasing excitation wavelength indicates that the mechanism of them must be different. According to the experimental comparison and first-principle calculation, the two kinds of emissions are discussed.     

Low-dimensional structures formed by irradiation of laser

Some kinds of low-dimensional nanostructures can be formed by irradiation of laser on the pure silicon sample and the SiGe alloy sample. This paper has studied the photoluminescence (PL) of the hole-net structure of silicon and the porous structure of SiGe where the PL intensity at 706nm and 725nm wavelength increases obviously. The effect of intensity-enhancing in the PL peaks cannot be explained within the quantum confinement alone. A mechanism for increasing PL emission in the above structures is proposed, in which the trap states of the interface between SiO₂ and nanocrystal play an important role.     

锗酸锌锰荧光体发光学与荧光瞬态衰减研究

制备一系列锗酸锌锰荧光体,并探讨其发光特性、瞬态荧光衰减与色度值与所掺杂锰离子含量之间的相互关系.本系列荧光体锰离子发射峰波长,随Mn²⁺含量由0增加0.05,由527nm红移至534nm.实验表明这可能与Mn²⁺所占据的四面体格位,遭扭曲而导致晶场强度变弱有关.本系列荧光体的CIE色度坐标值,则随所掺杂Mn²⁺含量,仅有微小改变.锗酸锌锰荧光体瞬态荧光衰减的研究结果表明:锗酸锌基质的衰减生命期在纳秒范围;随Mn²⁺掺杂量增加,在毫秒范围的锰离子荧光衰减生命期逐渐缩短.此现象可能与Mn²⁺-Mn²⁺离子对中,Mn²⁺的自旋交换相互作用有密切关系.     

多孔氧化铝模板制备ZnS纳米线阵列及其光致发光谱

利用阳极氧化铝（AAO）模板,采用电化学沉积方法制备出了ZnS纳米线阵列。扫描电子显微镜（SEM）结果显示,AAO模板孔洞分布均匀,孔径基本一致（约50nm）,孔口呈六边形。TEM结果显示硫化锌纳米线的直径约50nm（与AAM模板孔径一致）,长度约为20μm（与AAM模板厚度一致）。电子衍射结果表明ZnS纳米线为多晶结构。比较了AAO模板组装ZnS纳米线阵列前后的光致发光谱,所得光谱显示,组装了ZnS纳米线阵列的模板的光致发光谱比没有组装的空模板相比多出两个发射峰,分别位于409,430nm,且其发光强度随激发波长的增长而增强。解谱分析表明,这即为ZnS纳米线阵列的发光光谱的两个发射峰,是由导带与受主能级间的跃迁发光和施主与受主能级间的复合跃迁发光共同作用所致。发现由于纳米线尺寸的单一性,发射峰窄化明显,半峰全宽较小,这种现象在其他文献中未曾报道过。     

SiC衬底上异质外延GaN薄膜结构缺陷对黄光辐射的影响

利用光致发光技术对在SiC衬底上采用MOCVD异质外延未故意掺杂的GaN进行发光特性的研究,发现在室温下有很强的黄光输出,同时,采用扫描电子显微术和X光衍射对样品的表面形貌和结构进行了研究,结果发现,随着缺陷密度的减少,黄光输出强度也有所降低,因此,黄光输出强度与缺陷有很大的关系.     

Modified Photoluminescence by Silicon-Based One-Dimensional Photonic Crystal Microcavities

photoluminescence (PL) lrom one-dimensional photonic band structures is investigated. The doped photonic crystal with microcavitles are fabricated by using alternating hydrogenated amorphous silicon nitride (a-SiNx:H/a-SiNy:H) layers in a plasma enhanced chemical vapour deposition (PECVD) chamber. It is observed that microcavities strongly modify the PL spectra from active hydrogenated amorphous silicon nitride (a-SiNx:H) thin film. By comparison, the wide emission band width 208nm is strongly narrowed to 11 nm, and the resonant enhancement of the peak PL intensity is about two orders of magnitude with respect to the emission of the λ/2-thick layer of a-SiNx:H. A linewidth of Δλ=11 nm and a quality factor of Q=69 are achieved in our one-dimensional a-SiNz photonic crystal microcavities. Measurements of transmittance spectra of the as-grown samples show that the transmittance resonant peak of a cavity mode at 710nm is introduced into the band gap of one-dimensional photonic crystal distributed Bragg reflector (DBR), which further verifies the microcavity effects.