薄膜偏振分光镜的研究

概述薄膜偏振分光镜的研究现状及其主要特点，重点分析薄膜偏振分光镜的设计原理,并利用等效折射率的方法计算中心波长的反射率．     

Chiral Parameter of Transparent Films Containing Polymer Cholesteric Liquid Crystal-R

The transparent film containing a kind of polymer cholesteric liquid crystal-R was fabricated by the freezing method. The optical polarization response of the film was investigated by a self-manufactured apparatus and its optical rotatory dispersion was measured by a novel technique at the wavelength from 35Onto to 66Onto.At various wavelengths, the chiral parameter of the film has been obtained. The results show that the chiral parameter decreases as the wavelength increases. The maximum and minimum chiral parameters are 0.0343 at the wavelength of 350 nm and 0.0058 at the wavelength of 660 nm, respectively. The obtained data indicate that this kind of polymer cholesteric liquid crystal-R is a promising candidate host material for solid optical chiral waveguides.     

ICP-AES测定钛基复合材料中镍、钕和铁的研究

采用ICP－AES法对钛基复合材料中的合金元素镍、钕、铁的测定进行了研究，着重进行了基体元素及待测元素镍、钕、铁之间干扰试验及各元素在测定浓度范围内的线性相关性试验，进行了酸度试验，测定了钛基复合材料中3种元素的含量，得到了较好的精密度和准确度。方法简便、可靠，获得满意的分析结果。     

甚高频等离子体增强化学气相沉积法沉积μc-Si∶H薄膜中氧污染的初步研究

对不同的本底真空条件下,采用甚高频等离子体增强化学气相沉积技术沉积的氢化微晶硅（μc_Si∶H）薄膜中的氧污染问题进行了比较研究.对不同氧污染条件下制备的薄膜样品的x射线光电子能谱与傅里叶变换红外吸收光谱测量结果表明：μc_Si∶H薄膜中,氧以Si—O，O—O和O—H三种不同的键合模式存在,不同的键合模式源自不同的物理机理.μc_Si∶H薄膜的Raman光谱、电导率与激活能的测量结果进一步显示：沉积过程中氧污染程度的不同,对μc_Si∶H薄膜的结构特性与电学特性产生显著影响；而不同氧污染对μc_Si∶H薄膜电学特性的影响不同于氢化非晶硅（a_Si:H）薄膜. 关键词： 氢化微晶硅薄膜 甚高频等离子体增强化学气相沉积 氧污染     

高气压反射式高能电子衍射仪监控脉冲激光外延氧化物薄膜

在超高真空分子束外延（MBE）生长技术中，反射式高能电子衍射仪（RHEED）能实时显示半导体和金属外延生长过程，给出薄膜表面结构和平整度的信息，成为MBE必备的原位表面分 析仪.为了研究氧化物薄膜如高温超导（YBa₂Cu₃O₇） 、铁电薄膜（Sr_1-xBa_x TiO₃）及它们的同质和异质外延结构的生长机理，获得高质量的符合各种应用 需要的氧化 物多层薄膜结构，在常规的制备氧化 关键词： 高温超导薄膜 RHEED     

Morphology of Platinum Nanowire Array Electrodepostied Within Anodic Aluminium Oxide Template Characterized by Atomic Force Microscopy

Unifrom platinum nanowires were synthesized by electrodepositing the platinum under a very low altering current frequency(20Hz) and increasing voltage(5-15V）in the proes of anodic aluminium oxide(AAO) template. Atomic force microscopy observation indicates that the template membranes we obtained have hexagonally clse-packed nanochannels.The platinum nanowires have highly ordered arrays after partially dissolving the aluminium oxide membrane.With the increasing dissolvoing time,the platinum nanowire array collapsed.A concave topography of the aluminium substrate was observed after the aluminium oxide membrane was dissolved completely and the platinum nanowires were released from the template.Platinum nanowires were also characterized by transmission electron microscopy and the phase structure of the Al/AAO/Pt composite was proven by x-ray diffraction.     

一种新的超分辨记录点的读出技术

提出一种新的超分辨记录点的读出技术—超分辨反射膜技术，详细分析了其原理。用该技术，以Sb为超分辨反射膜，SiN为介电层，在激光波长为632．8nm和光学头的数值也径为0．40的读出光学系统中实现了直径为380nm的超分辨记录点的读出。同时研究了Sb薄膜厚度对读出信噪比的影响规律，发现最佳的Sb薄膜厚度为28～30nm，所得的信噪比为38～40dB。     

Theoretical Studies on the Si（001）-SiO2 Interface Structure

1 INTRODUCTION Silicon and its alloy have been widely applied in such fields as electronic industry, high-temperature structural ceramics, etc. In addition, the researches on silicon and its relevant materials greatly promote the rapid development of modern optics and infor- mation technology. Therefore, more and more at- tention is focused on the structure of silicon, oxide of silicon and the interfaces between silicon and metal or nonmetal. As an ideal passive film on the Si surface, S…     

氟化类金刚石薄膜的拉曼和红外光谱结构研究

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Deposition of Diamond-Like carbon Films by High-Intensity Pulsed Ion Beam Ablation at Various Substrate Temperatures

Diamond-like carbon (DLC) films have been deposited on to Si substrates at substrate temperatures from 255℃ to 400O℃ by a high-intensity pulsed-ion-beam (HIPIB) ablation deposition technique. The formation of DLC is confirmed by Raman spectroscopy. According to an x-ray photoelectron spectroscopy analysis, the concentration of sp^3 carbon in the films is about 40% when the substrate temperature is below 300℃ C. With increasing substratetemperature from 25℃ to 400℃, the concentration of sp^3 carbon decreases from 43% to 8%. In other words,sp3 carbon is graphitized into sp^2 carbon when the substrate temperature is above 300℃. The results of xray diffraction and atomic force microscopy show that, with increasing the substrate temperature, the surface roughness and the friction coefficient increase, and the microhardness and the residual stress of the films decrease.