Determination of migration of ion-implanted Ar and Zn in silica by backscattering spectrometry

It is well known that the refractive indices of lots of materials can be modified by ion implantation, which is important for waveguide fabrication. In this work the effect of Ar and Zn ion implantation on silica layers was investigated by Rutherford Backscattering Spectrometry (RBS) and Spectroscopic Ellipsometry (SE). Silica layers produced by chemical vapour deposition technique on single crystal silicon wafers were implanted by Ar and Zn ions with a fluence of 1–2?×10¹⁶ Ar/cm² and 2.5?×10¹⁶ Zn/cm², respectively. The refractive indices of the implanted silica layers before and after annealing at 300°C and 600°C were determined by SE. The migration of the implanted element was studied by real-time RBS up to 500°C. It was found that the implanted Ar escapes from the sample at 300°C. Although the refractive indices of the Ar-implanted silica layers were increased compared to the as-grown samples, after the annealing this increase in the refractive indices vanished. In case of the Zn-implanted silica layer both the distribution of the Zn and the change in the refractive indices were found to be stable. Zn implantation seems to be an ideal choice for producing waveguides.     

Effect of simultaneous helium implantation on the microstructure evolution of Inconel X-750 superalloy during dual-beam irradiation

This study focuses on investigation into the effect of helium implantation on microstructure evolution in Inconel X-750 superalloy during dual-beam (Ni⁺/He⁺) irradiation. The 1 MeV Ni⁺ ions with the damage rate of 10^?3 dpa/s as well as 15 keV He⁺ ions using rate of 200 appm/dpa were simultaneously employed to irradiate specimens at 400 °C to different doses. Microstructure characterization has been conducted using high-resolution analytical transmission electron microscopy (TEM). The TEM results show that simultaneous helium injection has significant influence on irradiation-induced microstructural changes. The disordering of γ′ (Ni₃ (Al, Ti)) precipitates shows noticeable delay in dose level compared to mono heavy ion irradiation, which is attributed to the effect of helium on promoting the dynamic reordering process. In contrast to previous studies on single-beam ion irradiation, in which no cavities were reported even at high doses, very small (2–5 nm) cavities were detected after irradiation to 5 dpa, which proved that helium plays crucial role in cavity formation. TEM characterization also indicates that the helium implantation affects the development of dislocation loops during irradiation. Large 1/3 〈1?1?1〉 Frank loops in the size of 10–20 nm developed during irradiation at 400 °C, whereas similar big loops detected at higher irradiation temperature (500 °C) during sole ion irradiation. This implies that the effect of helium on trapping the vacancies can help to develop the interstitial Frank loops at lower irradiation temperatures.     

Preparation of graphene on Cu foils by ion implantation with negative carbon clusters

We report on few-layer graphene synthesized on Cu foils by ion implantation using negative carbon cluster ions,followed by annealing at 950?C in vacuum.Raman spectroscopy reveals IG/I2Dvalues varying from 1.55 to 2.38 depending on energy and dose of the cluster ions,indicating formation of multilayer graphene.The measurements show that the samples with more graphene layers have fewer defects.This is interpreted by graphene growth seeded by the first layers formed via outward diffusion of C from the Cu foil,though nonlinear damage and smoothing effects also play a role.Cluster ion implantation overcomes the solubility limit of carbon in Cu,providing a technique for multilayer graphene synthesis.     

纳米银粒子在氨基注入氧化铟锡玻璃基体表面的高密度吸附

研究了纳米银（AgNPs）在氨基注入氧化铟锡（ITO）薄膜表面的吸附.通过氨基注入的疗法得到了氨基功能化的ITO表面（NH₂/ITO）,并将纳米银直接吸附在NH₂/ITO上得到纳米银修饰NH₂/ITO基体（AgNPs/NH₂/ITO）.使用傅里叶红外光谱、X射线光电子能谱、原子力显微镜、扫描电镜、紫外可见光谱和电化学方法对AgNPs/NH₂/ITO制备过程进行了表征.结果显示纳米银可在NH₂/ITO表面高密度地吸附,并且纳米银有良好的电化学活性.这种不借助于有机连接分子吸附纳米银的方法为制备纳米银修饰材料提供了新的选择.     

