Enhanced Photoluminescence of InGaN/GaN Green Light-Emitting Diodes Grown on Patterned Sapphire Substrate

Green InGaN/GaN based light-emitting diodes （LEDs） are fabricated both on planar and wet-etched patterned sapphire substrates by metalorganic vapour phase epitaxy （MOVPE）. Their photoluminescence （PL） properties of the two samples are studied. The results indicate that the PL integral intensity of the green LED on the patterned substrate is nearly two times of that on the planar one within the whole measured temperature range. The enhanced PL intensity in the green LED on the patterned substrate is shown completely contributed from the extraction efficiency, but not from the internal quantum efficiency. The conclusion is supported by temperature-dependent PL analysis on the two samples, and the mechanisms axe discussed.     

Effect of Different Substrate Temperature on Phosphorus-Doped ZnO Thin Films Prepared by PLD on Sapphire Substrates

Phosphorus-doped ZnO （ZnO：P） thin films are deposited on a c-plane sapphire in oxygen at 350℃, 450℃, 550℃ and 650℃, respectively, by pulsed laser deposition （PLD）, then all the ZnO：P samples are annealed at 650℃ in oxygen with a pressure of 1 × 10^5 Pa. X-ray diffraction measurements indicate that the crystalline quality of the ZnO：P thin films is improved with the increasing substrate temperature from 350℃ to 550℃. With a further increase of the deposition temperature, the crystalline quality of the ZnO：P sample is degraded. The measurements of low-temperature photoluminescence spectra demonstrate that the samples deposited at the substrate temperatures of 350℃ and 450℃ show a strong acceptor-bound exciton （A^0X） emission. The electrical properties of ZnO：P films strongly depend on the deposition temperature. The ZnO：P samples deposited at 350℃ and 450℃ exhibit p-type conductivity. The p-type ZnO：P film deposited at 450℃ shows a resistivity of 1.846Ω·cm and a relatively high hole concentration of 5.100 × 10^17 cm^-3 at room temperature.     

Crystal Structure and Magnetic Properties of Sm2 Fe17-Nδ Thin Films Deposited on Si （100） Substrates

This work focuses on the crystal structure and magnetic properties of the hard magnetic Sm2 Fe17 Nδ films prepared by dc magnetron sputtering and the subsequent nitriding process. The XRD, EDS, M-H and M-T data show that N enters the cell structure and the films with the single Th2Zn17 phase are obtained when the nitriding temperature varies from 300 to 400℃, thus the maximum value of the coercivity Hc reaches 2561.7Oe. However, the Sm2Fo17 phase decomposes to the StuN nonmagnetic phase and the α-Fe soft magnetic phase with further increasing nitriding temperature, which corresponds to the decreasing Hc. Furthermore, the easy magnetization direction （EMD） is found to locate randomly in the film plane. This texture can not give an excellent MR/Ms higher than the Stoner-Wohlfarth limitation （MR/Ms = 0.5）, which agrees well with the observed low MR/Ms （0.58）. It is suggested that the magnetization reversal process is dominated by the nucleation mechanism according to the initial magnetization curve and the dependence of Hc on the field H.     

Effect of Carbonized Conditions on Residual Strain and Crystallinity Quality of Heteroepitaxial Growth 3C-SiC Films

Heteroepitaxial growth of SiC on n-Si（111） substrates is performed by a low pressure chemicaJ vapor deposition process. The effects of different carbonized temperature and carbonized time on the crystalline quality and the residual strain of 3C-SiC films are discussed. The results show that the residual strain is obviously reduced and the crystalline quality is greatly improved at the best carbonized temperature of 1000℃ and the carbonized time of 5 min. Under these optimized carbonization conditions, thick epitaxial films of about 15 μm with good crystalline quality and low residual strain can be obtained.     

