Low-Temperature Growth of Polycrystalline silicon Films by SiCl4／H2 rf Plasma Enhanced Chemical Vapour Deposition

Polycrystalline silicon film was directly fabricated at 200℃ by the conventional plasma enhanced chemical vapour deposition method from SiCl4 with H2 dilution. The crystallization depends strongly on the deposition power.The maximum crystMlinity and the crystalline grain size are over 80% and 200—50Onm, respectively. The results of energy dispersive spectroscopy and infrared spectroscopy measurements demonstrate that the film is mostly composed of silicon, without impurities such as Cl, N, C and bonded H. It is suggested that the crystallization at such a low temperature originates from the effects of chlorine, i.e., in-situ chemical, etching, in-situ chemical cleaning, and the detachment of bonded H.     

Riemann曲面上的正常和拟正常复合算子

Riemann曲面M上的平方可测1-形式全体和解析1-形式全体均可构成Hilbert空间。本文讨论Riemann曲面上的解析映射导出的这类Hilbert空间上的复合算子,研究复合算子的正常性、拟正常性的诱导映射特征。特别地,当M有有限三角剖分时,证明了正常复合算子、拟正常复合算子、酉复合算子、等距复合算子和可逆复合算子等价。     

反向驱动的异质结有机薄膜电致发光

成功制备了结构为ITO／PDDOPV／PPQ／Al的异质结聚合物发光二极管。该器件在正反向偏压下均可发光。在正向偏压下的光发射主要来自PDDOPV，但在反向偏压下的光发射则包括来自PPQ的蓝光发射和PDDOPV的黄光发射。蓝光强度与黄光强度的比值随着反向偏压的增加而增加，当反向直流电压分别为22V、24V、26V、28V时，其电致发光光谱中PPQ与PDDOPV的峰高比IPPQ／IPDDOPV分别为1．092、1．329、1．605、2．046。换句话说，该器件的发光颜色是压控可调的，这对实现彩色显示是极为有利的。分析了在反向偏压下的发光机理以及IPPQ／IPDDOPV受电压控制的原因。     

La掺杂浓度对PLZT薄膜红外光学性质的影响

采用溶胶-凝胶法在Pt/Ti/SiO2/Si衬底上制备了不同La掺杂浓度PLZT(x/40/60)薄膜- x射线衍射分析表明制备的PLZT(x/40/60)薄膜是具有单一钙钛矿结构的多晶薄膜- 通过红外椭圆偏振光谱仪测量了波长为2-5—12-6μm范围内PLZT薄膜的椭偏光谱，采用经典色 散模型拟合获得PLZT薄膜的红外光学常数，同时也拟合获得PLZT薄膜的厚度- 随着La掺杂浓 度的增大，折射率逐渐减小- 而消光系数除PLZT(4/40/60)薄膜外，呈现逐渐增大的趋势- 分析表明这些差异主要与PLZ 关键词： PLZT薄膜 红外光学性质 红外椭圆偏振光谱     

增透膜的原理及常见问题的解答

增透膜也称减反膜，即能够减少反射光，增加透射光的薄膜．笔者在此简单分析一下光学镜头中所用的增透膜．     

J/ψ衰变到重子、反重子对中SU(3)对称性破坏的研究

利用粒子数据手册(PDG2004)公布的J/ψ衰变到重子、反重子对(BB)各个衰变道分支比的平均值, 对重子八重态的SU(3)对称性重新做了分析. 研究了J/ψ→BB中电磁相互作用和强相互作用的干涉. 得到了在J/ψ→BB中SU(3)单态、电磁 相互作用和SU(3)破坏各个因素所占的大小.     

Ba(Zr0.3Ti0.7)O3 铁电薄膜的制备

介绍了用溶胶-凝胶法(sol-gel)在Pt/Ti/SiO2/Si衬底和石英衬底上制备Ba(Zr0.3Ti0.7)O3铁电薄膜的基本原理、工艺过程及工艺特点;Sol-gel制备的Ba(Zr0.3Ti0.7)O3铁电薄膜表面平整、厚度均匀.     

Synthesis of GaN Nanorods by Ammoniating Ga2O3/ZnO Films

Large quantities of CaN nanorods are successfully synthesized on Si（111） substrates by ammoniating the films of Ga2O3/ZnO at 950℃ in a quartz tube. The structure, morphology and optical properties of the as-prepared CaN nanorods are studied by x-ray diffraction, scanning electron microscopy, high-resolution transmission electron microscopy, Fourier transform infrared spectroscopy, and photoluminescence. The results show that the CaN nanorods have a hexagonal wurtzite structure with lengths of several micrometres and diameters from 80 nm to 300hm, which could supply an attractive potential to harmonically incorporate future GaN optoelectronic devices into Si-based large-scale integrated circuits. The growth mechanism is also briefly discussed.