全剥离离子94mRu44+的衰变研究

在兰州重离子加速器冷却储存环（HIRFL-CSR）上,用等时性质量谱仪首次研究了百微秒量级全剥离离子94mRu44+的衰变。94mRu44+由初级束流112Sn轰击Be靶产生,经过放射性束流线RIBLL2的筛选后注入到等时性设置的实验环CSRe中,并利用安装在实验环中的飞行时间探测器测量离子在CSRe中的循环周期。94mRu44+退激引起的质量改变会带来其循环周期的变化,由此直接观测到了94mRu44+退激到基态的过程。确定了本次实验中衰变事例探测的灵敏区间,并讨论了衰变发生时刻的测量精度。同时,测量了短寿命核素94mRu44+的质量,其半衰期约为100 μs,这是目前储存环质量谱仪测量的最短寿命核素的质量。The decay of the fully stripped ion 94mRu44+ in the order of one hundred microseconds has been studied for the first time by using the Isochronous Mass Spectrometry (IMS) at the HIRFL-CSR facility in Lanzhou. 94mRu44+ was produced via projectile fragmentation of a 112Sn primary beam bombarding on a 9Be production target. After the in-flight separation with RIBLL2, the ions were injected into the experimental ring (CSRe) and then stored there. The revolution times of the stored ions were measured by a Time-of-Flight (TOF) detector. Due to the mass change of a 94mRu44+ ion caused by its de-excitation to the ground state, hence the revolution time change, the decay process of 94mRu44+ could be directly observed in the CSRe. The sensitive window for detection of the decay events and the measurement precision of the decay time have been determined in this work. At the same time, we measured the mass of short-lived 94mRu44+ with the half-life about one hundred microseconds, which is the shortest among nuclides that have been studied by using storage-ring mass-spectrometry.     

退火处理ZnPc(OC_8H_(17)OPyCH_3I)_8阴极缓冲层的倒置有机太阳能电池

制备了以Zn Pc(OC8H17OPy CH3I)8为阴极缓冲层、P3HT∶PCBM为有源层的有机太阳能电池。对阴极缓冲层Zn Pc(OC8H17OPy CH3I)8薄膜分别进行了溶剂蒸汽退火和过渡舱惰性气体流退火处理,并利用原子力显微镜(AFM)对缓冲层表面形貌进行了表征。结果表明:这两种退火方法都使缓冲层形貌得以改善。电池效率从2.14%提高到3.76%,电流密度从8.12 m A/cm2提高到10.71 m A/cm2,填充因子从0.45提高到0.61。与传统器件相比,退火处理的阴极缓冲层器件的稳定性也得到了改善,器件寿命延长了1.4倍。这种简单阴极界面处理方法为改善聚合物太阳能电池性能提供了有效途径。     

退火对ZnO薄膜光学特性的影响

用射频磁控溅射法在蓝宝石衬底上制备出ZnO薄膜,通过X射线衍射(XRD)、扫描电镜(SEM)和光致发光(PL)谱等研究了退火温度对ZnO薄膜结构和光学性质的影响。测量结果显示,所制备的ZnO薄膜为六角纤锌矿结构,具有沿c轴的择优取向;随着退火温度的升高,(002)XRD峰强度和平均晶粒尺寸增大,(002)XRD峰半高宽(FWHM)减小,光致发光紫外峰强度增强。结果证明,用射频磁控溅射法通过适当控制退火温度可得到高质量ZnO薄膜。     

Reliability analysis of GaN-based light emitting diodes for solid state illumination

In this paper, we have discussed the effect of electrical stress on GaN light emitting diode （LED）. With the lapse of time, the LED with an applied large current stress can reduce its current more than without such a stress under a large forward-voltage drop. Its scanning electron microscopy （SEM） image shows that there exist several pits on the surface of the p-metal. With an electrical stress applied, the number of pits greatly increases. We also find that the degradation of GaN LED is related to the oxidized Ni/Au ohmic contact to p-GaN. The electrical activation of H-passivated Mg acceptors is described in detail. Annealing is performed in ambient air for 10 min and the differential resistances at a forward-voltage drop of 5 V are taken to evaluate the activation of the Mg acceptors. These results suggest some mechanisms of degradation responsible for these phenomena, which are described in the paper.     

