Investigation of the effect of plasma waves excitation on target normal sheath ion acceleration using fs laser‐irradiating hydrogenated structures

Measurements of ion acceleration in polymethylmethacrylate foils covered by a thin copper film irradiated by fs laser in target normal sheath acceleration regime are presented. The ion acceleration depends on the laser parameters, such as the pulse energy; depends on the irradiation conditions, such as the focal point position of the laser with respect to the target surface; and depends on the target properties, such as the metallic film thickness. The proton acceleration increases in the presence of the metallic film enhancing the plasma electron density, reaching about 1.6 MeV energy for a focal position on the target surface. The plasma diagnostics uses SiC detectors, absorber foils, Faraday cups, and gafchromic films. Employing p‐polarized laser light and a suitable oblique incidence, it is possible to increase the proton acceleration up to about 2.0 MeV thanks to the effects of laser absorption resonance due to plasma waves excitation.     

Formation of Ohmic contacts on laser irradiated n-type 6H-SiC without thermal annealing

In this work, KrF excimer laser irradiation of n-type SiC is used to form Ohmic contacts at the interfaces between the irradiated SiC and various types of metals with different work functions without subsequent thermal annealing. Ohmic contacts are formed between laser-treated 6H-SiC and Ti at a laser fluence of 0.7 J/cm². Moreover, in the fluence range of 0.7–1.3 J/cm², Ohmic characteristics are also observed between irradiated 6H-SiC and Au, which is a representative inert metal. The laser-induced heavy doping effect reduces the thickness of the Schottky barrier between the metal and SiC, and the formation of graphene sheets on the irradiated SiC surface reduces the barrier height, resulting in the direct formation of Ohmic contacts. Our findings thus demonstrate the potential of this laser treatment method to achieve Ohmic contacts between n-type SiC and a broad range of metal electrodes without requiring high-temperature annealing.     

La或N掺杂SiC纳米线的制备、场发射性能及第一性原理计算

采用化学气相沉积法和气相掺杂法, 分别制备了La 或N掺杂的SiC 纳米线. 利用场发射扫描电子显微镜(FE-SEM)、透射电子显微镜(TEM)、选区电子衍射(SAED)、高分辨透射电子显微镜(HRTEM)、X射线能量色散谱(EDS)分析和X射线衍射(XRD)等测试手段对两种产物的微观形貌、元素组成和物相结构进行了系统表征. 以合成产物作为阴极, 对其场发射性能进行测试, 结果表明: SiC 纳米线的开启电场值和阈值电场值由未掺杂的2.3、6.6 V·μm^-1分别降低为1.2、5.2 V·μm^-1(La 掺杂)和0.9、0.4 V·μm^-1(N 掺杂). 采用Material Studio 软件中的Castep 模块建立(3×3×2)晶格结构模型, 对未掺杂、La 或N掺杂SiC 的能带结构和态密度进行计算, 结果显示: La或N掺杂后, 在费米能级附近产生了新的La 5d或N 2p掺杂能级, 导致禁带宽度(带隙)变窄, 使得价带电子更容易跨越禁带进入导带, 从而改善SiC纳米线的场发射性能.     

基于迟滞行为的2D-SiC/SiC复合材料组份力学性能分析

基于剪滞理论, 建立了单向纤维增强陶瓷基复合材料的加卸载理论模型, 分析了基体长碎块和短碎块对材料迟滞力学行为的不同影响. 通过拉伸循环加卸载试验, 获得了2D-SiC/SiC 复合材料的迟滞应力—应变行为.依据材料基体损伤特点, 将试验结果代入长碎块对应理论推导结果, 计算得到了4 个表征材料组份性能的参数:基体开裂应力为90 MPa, 热残余应力为19 MPa, 界面脱粘能为3.1 Jm2, 界面滑移力为74 MPa. 最后结合少量短碎块的存在对试验结果的影响, 定性分析了计算结果的偏差. 结果表明, 获得的材料组分性能参数具有较小的分散性, 并能够准确表征材料整体的力学行为.      

