低能离子注入宫颈癌细胞的红外光谱分析

利用离子注入机所产生的低能N+模仿宇宙中低能离子作用于人宫颈癌细胞(HeLa cell),探索其对人类细胞的影响及作用机制。因实验中的低能离子产生和加速要在真空中进行,细胞在离子注入同时将受到真空的影响,为此研究人员利用石蜡油保护细胞以防止注入时的水份蒸发。注入处理完毕后收集细胞,采用傅里叶变换红外光谱法(FTIR)分析真空和低能N+束注入后细胞中大分子的相对含量、构型及其构象变化等方面的信息。结果表明：(1)不同处理后的样品在3 300 cm-1附近吸收谱带存在明显差异。对照样品的特征峰位为3 300 cm-1,而其他样品中除了注入5×1014 N+·cm-2外,红外吸收峰均向长波数方向移动,真空2×1015 N+·cm-2样品的频移尤为明显至3 420 cm-1处。(2)与对照样品相比较,各处理样品的1 378 cm-1处吸收峰峰位均向长波数方向频移。(3)处理样品相对于对照样品而言,2 360 cm-1处吸收峰均向长波数方向移动。该结果说明低能离子注入处理可以引起细胞中核酸、蛋白的含量和构象变化。     

Formation of the intermediate semiconductor larger for the Ohmic contact to silicon carbide using Germanium implantation

By formation of an intermediate semiconductor layer (ISL) with a narrow band gap at the metallic contact/SiC interface, this paper realises a new method to fabricate the low-resistance Ohmic contacts for SiC. An array of transfer length method (TLM) test patterns is formed on N-wells created by P⁺ ion implantation into Si-faced p-type 4H-SiC epilayer. The ISL of nickel-metal Ohmic contacts to n-type 4H-SiC could be formed by using Germanium ion implantation into SiC. The specific contact resistance ρ_c as low as 4.23× 10^-5~Ωega \cdotcm² is achieved after annealing in N₂ at 800~°C for 3~min, which is much lower than that (>900~°C) in the typical SiC metallisation process. The sheet resistance R_sh of the implanted layers is 1.5~kΩega /\Box. The technique for converting photoresist into nanocrystalline graphite is used to protect the SiC surface in the annealing after Ge⁺ ion implantations.     

Stabilization of organic thin film transistors by ion implantation

We report on the effects of low energy ion implantation (N and Ne) in the reduction and control of the degradation of pentacene organic thin film transistors (OTFTs) due to the exposure to atmosphere (i.e. oxygen and water). We have observed that a controlled damage depth distribution preserves the functionality of the devices, even if ion implantation induces significant molecular structure modifications, in particular a combination of dehydrogenation and carbonification effects. No relevant changes in the pentacene thin film thickness have been observed. The two major transport parameters that characterize OTFT performance are the carrier mobility and the threshold voltage. We have monitored the effectiveness of this process in stabilizing the device by monitoring the carrier mobility and the threshold voltage over a long time (over 2000 h). Finally, we have assessed by depth resolved X-ray Photoemission Spectroscopy analyses that, by selectively implanting with ions that can react with the hydrocarbon matrix (e.g. N⁺), it is possible to locally modify the charge distribution within the organic layer.     

离子注入Pt的玻碳电极上甲酸和甲醛的电氧化

制备了离子注入Pt的玻碳电极(Pt/GC),注入剂量为5×10¹⁷ion/cm²,此电极的表面组成和各元素的浓度-深度分布用AES测量,注入Pt的价态用XPS测量.在0.5mol/LHClO₄溶液中,用Pt/GC电极和纯Pt电极研究了甲酸的电氧化行为,并在五种不同种类的电解质溶液中研究了甲醛的电氧化行为.结果表明,Pt/GC电极对甲酸和甲醛的电催化性能按真实表面积计算优于纯Pt电极.这可能与离子注入Pt过程中形成纳米团簇有关.此外,在同一电极上,甲醛在不同种类的电解质溶液中产生不同的氧化电流.说明阴离子对甲醛的电氧化过程有明显影响     

Studies on the Electrochemical Behavior of Bleomycin at a Co/GC Ion Implantation Modified Electrode and Its Application

In a 0. 10 mol/L HAc-NaAc buffer solution (pH = 4. 59), a sensitive reduction peak of bleomycin was observed by linear sweep voltammetry at a Co/GC ion implantation modified electrode. The peak potential was-0. 73 V(iw. SCE). The peak current was proportional to the concentration of bleomycin over the range of 5.0 × 10-8-1.0× 10-6 and 1.0× 10-6-1. 0 × 10-5 mol/L with a detection limit of 2.0 × 10-8 mol/L. The electrochemical behavior of the reduction peak of bleomycin at the Co/GC modified electrode was studied by linear sweep and cyclic voltammetry and applied to the determination of bleomycin in urine. This method is simple, rapid and reliable. The reduction process is quasi-reversible. The experiments of AES and XPS showed that Co was surely implanted into the surface of GCE and the depth distribution of Co was in good agreement with Gooses normal distribution; the implanted Co at GCE improved the electrocatalytic activity.     

