金催化化学发光新体系——苯并吡喃化学发光分析法测定金矿中的痕量金

本文提出了一种测定矿样中痕量金的化学发光分析法,氯化6,7-二羟基-2,4-二甲基苯并吡喃-H_2O_2化学发光体系,方法的检出限为7ppb。工作曲线线性范围是10～1000ppbAu,测定的相对标准偏差小于7％。应用本法测定矿样中的金,结果良好。     

Structural Phase Transformations of ZnS Nanocrystalline Under High Pressure

In-situ energy dispersive x-ray diffraction on ZnS nanocrystalline was carried out under high pressure by using a diamond anvil cell. Phase transition of wurtzite of 10nm ZnS to rocksalt occurred at 16.0GPa, which was higher than that of the bulk materials. The structures of ZnS nanocrystalline at different pressures were built by using materials studio and the bulk modulus, and the pressure derivative of ZnS nanocrystalline were derived by fitting the equation of Birch-Murnaghan. The resulting modulus was higher than that of the corresponding bulk material, which indicates that the nanomaterial has higher hardness than its bulk materials.     

长柱形CsI(Tl)闪烁晶体探测器的能量重建

提出了用于TEXONO实验中双端读出的长柱形CsI(Tl)闪烁晶体探测器的两种粒子能量重建方法———“算术平均值能量重建法”和“几何平均值能量重建法”,讨论了两种算法的理论依据和计算方法,并对两种算法进行了比较     

极性晶体外表面电子的量子像势及其极化子的基态能量

本从与真空接触的存在二支声子的半无限极性晶体表面附近极化子的哈密顿算符入手，应用二支模型理论，分别对GaAs和ZnO两种材料计算了外表面电子的量子像势及其极化子的基态能量，计算结果表明，利用二支模型理论求出的外表面极化子的基态能量与利用一支模型理论求出的外表在面极化子的基态能量相差较大，对GaAs，误差约为31.1%, 对ZnO，误差约为14.8%。     

顶部籽晶法生长磁光晶体硼酸铁

本文首次采用顶部籽晶泡生法在敞开体系中生长了出了磁光晶体硼酸铁单晶。选用Ｂ２Ｏ３作自助溶剂，ＬｉＦ作稀释剂，确定了原料配方。对长出的晶体作了初步的物化性能测试。讨论了晶体生长的结果。     

Two New Diterpene Acetylxylosides from Aster veitchianus

Two new acetylxylosides,ent-manool-13-O-β-D-2′-acetylxylopyranoside(1)and entmanool-13-O-β-D-2′,4′-diacetylxylopyranoside(2)were isolated from Aster veitchianus.Their structures were elucidated by spectroscopic methods.     

激光二极管端面抽运的棒状Yb：YAG激光器

分析了影响激光二极管抽运Yb：YAG激光器调Q效率的参量，推导了激光二极管端面脉冲抽运Yb：YAG晶体的速率方程，解出了双程抽运情况下的净抽运量子产率。利用数值计算方法，模拟了净抽运量子产率与晶体长度，抽运光脉冲宽度等关系，得出晶体长度的优化可以提高Yb：YAG激光器输出效率。计算了词Q Yb：YAG激光器的最大增益、最大储能，分析了放大自发辐射对于Yb：YAG能量存储的影响。同时给出了激光二极管端面抽运调Q Yb：YAG优化设计方法。这些分析和计算为实际器件的研制提供参考。     

Low-Temperature Growth of Polycrystalline silicon Films by SiCl4／H2 rf Plasma Enhanced Chemical Vapour Deposition

Polycrystalline silicon film was directly fabricated at 200℃ by the conventional plasma enhanced chemical vapour deposition method from SiCl4 with H2 dilution. The crystallization depends strongly on the deposition power.The maximum crystMlinity and the crystalline grain size are over 80% and 200—50Onm, respectively. The results of energy dispersive spectroscopy and infrared spectroscopy measurements demonstrate that the film is mostly composed of silicon, without impurities such as Cl, N, C and bonded H. It is suggested that the crystallization at such a low temperature originates from the effects of chlorine, i.e., in-situ chemical, etching, in-situ chemical cleaning, and the detachment of bonded H.     

Field Emission from Silicon Nanocrystallite Films with Compact Alignment and Uniform Orientation

Patterned silicon nanocrystallite (SINC) films were fabricated on (100) orientation p-type boron-doped sificon wafer by the hydrogen ion implantation technique and the anodic etching method. The efficient field emission with low turn-on field of about 3.5V/μm at current density of 0.1μA/cm^2 was obtained. The emission current density from the SiNC films reached 1mA/cm^2 under a bias field of about 9.1V/μm. The experimental results demonstrate that there are great potential applications of the SiNC films for fiat panel displays. A surface treatment with hydrogen plasma was performed on the SiNC films and a significant improvement of emission properties was achieved.