柔性衬底白色有机电致发光器件的制备及其性能

采用以ITO为导电层的柔性透明PET基片作为衬底,以2-(2-羟基苯基)苯并噻唑螯合锌(Zn(BTZ),)作为发光层制备出结构为PET／ITO／PVK：TPD／Zn(BTZ)2／Al明亮的近白色柔性有机小分子电致发光器件。发光的色坐标值为x=0．242,y=0．359,在25V的直流电压驱动下,亮度为1000cd／m^2,量子效率达到了0．30％。并进一步在Zn(BTZ)2中掺入橙红色染料Rubrene,制成PET／ITO／PVK：TPD／Zn(BTZ)2：Rubrene／Al结构器件。实现了纯白色发光(色坐标值：x=0．339,y=0．339),非常接近于白色等能点,驱动电压为25V时器件的亮度达1200cd／m^2,且量子效率达0．35％。最后对器件的发光性能及机理进行了深入的研究和探讨。     

聚合物前驱体衍生SiC纳米棒的光学性质

采用聚硅氮烷前驱体热裂解方法制备SiC纳米棒,并利用SEM、XRD和EDX表征了SiC纳米棒的结构和组成,表明得到的SiC的组分比C：Si接近1：1。用微区Raman和光致发光方法研究了纳米棒的光学性质。观测到SiC的TO模式对应的Raman峰和相邻肩峰。对SiC纳米棒观测到其紫外3．25eV附近强的光致发光峰,我们认为它归结为α型SiC带间的跃迁。通过XRD、Raman和光发射谱,我们推测前驱体热裂解得到的SiC纳米棒是一个混晶,纳米棒的表层是立方晶,而内层主要为a—SiC。     

基于声发射的单晶SiC材料去除机理研究

根据声发射理论,采用金刚石刀具在自动划痕仪上进行SiC单晶塑脆转换的临界条件实验,建立了SiC划痕实验过程中的声发射(AE)信号模型,利用扫描电镜(SEM)观察SiC单晶的表面形貌.结果表明,SiC划痕过程中也存在着明显的声发射Kaiser效应点,表面的划痕和切屑也表明该单晶材料同其它典型硬脆材料如玻璃和硅类似,材料去除存在着塑性到脆性的转换过程,同时分析了划痕过程中的微细粉末状碎屑的产生机理和刀具角度与塑脆转换的关系.     

GaN微米片的制备及性能研究

通过采用化学气相沉积法(CVD),以金属Ga和NH3为原料,在Si (100)衬底和蓝宝石衬底上采用催化剂Ni合成了GaN微米片.利用X射线衍射仪(XRD)、场发射扫描电子显微镜(FESEM)、X-ray能谱仪(EDS)、光致发光谱(PL)和霍尔效应测试仪(HMS-3000)对样品进行表征.结果表明,生成的微米片为六方纤锌矿结构的GaN;样品在360 nm处有一近带边紫外发射峰,在676 nm处有一个因缺陷引起的弱的红光发射峰;不同衬底上产物GaN的电学性能有所不同.最后,对本实验所得的GaN微米片的形成机理进行了分析.     

衬底温度对电子束蒸发ZnS薄膜结构和光学特性的影响

采用电子束蒸发法在不同衬底温度下,150℃、200℃、250℃和300℃,制备了ZnS薄膜;用X射线衍射仪、原子力显微镜、膜厚仪和紫外-可见光-近红外分光光度计分别表征ZnS薄膜的晶体结构、表面形貌和光学特性;并分析了不同衬底温度对薄膜的结构和光学特性的影响.结果表明:在硅衬底上制备的ZnS都为多晶薄膜,具有闪锌矿β-ZnS结构;随衬底温度升高呈(111)晶面高度择优取向,平均晶粒尺寸有所增大,内应力、位错密度、折射率和吸收系数有所减小,禁带宽度随之增大;衬底温度为300℃时制备的薄膜表面均匀致密,呈现较优的结构和光学性能.     

Optically controlled SiCGe/SiC heterojunction transistor with charge-compensation layer

A novel optically controlled SiCGe/SiC heterojunction transistor with charge-compensation technique has been simulated by using commercial simulator.This paper discusses the electric field distribution,spectral response and transient response of the device.Due to utilizing p-SiCGe charge-compensation layer,the responsivity increases nearly two times and breakdown voltage increases 33%.The switching characteristic illustrates that the device is latch-free and its fall time is much longer than the rise time.With an increase of the light power density and wavelength,the rise time and fall time will become shorter and longer,respectively.In terms of carrier lifetime,a compromise should be made between the responsivity and switching speed,the ratio of them reaches maximum value when the minority carrier lifetime equals 90 ns.