C+轰击铍的分子动力学模拟

使用分子动力学模拟方法研究了入射能量对C⁺离子与Be样品表面相互作用的影响。模拟结果表明,随着C⁺离子的入射能量增大,C⁺离子注入深度也增加,Be原子的溅射产额近似线性增加,而滞留在样品中的C原子数量变化不大,在C⁺离子轰击Be样品的初始阶段,样品中Be原子的溅射产额较大,而随着C⁺离子注入剂量的增加,Be原子的溅射产额逐渐减小并趋于稳定。在此作用过程中,在样品表面形成一个富C层,减缓了样品中Be原子的溅射速率,起到了保护Be样品的作用。     

电子束蒸发沉积Ir膜真空紫外反射特性

Ir是一种重要的真空紫外反射材料,在太阳物理、宇宙物理、生命科学、大气物理、同步辐射等方面有着十分重要的应用.对电子束蒸发沉积Ir膜在真空紫外波段的反射特性进行了系统的理论和实验研究.根据吸收材料基底上单层金属膜数学计算模型,对不同基片上各种厚度的Ir膜真空紫外反射率进行了优化计算.根据计算和前期实验结果,采用电子束蒸发方法,在石英、K9玻璃基片上沉积了不同厚度的Ir膜,在入射波长120 nm处获得了近30%正入射反射率,对应的Ir膜厚度为12 nm.过厚或过薄均不利于Ir膜反射率的提高.经退火处理后,Ir膜中张应力有所释放但并未消除,同时晶粒平均尺寸显著增大,反射率下降.     

基于激光雷达观测的大气边界层自动识别局部最优点算法

大气边界层高度是影响近地面大气物理运动的主要因素,同时也是影响地面污染物浓度的一个重要因素。地基激光雷达可以对大气气溶胶的垂直分布进行连续稳定的监测,应用激光雷达技术对大气边界层进行连续观测可以为环境监测与预报提供指导性的动态信息。针对存在残留层以及外来污染物输入情况时边界层高度变化检测的可靠性及计算效率问题,结合梯度法的物理意义与激光雷达时序图的图形图像学特征,提出了一种基于时空邻近度的边界层局部最优点识别算法。以江苏省无锡市新区偏振米散射激光雷达太湖观测站点的气溶胶垂直观测数据为例,通过对2012年底两次污染事件进行观测分析,分别使用梯度法和局部最优点法进行大气边界层高度的自动识别。实验结果表明,在静稳状态和污染混入后的情况下,梯度法与局部最优点识别法的结果较为接近,但梯度法在处理污染混入状态以及存在残留层的情况下误判率较高。基于时空邻近度的局部最优点算法通过对垂直特征值以及水平相关性的控制,有效地消除了在弱信号、噪声信号、低云以及存在残留层和外来污染等情况下导致的计算机误判现象,在减小算法时间复杂度的同时在计算机自动识别结果具有更高的稳定性,弥补了梯度法在自动化运行中的识别精度与计算效率的不足。     

基于一种新型杂化阳极修饰层的高效有机电致发光器件

设计了基于Bphen∶LiF、Al和MoO₃的杂化电荷注入层,并将其应用于有机电致发光器件中。实验研究表明,这种杂化层作为阳极修饰层是非常有效的,它可以增加器件中载流子注入的平衡性,提高器件的性能。相对参考器件,基于杂化阳极修饰层的电致发光器件的最大电流效率和最大功率效率均提高1.3倍左右。我们对器件性能及其提高的机理进行了分析。     

Efficient top-emitting white organic light emitting device with an extremely stable chromaticity and viewing-angle

In this paper,we report on the fabrication of a top-emitting electrophosphorescent p-i-n white organic lightemitting diode on the basis of a low-reflectivity Sm/Ag semi-transparent cathode together with a thickness-optimized ZnS out-coupling layer.With a 24-nm out-coupling layer,the reflectivity of the cathode is reduced to 8% at 492 nm and the mean reflectivity is 24% in the visible area.By introducing an efficient electron blocking layer tris(1phenylpyrazolato,N,C2 ’)iridium(III)(Ir(ppz) 3) to confine the exciton recombination area,the current efficiency and the colour stability of the device are effectively improved.A white emission with the Ir(ppz) 3 layer exhibits a maximum current efficiency of 9.8 cd/A at 8 V,and the Commission Internationale de L’Eclairage(CIE) chromaticity coordinates are almost constant during a large voltage change of 6 V-11 V.There is almost no viewing angular dependence in the spectrum when the viewing angle is no more than 45,with a CIE x,y coordinate variation of only(±0.0025,±0.0008).Even at a large viewing angle(75),the CIE x,y coordinate change is as small as(±0.0087,±0.0013).     

