过渡金属原子掺杂对单层MoS_2磁性的影响

本文利用基于密度泛函理论的第一性原理平面波赝势方法分别计算了本征及过渡金属掺杂单层MoS_2的晶格参数、电子结构和磁性性质.计算结果显示,过渡金属掺杂所引起的晶格畸变与杂质原子的共价半径有联系,但并不完全取决于共价半径的大小.分析电子结构可以看到,VIIB、VIII和IB族杂质中除Ag和Re外的掺杂体系都对外显示磁性,磁矩主要集中在掺杂的过渡金属原子上.掺杂体系的禁带区域都出现了数目不等的杂质能级,这些杂质能级主要由杂质的d、S的3p和Mo的4d轨道组成.     

Electronic and transport properties of V-shaped defect zigzag MoS_2 nanoribbons

Based on the nonequilibrium Green＇s function （NEGF） in combination with density functional theory （DFT） calcu- lations, we study the electronic structures and transport properties of zigzag MoS2 nanoribbons （ZMNRs） with V-shaped vacancy defects on the edge. The vacancy formation energy results show that the zigzag vacancy is easier to create on the edge of ZMNR than the armchair vacancy. Both of the defects can make the electronic band structures of ZMNRs change from metal to semiconductor. The calculations of electronic transport properties depict that the currents drop off clearly and rectification ratios increase in the defected systems. These effects would open up possibilities for their applications in novel nanoelectronic devices.     

点缺陷对单层MoS2电子结构及光学性质的影响研究

采用基于第一性原理的贋势平面波方法,对不同类型点缺陷单层MoS2电子结构、能带结构、态密度和光学性质进行计算。计算结果表明：单层MoS2属于直接带隙半导体,禁带宽度为1.749ev,V-Mo缺陷的存在使得MoS2转化为间接带隙Eg=0.671eV的p型半导体,V-S缺陷MoS2的带隙变窄为Eg=0.974eV,S-Mo缺陷的存在使得MoS2转化为间接带隙Eg=0.482eV; Mo-S缺陷形成Eg=0.969eV直接带隙半导体,费米能级上移靠近价带。 费米能级附近的电子态密度主要由Mo的4d态和s的3p态电子贡献。光学性质计算表明：空位缺陷对MoS2的光学性质影响最为显著,可以增大MoS2的静态介电常数、折射率n0和反射率,降低吸收系数和能量损失。     

XPS investigation of preferential sputtering of S from MoS2 and determination of MoSx stoichiometry from Mo and S peak positions

The preferential sputtering of S from bulk MoS₂ standard samples exposed to 3 keV Ar⁺ ion bombardment has been studied by XPS. The MoS_x stoichiometry decreases from MoS₂ to MoS_1.12 with a concomitant reduction in the Mo 3d_5/2 binding energy from 229.25 to 228.35 eV. The altered layer extends to a depth of 3.8 nm and is proposed to consist of a single amorphous MoS_x phase in which Mo has a varying number of nearest neighbour S atoms. Using peak positions alone it is possible to determine the MoS_x stoichiometry to an accuracy of x±0.1 from a plot of MoS_x stoichiometry against (Mo 3d_5/2–S 2p_3/2) binding energy. The results are of strong current interest for coating analysis applications as MoS₂ is a compound capable of providing low friction properties when incorporated into hard coatings.     

Monolayer MoS2 of high mobility grown on SiO2 substrate by two-step chemical vapor deposition

We report a novel two-step ambient pressure chemical vapor deposition (CVD) pathway to grow high-quality MoS₂ monolayer on the SiO₂ substrate with large crystal size up to 110 μm. The large specific surface area of the pre-synthesized MoO₃ flakes on the mica substrate compared to MoO₃ powder could dramatically reduce the consumption of the Mo source. The electronic information inferred from the four-probe scanning tunneling microscope (4P-STM) image explains the threshold voltage variations and the n-type behavior observed in the two-terminal transport measurements. Furthermore, the direct van der Pauw transport also confirms its relatively high carrier mobility. Our study provides a reliable method to synthesize high-quality MoS₂ monolayer, which is confirmed by the direct 4P-STM measurement results. Such methodology is a key step toward the large-scale growth of transition metal dichalcogenides (TMDs) on the SiO₂ substrate and is essential to further development of the TMDs-related integrated devices.     