Influences of SiO2 protective layers and annealing on the laser-induced damage threshold of Ta2O5 films

Ta2O5 films are prepared on BK7 substrates with conventional electron beam evaporation deposition.The effects of SiO2 protective layers and annealing on the laser-induced damage threshold (LIDT) of the films are investigated.The results show that SiO2 protective layers exert little influence on the electric field intensity(EFI)distribution,microstructure and microdefect density but increase the absorption slightly.Annealing iS effective on decreasing the microdefect density and the absorption of the films.Both SiO2 protective layers and annealing are beneficial to the damage resistance of the films and the latter is more effective to improve the LIDT.Moreover,the maximal LIDT of Ta2O5 films is achieved by the combination of SiO2 protective layers and annealing.     

热退火、激光束和电子束等作用对纳米硅制备及其局域态发光特性的影响

在纳米晶体硅制备的过程中, 晶化处理是影响和提高纳米硅发光效率的重要制备环节. 热退火、激光退火和电子束辐照是使纳米硅样品晶化的不同方式. 实验表明: 选取适当的晶化方式和参量对制备纳米硅晶体结构至关重要, 特别是在制备硅量子点和量子面的过程中控制好参量, 可以得到较高的发光效率. 有趣的是, 在实验中发现: 当晶化时间较短(如低于20 min)时, 可以获得较好的纳晶硅结构(如量子点结构), 对应于较好的纳晶硅光致发光(PL)和掺杂局域态发光; 当晶化时间较长(如超过30 min)时, 纳米晶体硅结构被破坏, 致使PL谱逐渐减弱与消失. 结合热退火、激光退火和电子束辐照对纳米硅晶化过程, 本文建立起晶化时间对纳米硅局域态发光影响机理的物理模型, 解释了晶化时间对纳米硅局域态发光的影响.     

非晶态Cu_(56)Zr_(44)合金的结构及其等温退火晶化过程的研究

利用X射线衍射技术、差示扫描量热分析技术和透射电子显微镜研究了非晶态Cu56 Zr4 4合金的结构及其等温退火条件下的晶化过程 .实验结果表明 ,非晶态Cu56 Zr4 4合金在室温下的短程结构类似于硬球无规密堆积分布 .在70 3K过冷液相区内等温退火时发现 ,当退火时间为 3min时 ,晶化产物主要为Cu8Zr3相 ;当退火时间为 6min时 ,Cu8Zr3相完全消失 ,而Cu1 0 Zr7相大量析出 ;当退火时间达到 3 0min以上时 ,其晶化产物转变为Cu1 0 Zr7,CuZr2 ,Cu8Zr3等多种化合物 .由此提出了非晶态Cu56 Zr4 4合金等温退火晶化过程的扩散机理 .     

a-Si∶O∶H薄膜微结构及其高温退火行为研究

以微区Raman散射、X射线光电子能谱和红外吸收对等离子体增强化学气相沉积(PECVD)法制备的氢化非晶硅氧(a-Si∶O∶H)薄膜微结构及其退火行为进行了细致研究.结果表明a-Si∶O∶H薄膜具有明显的相分离结构,富Si相镶嵌于富O相之中,其中富Si相为非氢化四面体结构形式的非晶硅(a-Si),富O相为Si,O,H三种原子随机键合形成的SiO_x∶H(x≈1.35).经1150℃高温退火,薄膜中的H全部释出;SiO_x∶H(x≈1.35)介质在析出部分Si原子的同     

Photoluminescence of InP:Zn

Photoluminescence spectra of diffusion layers of zinc-doped indium phosphide were investigated. A study was made of diffusion layers obtained in different regimes. A diffusion process was conducted for 30 and 60 min at temperatures of 450–500°C. The photoluminescence spectra consisted of bands with E₁=1.145 eV, E₂=1.37 eV, E₃=1.345 eV, E₄=1.15 eV. Photoluminescence was measured at 77 K upon excitation by laser radiation at 0.44 μm. An analysis is made of the regularities of the change in the spectral dependences for samples with different prehistories by using layer-by-layer etching as well as of the change in the integral Zn activation energy for different temperatures of postdiffusion annealing. Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 64, No. 1, pp. 125–128, January–February, 1997.     

Layered blind deconvolution using subband filter banks

A blind deconvolution method using the concept of subband filter banks has been proposed. This method makes possible the speedy convergence of solution, due to estimation of supports of the reconstructed images by a deconvolution in the lower layer. We apply the method to blind deconvolution by a simulated annealing algorithm and confirm its usefulness. Presented at 1996 International Topical Meeting on Optical Computing (OC’96), April 21–25, Sendai, Japan.