Analytical solution to a mode of mixed elastohydrodynamic lubrication with mixed contact regimes: Part I. Without consideration of contact adhering layer in the inlet zone

In 2005, Zhang presented a Grubin-like inlet zone analysis to the isothermal line contact elastohydrodynamic lubrication under relatively heavy loads when the hydrodynamic film thickness in the Hertzian zone approaches zero and the EHL fluid is Newtonian [Zhang, Y.B. A justification of the load-carrying capacity of elastohydrodynamic lubrication film based on the Newtonian fluid model. Industrial Lubrication and Tribology, 2005, Vol. 57, pp. 224–232]. His results showed that in this EHL, when the rolling speed is lower than the characteristic rolling speed (U_ch =) 0.0372W^1.50/G, the Hertzian zone is in physical adsorbed layer boundary lubrication while the inlet zone is in conventional hydrodynamic lubrication. This mode of EHL represents a mode of mixed EHL with mixed contact regimes, where hydrodynamic films with different rheological behaviors occur in different areas of the contact. The present paper presents an analysis to this mode of mixed EHL by using the Grubin type method when the contact adhering layer in the inlet zone is neglected. Pressures, film thicknesses and load partition in the contact are obtained from this analysis. It is also found that the formula for the characteristic rolling speed U_ch = 0.0372W^1.50/G obtained by Zhang [Zhang, Y.B. A justification of the load-carrying capacity of elastohydrodynamic lubrication film based on the Newtonian fluid model. Industrial Lubrication and Tribology, 2005, Vol. 57, pp. 224–232] may be valid for the dimensionless load W > 1.0E−7, while it may be invalid for the dimensionless load W < 1.0E−8. In part II [Zhang, Y.B. Analytical solution to a mode of mixed elastohydrodynamic lubrication with mixed contact regimes: Part II. Considering the contact adhering layer effect in the inlet zone. Journal of Molecular Liquids, 2006, Vol. 117. (doi:10.1016/j.molliq.2006.04.007)] will be presented an analysis to other two modes of mixed EHL with mixed contact regimes for relatively heavy loads, low rolling speeds and Newtonian fluids, where the conventional hydrodynamic lubrication, physical adsorbed layer boundary lubrication and oxidized chemical layer boundary lubrication can simultaneously occur in the inlet zone while the oxidized chemical layer boundary lubrication or the fresh metal-oxidized chemical boundary layer dry contact occur in the Hertzian zone, considering the contact adhering layer effect in the inlet zone.     

TDDFT study on the excited‐state hydrogen bonding of N‐(2‐hydroxyethyl)‐1,8‐naphthalimide and N‐(3‐hydroxyethyl)‐1,8‐naphthalimide in methanol solution

The time‐dependent density functional theory method was performed to investigate the excited‐state hydrogen‐bonding dynamics of N‐(2‐hydroxyethyl)‐1,8‐naphthalimide (2a) and N‐(3‐hydroxyethyl)‐1,8‐naphthalimide (3a) in methanol (meoh) solution. The ground and excited‐state geometry optimizations, electronic excitation energies, and corresponding oscillation strengths of the low‐lying electronically excited states for the complexes 2a + 2meoh and 3a + 2meoh as well as their monomers 2a and 3a were calculated by density functional theory and time‐dependent density functional theory methods, respectively. We demonstrated that the three intermolecular hydrogen bonds of 2a + 2meoh and 3a + 2meoh are strengthened after excitation to the S₁ state, and thus induce electronic spectral redshift. Moreover, the electronic excitation energies of the hydrogen‐bonded complexes in S₁ state are correspondingly decreased compared with those of their corresponding monomer 2a and 3a. In addition, the intramolecular charge transfer of the S₁ state for complexes 2a + 2meoh and 3a + 2meoh were theoretically investigated by analysis of molecular orbital. Copyright © 2014 John Wiley & Sons, Ltd.     

硒化镉发光量子点的制备及其在有机发光器件中的应用

硒化镉量子点具有随粒径尺寸改变,而产生发光波长调变的特性,目前已被广泛研究。本研究是由化学溶胶法合成不同粒径尺寸的核壳型CdSe／ZnS硒化镉量子点,其表面包覆十六烷基胺,避免分子团聚现象。在由硒化镉成核温度的控制,成功地制备一系列具有各种尺寸粒径的核壳型硒化镉量子点(2—6nm)。本研究也合成了含有纳米金粒子于核壳型硒化镉量子点,实验结果发现：硒化镉发光效率明显的提高。在有机发光器件的应用方面,将发光波长为505nm核壳型CdSe／ZnS量子点掺入溶有发光波长为570nm铱化合物的氯仿溶液时,其溶液的光致发光光谱表明,原量子点的发光特性消失,只有铱化合物的发光依然存在,且其发光强度呈现明显增强趋势,我们推测此现象源自于量子点到铱化合物能量转移的机制。我们也以含有核壳型硒化镉量子点的铱化合物与PVK混合材料为发光层,成功的制作发光二极管器件,器件的发光效率因核壳型硒化镉的掺杂,明显提高2倍多。     

