应用"逐差法"处理实验数据

本详尽地讨论了“逐差法”处理实验数据的理论方法并结合实例说明：如何记录数据,如何处理数据。     

非球面聚焦透镜数控加工技术研究

 国内现有的高功率固体激光装置所使用的非球面聚焦透镜都是用传统方式手工加工而成的，由于手工加工方式的加工精度和进度对人的依赖性很大，势必影响大批量制造时的工程进度。而采用新兴的小磨头数控加工技术则可以避免这些缺点。介绍了首次将小磨头数控加工技术用于非球面聚焦透镜的加工，对其中各项技术，包括典型靶镜参数、机床控制方式、加工运动方式、实验使用参数、检测方式进行了分析，并得到了预期的实验结果。     

“神光-Ⅱ”装置第九路靶场终端光学组件的研制

 针对“神光-Ⅱ”装置第九路系统主激光瞄准精度小于等于30 μm和大焦斑辐照均匀性优于10％的要求，提出了靶场终端光学组件的设计结构。应用有限元法对组件关键机械元件和ICF靶室整体进行动静态分析，优化了设计参数。同时与聚焦透镜配合进行数值分析列阵透镜，确定了单元数、曲率和厚度以及单元长和宽等参数。经过实验测试，主激光瞄准精度达到28.9 μm，大焦斑辐照的形状为1 000 μm×500 μm，均匀性为12.0％。     

CCD摄像机图像中心两种标定方法的应用研究

应用两种方法对CCD摄像机的图像中心进行标定;其中直接光学方法根据因镜头畸变造成的像素点在像面水平和垂直两个方向上分布的对称性得到图像中心;基于镜头畸变的透视投影方法利用具有精确定位点阵的平面模板及其在不同方位所成图像,标定出摄像机的内外参量,其中包含图像中心.标定过程考虑了两种主要的镜头畸变.针对某型摄像机及镜头,试验得出关于两种方法的适用性和优缺点,并验证了后一种方法的强收敛性.     

自聚焦排透镜参数分析及制作

自聚焦排透镜(SLR)是利用自聚焦透镜(SELFOC LENS)制作的一成象器件。本文就SLR的工作原理,及各参数对成象的影响进行了分析。并实际制作了几种不同规格的自聚焦排透镜为研制自聚焦排透镜提供了极好的基础。     

ICP-AES间接测定人工晶状体中清洗剂十二烷基磺酸钠的残留量

基于铜-乙二胺络合阳离子与十二烷基磺酸根阴离子能形成离子缔合物的原理,建立了电感耦合等离子体-原子发射光谱法(ICP-AES)间接测定人工晶状体中清冼剂十二烷基磺酸钠(SDS)的残留量.提取水相中的铜含量,从而达到目标物的测定.本法具有检出限低、再现性好、分析效率高等优点,适用于人工晶状体中SDS残留量的测定.     

Flexible digital projector calibration method based on per-pixel distortion measurement and correction

When a digital projector is applied in high precision applications, the intrinsic parameters and distortion characteristics should be calibrated precisely. In this paper, a flexible full-field projector calibration method is proposed without any approximate distortion model. With planar homography theory and fringe projection technique, the projector distortion characteristic on each pixel can be measured independently and an initial distortion map is generated. The intrinsic parameters are calibrated afterwards. Then, the initial distortion map can be refined by correcting the non-perpendicularity between the optical axis and image plane. The original pattern to be projected is corrected with the refined distortion map. Thus, the calibrated projector can be regarded as an ideal projector conforming to the pinhole model. Experimental results show a nearly ideal residual map for the corrected projection pattern. In addition, the proposed calibration method is flexible without any sophisticated ancillary equipment or complicated procedure.     

电子束曝光机大物面强磁透镜的研究

以SDS-3电子束曝光机的聚焦透镜系统为基础,在0.005弧度半张角,3×10－5的高压纹波,50 mm的像距,30×30 mm扫描场的条件下,研究了电磁透镜成像的笛卡尔坐标系中的近轴轨迹方程,给出了相应的计算初值条件和实例.讨论了电子束曝光机聚焦透镜系统中的球差、彗差、像散、场曲和畸变等电子光学特性的确定以及系统像质评定的问题.     

Extending the depth of focus with high NA lens axicon

Based on vectorial Debye theory, tight focusing of x-polarized beam with high NA lens axicon is studied. The high NA lens axicon utilizes spherical aberration to duplicate the performance of an axicon and to create an extended focal line. The intensity distribution in the focal region is illustrated by numerical calculations. We show that the high NA lens axicon system can generates a sub wavelength beam (0.826λ) with depth of focus around 10λ.     

Using the camera pin-hole model restrictions to calibrate the lens distortion model

Camera calibration required the computation of camera pin-hole and lens distortion models. The lens distortion is estimated alone or together with the pin-hole model, by using some existing lens distortion non-metric or self-calibration methods. If both models are computed together, then the models are adjusted to training data, but not to real camera. This is because both pin-hole and lens distortion models are coupled. If they are computed separately, difficulties arise since calibration of lens distortion alone is an unstable process. To improve existing camera calibration methods, this paper proposes a metric calibration method to compute lens distortion separately from the pin-hole model. This method is solved under stable conditions, independently of the computed lens distortion model, since pin-hole and distortion models are computed separately. Images of a planar template are used. First, using distorted control points extracted from images, a set of undistorted points which fits in the pin-hole model are computed. Second, with distorted and undistorted control points, lens distortion is calibrated by using a metric calibration process.