High power-added-efficiency AlGaN/GaN HEMTs fabricated by atomic level controlled etching

An atomic-level controlled etching(ACE)technology is invstigated for the fabrication of recessed gate AlGaN/GaN high-electron-mobility transistors(HEMTs)with high power added efficiency.We compare the recessed gate HEMTs with conventional etching(CE)based chlorine,Cl₂-only ACE and BCl³/Cl₂ACE,respectively.The mixed radicals of BCl₃/Cl₂were used as the active reactants in the step of chemical modification.For ensuring precise and controllable etching depth and low etching damage,the kinetic energy of argon ions was accurately controlled.These argon ions were used precisely to remove the chemical modified surface atomic layer.Compared to the HEMTs with CE,the characteristics of devices fabricated by ACE are significantly improved,which benefits from significant reduction of etching damage.For BCl₃/Cl₂ACE recessed HEMTs,the load pull test at 17 GHz shows a high power added efficiency(PAE)of 59.8%with an output power density of 1.6 W/mm at Vd=10 V,and a peak PAE of 44.8%with an output power density of 3.2 W/mm at Vd=20 V in a continuous-wave mode.     

Temperature profiles in a two-component heterogeneous system heated with a cw laser

A formalism has been developed to calculate the steady-state temperature profiles induced by a cw laser in a composite system comprising a thick medium covered with a film of another medium. The analysis is carried out assuming that thermal and optical properties of the media are temperature-independent. A concept of the effective thermal conductivity for the system is introduced in terms of the maximum temperature rise. Temperature-distributions are numerically computed in typical cases for a circular Gaussian beam to illustrate dependence on film thickness, thermal conductivities and absorption coefficients of the media and size of the laser beam.     

A dislocation dynamics study of the strength of stacking fault tetrahedra. Part I: interactions with screw dislocations

We present a comprehensive dislocation dynamics (DD) study of the strength of stacking fault tetrahedra (SFT) to screw dislocation glide in fcc Cu. Our methodology explicitly accounts for partial dislocation reactions in fcc crystals, which allows us to provide more detailed insights into the dislocation–SFT processes than previous DD studies. The resistance due to stacking fault surfaces to dislocation cutting has been computed using atomistic simulations and added in the form of a point stress to our DD methodology. We obtain a value of 1658.9 MPa, which translates into an extra force resolved on the glide plane that dislocations must overcome before they can penetrate SFTs. In fact, we see they do not, leading to two well differentiated regimes: (i) partial dislocation reactions, resulting in partial SFT damage, and (ii) impenetrable SFT resulting in the creation of Orowan loops. We obtain SFT strength maps as a function of dislocation glide plane-SFT intersection height, interaction orientation, and dislocation line length. In general SFTs are weaker obstacles the smaller the encountered triangular area is, which has allowed us to derive simple scaling laws with the slipped area as the only variable. These laws suffice to explain all strength curves and are used to derive a simple model of dislocation–SFT strength. The stresses required to break through obstacles in the 2.5–4.8-nm size range have been computed to be 100–300 MPa, in good agreement with some experimental estimations and molecular dynamics calculations.     

Structural investigation of glasses with doped some transition metal oxides under the influence of gamma irradiation

The ultrasonic velocity of the alkali-borosilicate with different transition metal oxides (TMO) has been studied using the pulse echo technique. The elastic moduli such as elastic constant and bulk modulus have been obtained from the experimental data. Changes in the structure with different gamma irradiation doses have been investigated by using FTIR spectroscopy and ultrasonic studies. The results show that structural changes in the BO₃ to BO₄ due to TMO and irradiation are obtained.     

Optical Properties of Gamma Irradiated Soda-Lime Silicate Glasses Exchanged with Copper

The effect of copper ion exchange upon the optical absorption and room temperature gamma colouration of soda lime silicate glasses has been investigated. After ion exchange performed at 720 K, copper ions substitute mainly the alkali ions and do modify the optical absorption spectra of the specimens. It has been shown that gamma irradiation does not induce the formation of colloidal copper. Moreover, the colouration process itself is independent of the presence of copper ions. The generated colour centres are rather related to the presence of sodium and potassium ions. The optical bleaching by the UV light occurs in two stages. First disappear centres related to the Na-type defects and next those related to the K-type defects.     

