Physicochemical Studies of the Sea-Surface Microlayer

In physicochemical studies on the sea-surface microlayer (SML) in seawater, the main researches conducted were as follows: (1) It was found that there is an objective layer of sudden change in physical and chemical properties between the SML and the subsurface layer in seawater. (2) The SML thickness was determined and should be about 50±10 μm. (3) The Gibbs model of the SML was extended, and the multilayer model of the SML was advanced. (4) The original-location method, which corresponds with the traditional removal-location method, was founded and used to determine the SML thickness. The results obtained from the two methods were almost identical. (5) An abnormal phenomenon was found when the Gibbs solution adsorption was applied to the seawater system, the reason for which was discussed preliminarily.     

类Ne钛X射线激光输出特性实验

 在星光激光装置上, 使用X射线多层膜反射镜、铝滤片及X射线CCD探测器组成高灵敏度空间分辨探测系统, 对用预脉冲技术产生的类Ne钛单线 (J=0-1, 3p-3s跃迁)软X射线激光输出特性进行了测量。由实验得到了类Ne钛X 射线激光束近场与距靶端32mm处(准远场)强度的空间分布, 给出了该激光束在近场强度最大区域的空间尺度(FWHM)约为72μm×31μm, 以及在垂直靶面与平行靶面方向的束发散角分别约为4mrad与9mrad。     

Rheological properties and interfacial slip of a multilayer structure under dynamic shear

Interfacial slip between polymer melt under steady shear has been studied using a simplified multilayer structure. In this investigation, interfacial slip under dynamic shear was studied by calculating the angular displacements of the multilayer structure and its component layers. On the basis of the angular displacements, a slip index was defined to quantify the degree of interfacial slip. A relationship governing the rheological behavior of the multilayer structure under slip and nonslip condition was established. These results were correlated with equations derived from consideration of energy equilibrium in the multilayer structure. Polymer multilayer structures of high‐density polyethylene/polystyrene and liquid crystal polymer(LCP)/poly ethylene naphthalate(PEN) were investigated. Of all the polymers investigated, large interfacial slip was found at LCP/PEN interface under dynamic shear. The high rigidity and alignment along the interface of LCP molecules was believed to prevent chain entanglement in the interfacial layer and therefore promote interfacial slip at the interface. © 2005 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 43: 2683–2693, 2005     

北京同步辐射软X光反射率计装置及其物理工作

介绍了安装在北京同步辐射装置上专门用于软X光多层膜研究的反射率计系统,给出了在该装置上测量得到的Al滤光片的软X光透射谱和Nb/Si多层膜的高角反射谱,用磁控溅射方法自制的Nb/Si多层膜样品在17.59um附近得到的反射率为32%.     

电磁波在多层介质内的透射

导了多层介质中透射电磁波的电场振幅与介质表面入射电磁波场电场振幅之间的关系式，引入了一个母函数，通过微分可以生成介质各层中的透射波。     

Combined EPMA and AES depth profiling of a multilayer Ti-Al-O-N coating

In order to compare thin-film electron probe microanalysis (EPMA) and Auger electron spectroscopy (AES) regarding reliability in quantifying chemical compositions of Ti-Al-O-N coatings with depth, a multilayer was prepared on a silicon wafer by using reactive ionized cluster beam deposition technique. Within a total thickness of about 25 nm the composition of the multilayer varied step by step from Ti-Al-O-N at the bottom to Al-O at the top. AES and, as an innovation, EPMA crater edge profiling was applied to measure the composition with depth. For quantification special thin-film EPMA techniques based on Monte Carlo simulations were applied. The chemical binding states of Al and Ti with depth were analysed using a high resolution energy analyser (MAC 3) for the AES investigations working in the direct mode. According to the deposition procedure the concentration profiles of the components varied with depth for both AES and EPMA measurements. AES provided a better depth resolution than EPMA. To get a true calibration of the depth scale an in-situ measurement method like an optical interferometry will be required. Assuming that the relative sensitivity factors are available AES depth profiling delivers concentration profiles with good accuracy. The new EPMA application provided quantitative depth profiles concerning concentration and coverage. For EPMA crater edge profiling the coating needs to be deposited on a foreign substrate because depth distributions of elements being present in both the layer and the substrate cannot be resolved.The combination of AES-depth profiling with EPMA crater edge profiling techniques is a powerful tool to analyse heterostructures quantitatively.     

NONLINEAR THEORY OF MULTILAYER SANDWICH SHELLS AND ITS APPLICATION(III)──LARGE DEFLECTION AND POSTBUCKLING OF SHALLOW SHELLS

Exactsolutionsoflargedeflectionandpostbucklingofrectangularplatesaredifficultproblems.Usually,appropriateseriesofsolutionsbasedonspecificboundaryareassumedtosolvetheproblems['].LiuandChengl'lsolvedthenonlinearbendingproblemofsimplysuPPortedrectangularsand…     

北京同步辐射装置X射线漫散射实验站及准周期非晶多层膜的X射线非镜面散射研究

讨论了北京同步辐射装置的４Ｗ１Ｃ光束线和Ｘ射线漫散射实验站的技术特点．利用在漫散射实验站上获得的能量分辨率为４．４×１０－４、光斑大小为０．５ｍｍ（水平）×０．３ｍｍ（垂直）的聚焦单色Ｘ射线光束，研究了准周期非晶多层膜的Ｘ射线漫散射──非镜面散射．实验结果表明，准周期多层膜的漫散射强度分布在倒空间中与表面平行的条纹上并形成散射强度的调制．对散射强度调制进行的模拟计算得到相当满意的结果．     

用二维时域有限差分法分析条形多层波导

为精确分析条形多层波导和多量子阱波导，本文提出了一种以二维时 限差分法为基础的全波数值方法，给出了场分布的色散特性的数值结果，并与矢量有限元法已有的结果作了比较；文中还研究了以二维时域有限差分法为基础的标量近似技术，提出了它的有效性和精度的局限性。     

基于Si-rich SiNx/N-rich SiNy多层膜结构的量子点构筑及发光特性

利用等离子体增强化学气相沉积法制备Si-rich SiN_x/N-rich SiN_y多层膜,分别使用热退火和激光辐照技术对多层膜进行退火,以构筑三维限制、尺寸可控、有序的硅纳米晶.实验结果表明,经退火后,纳米硅晶粒在Si-rich SiN_x子层内形成,其尺寸可由Si-rich SiN_x子层厚度调控.实验还发现,激光辐照技术相比于热退火能更有效地改善多层膜的微结构,提高多层膜的晶化率,以激光技术诱导晶化的Si-rich SiN_x/N-rich SiN_y多层膜作为有源层构建电致发光器件,在室温下观察到了增强的电致可见发光,并且发光效率较退火前提高了40%以上. 关键词： 氮化硅 多层膜 限制结晶 纳米晶硅