Biocompatibility Study of Electrospun Nanocomposite Membranes Based on Chitosan/Polyvinyl Alcohol/Oxidized Carbon Nano-Onions

In recent decades, the number of patients requiring biocompatible and resistant implants that differ from conventional alternatives dramatically increased. Among the most promising are the nanocomposites of biopolymers and nanomaterials, which pretend to combine the biocompatibility of biopolymers with the resistance of nanomaterials. However, few studies have focused on the in vivo study of the biocompatibility of these materials. The electrospinning process is a technique that produces continuous fibers through the action of an electric field imposed on a polymer solution. However, to date, there are no reports of chitosan (CS) and polyvinyl alcohol (PVA) electrospinning with carbon nano-onions (CNO) for in vivo implantations, which could generate a resistant and biocompatible material. In this work, we describe the synthesis by the electrospinning method of four different nanofibrous membranes of chitosan (CS)/(PVA)/oxidized carbon nano-onions (ox-CNO) and the subdermal implantations after 90 days in Wistar rats. The results of the morphology studies demonstrated that the electrospun nanofibers were continuous with narrow diameters (between 102.1 nm ± 12.9 nm and 147.8 nm ± 29.4 nm). The CS amount added was critical for the diameters used and the successful electrospinning procedure, while the ox-CNO amount did not affect the process. The crystallinity index was increased with the ox-CNO introduction (from 0.85% to 12.5%), demonstrating the reinforcing effect of the nanomaterial. Thermal degradation analysis also exhibited reinforcement effects according to the DSC and TGA analysis, with the higher ox-CNO content. The biocompatibility of the nanofibers was comparable with the porcine collagen, as evidenced by the subdermal implantations in biological models. In summary, all the nanofibers were reabsorbed without a severe immune response, indicating the usefulness of the electrospun nanocomposites in biomedical applications.     

Quantitative SIMS analysis of SiC

We performed a systematic study of ion‐implanted 6H‐SiC standards to find the optimal regimes for SIMS analysis. Relative sensitivity factors (RSFs) were acquired for operating conditions typical of practical SIMS applications. The experimental SiC RSFs were compared with those found for silicon: 1 the matrix effect was insignificant in most cases. It was found that the SiO^? cluster ion cannot represent correctly the real oxygen distribution in SiC. The physics of the effect is discussed. Copyright © 2003 John Wiley & Sons, Ltd.     

Boron implantation in Si: Channeling effects studied by SIMS and simulation

The axial channeling behaviour of boron implants in <100>, <110> and <111> silicon wafers is investigated by SIMS. Large differences of channeling characteristics such as channeled projected range (the projected range of channeled ions or channeling peak) and the fraction of channeled to implanted ions are observed among the three major crystal orientations. Within the critical angle, the channeling behaviour is very sensitive to the incidence beam angle with respect to crystal orientations. SIMS measurements are performed at different positions along several critical directions over a whole wafer. Well channeled profiles with an incidence beam angle to crystal orientations of 0 ° are obtained for each ion implantation energy and orientation. The results are used to test various models of ion implantation by simulation. A 3-parameter model for electronic stopping power of boron in silicon was proposed.     

氨甲蝶呤在Co/GC离子注入修饰电极上电化学行为及其应用研究

氨甲蝶呤在0.1mol/LHAc-NaAc(pH=4.96)缓冲溶液中,用Co/GC离子注入修饰电极进行伏安测定,得到一良好的还原峰,峰电位为-0.95V(vs.SCE).峰电流Ip与氨甲蝶呤的浓度在2.2×10^-7～8.8×10^-6mol/L范围内呈线性关系。检出限为1.1×10^-8mol/L.建立了测定氨甲蝶呤的新方法,可用于实际样品的测定,回收率在98.9%～106.2%之间。用线性扫描和循环伏安法研究了体系的电化学行为及电极反应机理。实验表明,氨甲蝶呤的还原为不可逆吸附过程,并伴随两个电子和两个氢离子参与电极反应。用俄歇电子能谱(AES)和X射线光电子能谱(XPS)等表面分析技术对Co离子注入修饰电极的表面元素组成及深度分布等进行测定,表明Co离子确被注入到玻碳表面。扫速对催化效率的影响实验证明体系存在催化作用。     

Preparation of a Novel NH2 + Ion Implantation Modified Electrode and Its Study of the Electrochemical Behavior of Hemoglobin

Abstract

A novel functional electrode was obtained by implanting NH₂ ⁺ into ITO film (NH₂/ITO) for the first time. The NH₂/ITO surface showed a better affinity to gold nanoparticles than bare ITO. Gold nanoparticles were deposited on the surface of NH₂/ITO electrode (Au/NH₂/ITO). The Au/NH₂/ITO and NH₂/ITO electrodes were used to observe the electrochemical behavior of Hemoglobin (Hb) immobilized on the electrodes surfaces. The peak current value of Hb immobilized on NH₂/ITO increased compared with on bare ITO while peak current value of Hb immobilized on Au/NH₂/ITO increased compared with on Au/ITO. Linkage between the ‐NH₂ implanted into the ITO film and the ‐COOH of Hb was thought to be the reason for the increase of active Hb coverage on NH₂/ITO compared with bare ITO. Increase of active Hb coverage on Au/NH₂/ITO compare with Au/ITO was attributed to the different amount of gold nanoparticles deposited. Results showed the novel NH₂/ITO and Au/NH₂/ITO electrodes exhibited good stability, reproducibility besides selectivity and sensitivity. The electrode process of Hb immobilized on Au/NH₂/ITO was quasi‐reversible with adsorption. The electrode reaction rate constant k_s and other related constants were determined. X‐ray photoelectron spectroscopy (XPS), field‐emission scanning electron microscopy (FE‐SEM), and impedance spectra were used to characterize the different surfaces.