A comparative study of ion-induced damages in C60 and C70 fullerenes

The stability of fullerenes (C₆₀ and C₇₀) under swift heavy ion irradiation is investigated. C₆₀ and C₇₀ thin films were irradiated with 120 MeV Ag ions at fluences from 1×10¹² to 3×10¹³ ions/cm². The damage cross-section and radius of damaged cylindrical zone were found to be higher for C₆₀ than C₇₀ as evaluated by Raman spectroscopy, which shows that the C₇₀ molecule is more stable under energetic ion impact. The higher damage cross-section of the C₆₀ molecule compared with that of the C₇₀ molecule is explained on the basis of thermal conductivity in the framework of the thermal spike model. The surface morphology of pristine C₆₀ and C₇₀ films is studied by atomic force microscopy. UV-visible absorption studies revealed that band gap for C₆₀ and C₇₀ fullerenes thin films decreases with increasing ion fluence. Resistivity of C₆₀ and C₇₀ thin films decreases with increasing ion fluence but the decrease is faster for C₆₀ than C₇₀, indicating higher damage in C₆₀. Irradiation at a fluence of 3×10¹³ ions/cm² results in complete damage of fullerenes (C₆₀ and C₇₀) into amorphous carbon.     

用于空间激光通信的InGaAsP 激光二极管辐射损伤研究(英文)

对1:55 μm波长DFB 结构的InGaAsP 多量子阱激光二极管开展电子和60Co- 射线辐照试验。试验结果表明,激光二极管的斜度效率主要受带电粒子沉积的电离总剂量影响,而阈值电流和光功率主要受位移损伤剂量的影响。利用位移损伤剂量方法评价激光二极管的辐射损伤特征,并且预测其在空间辐射环境中的光功率衰退情况。模拟计算结果表明,MEO轨道辐射环境对激光二极管光功率辐射损伤远大于GEO轨道的影响,这主要是由于MEO轨道辐射环境的高能电子通量密度远大于GEO轨道的通量密度。The 1.55 μm InGaAsP multi-quantum-well laser diodes with distributed feedback structures were irradiated by electrons and 60Co- rays. The experimental results show the slope efficiency of laser diode is mostly affected by the total ionizing dose produced by charging particles, and the threshold current and the optical power mainly by displacement damage dose. The displacement damage dose methodology was employed to evaluate radiation damage of the laser diodes, and to predict the power degradations of these diodes in space. The calculated results indicate that the optical powers of the diodes will have more serious degradation for medium Earth orbit than for geosynchronous Earth orbit,due to higher fluence density of high energy electrons in GEO orbits.     

基于相似测度算法的激光诱导薄膜损伤表面特征研究

鉴于薄膜激光损伤性能评价是增强抗激光红外观察窗口性能的重要保证,给出薄膜在脉冲激光诱导作用下的损伤表面特性及其机理。实验采用YAG脉冲激光器对TiO2薄膜样片进行1-on-1方式的激光诱导。通过CCD采集TiO2薄膜激光辐照前后2幅图像,将这2幅图像进行匹配,建立差异图像测度算法;实验得出TiO2薄膜样片的差异能量测度可判别出损伤情况,即测度值M＜0.1为未发生损伤,0.1＜M＜0.2为轻度损伤,0.2＜M＜0.5为中度损伤,M＞0.5为严重损伤。薄膜样片经过能量密度为0.5 J/cm2的激光辐照后粗糙度明显增大。研究结果表明,采用激光辐照前后图像匹配的测试方法可实现薄膜激光损伤与否的判别。     

高功率氙灯脉冲放电过程中石英管壁热损伤机理

基于高功率激光装置对脉冲氙灯工程运行可靠性的要求,利用现有的能源模块开展了氙灯放电考核实验。实验结果表明：虽然氙灯运行在安全的能量负载水平,当能源模块单个放电回路的峰值功率超过300 MW时,氙灯石英玻璃管壁存在热损伤风险。肉眼观察到管壁损伤后在反射器对侧的灯管内壁出现乳白色沉积层。经扫描电镜和X射线光电子能谱测试分析,证实热损伤形成的乳白色沉积物为二氧化硅。为探究管壁热损伤机制,采用高速摄影观测了氙灯放电等离子体沟道发展过程。图像显示放大器内金属反射器的几何形状对放电沟道的分布产生了显著影响,尤其是在侧灯箱,灯内电弧沟道会靠近反射器一侧集中分布,因此,导致等离子体对灯管的偏烧。当放电峰值功率超过石英热负载极限时,管壁表面二氧化硅材料会被烧蚀至蒸发、气化,并随后沉积在灯管较冷部位。研究结果表明放电回路的放电峰值功率过高、放大器内金属反射器均会对氙灯造成热损伤。     

岩土材料弹塑性正交异性损伤耦合本构理论

在不可逆热力学框架内建立了岩土材料的正交异性损伤塑性耦合宏观唯象本构理论。主要结果有：1）给出了耦合的塑性和损伤的演化律;2）从对含裂纹单元的细观分析入手,通过均匀化（Homogenization）处理,将损伤引入到Mohr-Coulomb条件下,模型同时考虑了损伤对剪切强度及摩擦角的影响,扩容现象则通过损伤应变来计算。