SiC纳米棒的紫外发光研究

采用聚硅氮烷前驱体在高温常压下热裂解的方法制备了3C-SiC纳米棒,在室温下观察到来自纳米棒的378 nm（33?eV） 强紫外发射. 利用扫描电子显微镜、透射电子显微镜、高分辨透射电子显微镜和X射线衍射对样品的形貌和结构进行表征,观察到在该结构中存在类似6H-SiC结构的三层堆垛层错. 利用室温荧光光谱和室温荧光衰减曲线研究了强紫外发射的产生机理,紫外发射来源于3C-SiC纳米棒中的三层堆垛层错的发光. 关键词： 碳化硅 纳米棒 光致发光     

SiC缓冲层对Si表面生长的 ZnO薄膜结构和光电性能的改善

用脉冲激光沉积(PLD)技术制备了ZnO/SiC/Si和 ZnO/Si薄膜并制成了紫外探测器。利用X射线衍射(XRD),光致发光(PL)谱,I-V曲线和光电响应谱对薄膜的结构和光电性能进行了研究。实验结果表明:SiC缓冲层改善了ZnO薄膜的结晶质量和光电性能,其原因可能是SiC作为柔性衬底能够减少ZnO与Si 之间大的晶格失配和热失配导致的界面缺陷和界面态。     

聚合物前驱体衍生SiC纳米棒的光学性质

采用聚硅氮烷前驱体热裂解方法制备SiC纳米棒,并利用SEM、XRD和EDX表征了SiC纳米棒的结构和组成,表明得到的SiC的组分比C：Si接近1：1。用微区Raman和光致发光方法研究了纳米棒的光学性质。观测到SiC的TO模式对应的Raman峰和相邻肩峰。对SiC纳米棒观测到其紫外3．25eV附近强的光致发光峰,我们认为它归结为α型SiC带间的跃迁。通过XRD、Raman和光发射谱,我们推测前驱体热裂解得到的SiC纳米棒是一个混晶,纳米棒的表层是立方晶,而内层主要为a—SiC。     

Barrier height homogeneity for 4.5 kV 4H-SiC Schottky diodes

4.5 kV SiC Schottky diodes have been fabricated using Ni as the Schottky contact. A manufacturing yield of 40% is reached for the bigger area diodes (1.6×1.6 mm²) and of 70% for the smaller ones (0.4×0.4 mm²). The measured variations of barrier height and ideality factor with temperature do not agree with the thermionic model. This has been interpreted in terms of barrier height inhomogeneities using the Werner model. We extracted an average barrier height and its standard deviation . These two parameters are almost independent of the diode size. The variation of the barrier height distribution with field has also been investigated and shows a dependence similar to that of Schottky diodes realized from other semiconductor materials.     

2D-C/SiC复合材料的单轴拉伸力学行为及其强度

通过单调拉伸和循环加卸载试验, 研究了平纹编织C/SiC复合材料的损伤演化过程及其应力-应变行为. 结果表明, 残余应变、卸载模量和外加应力的关系曲线与拉伸应力-应变曲线具有类似的形状. 基于剪滞理论和混合率建立了材料的损伤本构关系和强度模型, 分析计算表明, 残余应变主要由裂纹张开位移和裂纹间距决定, 而卸载模量主要由界面脱粘率决定; 材料的单轴拉伸行为主要由纵向纤维束决定, 横向纤维对材料的整体模量和强度贡献较小. 理论模拟结果与试验值吻合较好.      

Optically controlled SiCGe/SiC heterojunction transistor with charge-compensation layer

A novel optically controlled SiCGe/SiC heterojunction transistor with charge-compensation technique has been simulated by using commercial simulator.This paper discusses the electric field distribution,spectral response and transient response of the device.Due to utilizing p-SiCGe charge-compensation layer,the responsivity increases nearly two times and breakdown voltage increases 33%.The switching characteristic illustrates that the device is latch-free and its fall time is much longer than the rise time.With an increase of the light power density and wavelength,the rise time and fall time will become shorter and longer,respectively.In terms of carrier lifetime,a compromise should be made between the responsivity and switching speed,the ratio of them reaches maximum value when the minority carrier lifetime equals 90 ns.