氮气退火对二氧化钛薄膜光学性能的影响

 提出了一种利用离子注入和后续退火制备氮掺杂TiO₂薄膜的方法。首先在室温下向石英玻璃中注入Ti离子,随后在氮气中退火到900 ℃,从而制备了氮掺杂的玻璃基TiO₂薄膜。SRIM2006程序模拟和卢瑟福背散射谱（RBS）研究表明注入离子从样品表面开始呈高斯分布,实验结果和模拟结果吻合很好。X射线光电子能谱（XPS）研究结果表明注入态样品中形成了金属Ti和TiO₂,900 ℃退火后金属Ti转变成TiO₂,同时N原子替代少量的晶格O原子形成了O－Ti－N化合物。紫外-可见吸收光谱（UV-Vis）结果显示,当退火温度至500 ℃时,在吸收光谱中开始出现TiO₂的吸收边,随退火温度升高到900 ℃,由于O－Ti－N化合物形成,TiO₂的吸收边从3.98 eV红移到3.30 eV,TiO₂吸收边末端延伸到可见光区,在可见光区的吸收强度明显增加。     

Resonance Raman study of He+ ion implanted nanostructured ZnS

ZnS nanocrytsals of size ∼2.5 nm were prepared by chemical precipitation technique. Pressed pellets of nanostructured ZnS were implanted with He⁺ ions at doses of 5 × 10¹⁴, 1 × 10¹⁵ and 5 × 10¹⁵ ions/cm². Raman spectra of both unimplanted and He⁺ ion implanted samples were recorded with ultraviolet (UV) excitation. LO, 2LO, 2TO, (LO + TA) and (2TO − TA) modes of ZnS were observed in the resonance Raman spectra of the unimplanted nanostructured ZnS samples. In addition, a surface mode was observed at 294 cm⁻¹. With the implantation of He⁺ ions, the 2TO mode disappeared and 2LO mode became prominent and this observation was attributed to the decrease in band gap of ZnS nanocrytsals due to ion implantation. The exciton–LO phonon coupling strength was determined from the intensity ratio of 2LO to LO modes and it was observed that the exciton–LO phonon coupling strength increases with increase in implantation dose. In the present work, we report for the first time the observation of 2TO mode in the resonance Raman spectrum of nanostructured ZnS and also the modification of exciton–LO phonon coupling strength of semiconductor nanoparticles by ion implantation. Copyright © 2008 John Wiley & Sons, Ltd.     

Investigation of the lateral spread of erbium ions implanted in silicon crystal

The erbium ions at energy of 400 keV and dose of 5×10 15 ions/cm 2 were implanted into silicon single crystals at room temperature at the angles of 0,45 and 60.The lateral spread of 400 keV erbium ions implanted in silicon sample was measured by the Rutherford backscattering technique.The results show that the measured values were in good agreement with those obtained from the prediction of TRIM’98 (Transport of Ions in Matter) and SRIM2006 (Stopping and Range of Ions in Matter) codes.     

高光束质量垂直腔面发射激光器同相耦合阵列

质子注入型面发射激光器相干耦合阵列能够实现同相模式的激射,但是由于制作过程中的工艺不均匀性引起单元间存在相位差,影响光束的质量。本文通过设计分离电极结构,使每个单元注入的电流得到分别的控制,实现了3单元三角排列阵列高光束质量同相耦合模式的激射。阵列远场发散角仅为3.4°,大约有25.6%的全部能量聚集在中心光斑。激射光谱的线宽为0.24 nm,边模抑制比为27 dB。该方法能够有效提高相干耦合阵列的光束质量,弥补制作工艺中引入的单元不均匀性,提高器件的可靠性和实用性。质子注入方法简单、成本低,能够成为制作高光束质量相干耦合阵列的一个重要方法。