Compound buried layer SOI high voltage device with a step buried oxide

A silicon-on-insulator (SOI) high performance lateral double-diffusion metal oxide semiconductor (LDMOS) on a compound buried layer (CBL) with a step buried oxide (SBO CBL SOI) is proposed.The step buried oxide locates holes in the top interface of the upper buried oxide (UBO) layer.Furthermore,holes with high density are collected in the interface between the polysilicon layer and the lower buried oxide (LBO) layer.Consequently,the electric fields in both the thin LBO and the thick UBO are enhanced by these holes,leading to an improved breakdown voltage.The breakdown voltage of the SBO CBL SOI LDMOS increases to 847 V from the 477 V of a conventional SOI with the same thicknesses of SOI layer and the buried oxide layer.Moreover,SBO CBL SOI can also reduce the self-heating effect.     

Formation of the intermediate semiconductor larger for the Ohmic contact to silicon carbide using Germanium implantation

By formation of an intermediate semiconductor layer (ISL) with a narrow band gap at the metallic contact/SiC interface, this paper realises a new method to fabricate the low-resistance Ohmic contacts for SiC. An array of transfer length method (TLM) test patterns is formed on N-wells created by P⁺ ion implantation into Si-faced p-type 4H-SiC epilayer. The ISL of nickel-metal Ohmic contacts to n-type 4H-SiC could be formed by using Germanium ion implantation into SiC. The specific contact resistance ρ_c as low as 4.23× 10^-5~Ωega \cdotcm² is achieved after annealing in N₂ at 800~°C for 3~min, which is much lower than that (>900~°C) in the typical SiC metallisation process. The sheet resistance R_sh of the implanted layers is 1.5~kΩega /\Box. The technique for converting photoresist into nanocrystalline graphite is used to protect the SiC surface in the annealing after Ge⁺ ion implantations.     

HL-1装置脱离等离子体及边界等离子体杂质辐射的观测

首次用三道光纤探测器,伸入HL-1装置内真空室,采集活动石墨孔栏处等离子体光信号,用22m石英长光纤传输光信号至控制室进行观测。通过边界等离子体H_α和杂质辐射的时空分布,初步探讨了HL-1装置的脱离等离子体。     

Analysis of the generation mechanism of the S-shaped J—V curves of MoS2/Si-based solar cells

Amorphous-microcrystalline MoS$_{2}$ thin films are fabricated using the sol-gel method to produce MoS$_{2}$/Si-based solar cells. The generation mechanisms of the S-shaped current density-voltage ($J$-$V$) curves of the solar cells are analyzed. To improve the performance of the solar cells and address the problem of the S-shaped $J$-$V$ curve, a MoS$_{2}$ film and a p$^+$ layer are introduced into the front and back interfaces of the solar cell, respectively, which leads to the formation of a p-n junction between the p-Si and the MoS$_{2}$ film as well as ohmic contacts between the MoS$_{2}$ film and the ITO, improving the S-shaped $J$-$V$ curve. As a result of the high doping characteristics and the high work function of the p$^+$ layer, a high-low junction is formed between the p$^+$ and p layers along with ohmic contacts between the p$^+$ layer and the Ag electrode. Consequently, the S-shaped $J$-$V$ curve is eliminated, and a significantly higher current density is achieved at a high voltage. The device exhibits ideal p-n junction rectification characteristics and achieves a high power-conversion efficiency (CE) of 7.55%. The findings of this study may improve the application of MoS$_{2}$ thin films in silicon-based solar cells, which are expected to be widely used in various silicon-based electronic and optical devices.     

Skin layer detection of optical coherence tomography images

In this paper, we present an image processing algorithm to automatically and more precisely detect the boundary between the main skin layers: stratum corneum, epidermis, and dermis. The aim of the proposed skin layer detection algorithm is to assist the dermatologists to measure the epidermal thickness (ET) for skin diseases diagnosis and also to assist pharmacologists so that they can make a better decision for prescribing according to the advancement of the skin disorders characterized with ET change.