吸附制冷中化学吸附的滞后圈研究

文中通过对活性炭-氨以及氯化钙-氨的对比试验,对氯化钙-氨化学吸附的滞后圈进行了研究,结果表明, 化学吸附的滞后现象非常严重,已经超出了气-固吸附的Zigmondy、McBain以及Cohan模型所能解释的范围。对化学吸附的Claperon图进行研究,发现吸附床冷却及加热过程中存在着一段等压冷却以及加热过程,这两个过程与吸附滞后圈相对应。对此现象进行分析,结果表明化学吸附的滞后圈形成原因主要与络合物的稳定常数以及吸附特性相关。     

基于Marangoni界面效应的数控化学抛光去除函数的研究

 利用基于Marangoni界面效应对化学抛光去除函数的理论及实验进行研究,提出采用湿法化学抛光（刻蚀）方法为大口径高精度光学元件的加工提供新的解决途径。介绍了Marangoni界面效应及其验证实验,运用WYKO轮廓仪对熔石英基片局域刻蚀前后的粗糙度进行检测,结果表明,粗糙度基本无变化,刻蚀前后粗糙度分别为0.72 nm和0.71 nm。基于Preston假设, 建立了数控化学抛光理论模型,运用WYKO干涉仪观察实验现象可知,化学抛光刻蚀曲线基本上成平底陡峭的去除函数曲线,小磨头抛光是倒置的仿高斯函数曲线。     

覆膜长周期光纤光栅在生化分析中的应用及研究进展

总结了纳米薄膜修饰的长周期光纤光栅在折射率生物传感器方面的研究进展,重点介绍了纳米薄膜对长周期光纤光栅折射率传感性能的影响,详细阐述了覆膜长周期光纤光栅在生化分析检测领域的应用,并对其在折射率传感方面的应用前景作了展望。     

Formation and dissociation of protonated cytosine–cytosine base pairs in i-motifs by ab initio quantum chemical calculations

Formation and dissociation mechanisms of C-C＋ base pairs in acidic and alkaline environments are investigated, employing ab initio quantum chemical calculations. Our calculations suggest that, in an acidic environment, a cytosine monomer is first protonated and then dimerized with an unprotonated cytosine monomer to form a C-C＋ base pair; in an alkaline environment, a protonated cytosine dimer is first unprotonated and then dissociated into two cytosine monomers. In addition, the force for detaching a C-C＋ base pair was found to be inversely proportional to the distance between the two cytosine monomers. These results provide a microscopic mechanism to qualitatively explain the experimentally observed reversible formation and dissociation of i-motifs.     

Controlled growth and field emission of vertically aligned AlN nanostructures with different morphologies

The controllable growth of three different morphologies of AlN nanostructures (nanorod, nanotip and nanocrater) arrays are successfully realized by using chemical vapour deposition (CVD) technology. All three nanostructures are of single crystal h-AlN with a growth orientation of [001]. Their growth is attributed to the vapour-liquid-solid (VLS) mechanism. To investigate the factors affecting field emission (FE) properties of AlN nanostructures, we compare their FE behaviours in several aspects. Experimental results show that AlN nanocrater arrays possess the best FE properties, such as a threshold field of 7.2~V/μm and an emission current fluctuation lower than 4%. Moreover, the three AlN nanostructures all have good field emission properties compared with a number of other excellent cathode nanomaterials, which suggests that they are future promising FE nanomaterials.     

In situ functionalized self-assembled monolayer surfaces for selective chemical vapor deposition of copper

Recent studies show that the self-assembled monolayer (SAM) is well suited to control the selectivity of chemical vapor deposition (CVD). Here, we reported the selective CVD for copper on the functionalized SAM surfaces (with -SH, -SS-, and -SO₃H terminal groups). The -SS- and -SO₃H terminal group surfaces were obtained through in situ chemical transformation of -SH terminal group surface of a 3-mercaptopropyltrimethoxysilane-SAM (MPTMS-SAM). As a result, the -SS- terminal group surface reduces copper deposition and the -SO₃H terminal group surface enhances copper deposition comparing to the -SH terminal group surface. In addition, the MPTMS-SAM was irradiated by UV-light through a photo mask to prepare SH-group and OH-group regions. Then, copper films were deposited only on the SH-group region of the substrate in chemical vapor deposition. Finally, patterns of copper films were formed in the way of UV-light irradiation. These results are expected for use of selective deposition of copper metallization patterns in IC manufacturing processes.