Vacuum current-carrying tribological behavior of MoS2-Ti films with different conductivities

Current-carrying sliding is widely applied in aerospace equipment, but it is limited by the poor lubricity of the present materials and the unclear tribological mechanism. This study demonstrated the potential of MoS₂-based materials with excellent lubricity as space sliding electrical contact materials by doping Ti to improve its conductivity. The tribological behavior of MoS₂-Ti films under current-carrying sliding in vacuum was studied by establishing a simulation evaluating device. Moreover, the noncurrent-carrying sliding and static current-carrying experiments in vacuum were carried out for comparison to understand the tribological mechanism. In addition to mechanical wear, the current-induced arc erosion and thermal effect take important roles in accelerating the wear. Arc erosion is caused by the accumulation of electric charge, which is related to the conductivity of the film. While the current-thermal effect softens the film, causing strong adhesive wear, and good conductivity and the large contact area are beneficial for minimizing the thermal effect. So the moderate hardness and good conductivity of MoS₂-Ti film contribute to its excellent current-carrying tribological behavior in vacuum, showing a significant advantage compared with the traditional ones.     

Tunable terahertz transmission behaviors and coupling mechanism in hybrid MoS2 metamaterials

A hybrid metamaterial with the integration of molybdenum disulfide(MoS₂)overlayer is proposed to manipulate the terahertz(THz)wave.The simulated results indicate that the introduction of MoS₂ layer could significantly modify the resonant responses with large resonance red-shift and bandwidth broadening due to the depolarization field effect,especially for the structure on the small permitivity substrate.Additionally,the wide-band modulator in off-resonant region and a switch effect at resonance can be achieved by varying the conductivity of MoS₂ layer.Further theoretical calculations based on the Lorentz coupling model are consistent with the simulated results,explicating the response behaviors originate from the coupling between MoS₂ overlayer and the metastructure.Our results could provide a possibility for active control THz modulator and switchable device based on the MoS₂ overlayer and advance the understanding of the coupling mechanism in hybrid structures.     

Band renormalization and spin polarization of MoS2 in graphene/MoS2 heterostructures

Transition metal dichalcogenides exhibit spin–orbit split bands at the K‐point that become spin polarized for broken crystal inversion symmetry. This enables simultaneous manipulation of valley and spin degrees of freedom. While the inversion symmetry is broken for monolayers, we show here that spin polarization of the MoS₂ surface may also be obtained by interfacing it with graphene, which induces a space charge region in the surface of MoS₂. Polarization induced symmetry breaking in the potential gradient of the space charge is considered to be responsible for the observed spin polarization. In addition to spin polarization we also observe a renormalization of the valence band maximum (VBM) upon interfacing of MoS₂ with graphene. The energy difference between the VBM at the Γ‐point and K‐point shifts by ～150 meV between the clean and graphene covered surface. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Energy band alignment of 2D/3D MoS2/4H-SiC heterostructure modulated by multiple interfacial interactions

The interfacial properties of MoS₂/4H-SiC heterostructures were studied by combining first-principles calculations and X-ray photoelectron spectroscopy. Experimental (theoretical) valence band offsets (VBOs) increase from 1.49 (1.46) to 2.19 (2.36) eV with increasing MoS₂ monolayer (1L) up to 4 layers (4L). A strong interlayer interaction was revealed at 1L MoS₂/SiC interface. Fermi level pinning and totally surface passivation were realized for 4H-SiC (0001) surface. About 0.96e per unit cell transferring forms an electric field from SiC to MoS₂. Then, 1L MoS₂/SiC interface exhibits type I band alignment with the asymmetric conduction band offset (CBO) and VBO. For 2L and 4L MoS₂/SiC, Fermi level was just pinning at the lower MoS₂ 1L. The interaction keeps weak vdW interaction between upper and lower MoS₂ layers. They exhibit the type II band alignments and the enlarged CBOs and VBOs, which is attributed to weak vdW interaction and strong interlayer orbital coupling in the multilayer MoS₂. High efficiency of charge separation will emerge due to the asymmetric band alignment and built-in electric field for all the MoS₂/SiC interfaces. The multiple interfacial interactions provide a new modulated perspective for the next-generation electronics and optoelectronics based on the 2D/3D semiconductors heterojunctions.     

Preparation of Nanocrystalline MoS2 Hollow Spheres

NanocrystaUine MoS2 with hollow spherical morphology has been prepared by the hydrothermal method. The products are characterized by means of X-ray powder diffraction,transmission electron microscopy and high-resolution transmission electron microscopy. The experimental results give the evidence that the sample is consists of hollow spheres 400～600nm in diameter, and there is much whisker on the surface of MoS2 hollow sphere.