Analysis of detection limit to time-resolved coherent anti-Stokes Raman scattering nanoscopy

In the implementation of CARS nanoscopy, signal strength decreases with focal volume size decreasing. A crucial problem that remains to be solved is whether the reduced signal generated in the suppressed focal volume can be detected. Here reported is a theoretical analysis of detection limit （DL） to time-resolved CARS （T-CARS） nanoscopy based on our proposed additional probe-beam-induced phonon depletion （APIPD） method for the low concentration samples. In order to acquire a detailed shot-noise limited signal-to-noise （SNR） and the involved parameters to evaluate DL, the T-CARS process is described with full quantum theory to estimate the extreme power density levels of the pump and Stokes beams determined by saturation behavior of coherent phonons, which are both actually on the order of ~ 109 W/cm2. When the pump and Stokes intensities reach such values and the total intensity of the excitation beams arrives at a maximum tolerable by most biological samples in a certain suppressed focal volume （40-nm suppressed focal scale in APIPD method）, the DL correspondingly varies with exposure time, for example, DL values are 103 and 102 when exposure times are 20 ms and 200 ms respectively.     

227-W output all-fiberized Tm-doped fiber laser at 1908 nm

In this paper, we report that a diode-pumped thulium-doped double clad silica fiber laser can provide powers of up to 227 W at 1908 nm, corresponding to a slope efficiency of 54.3%, and an optical-to-optical efficiency of 51.2%. The output power, to the best of our knowledge, is the highest output at 1908 nm. The beam quality M2 factor is about 1.56. Also discussed in this paper is the dependence of the laser performance on fiber length.     

纳米晶硅的掺杂及表面改性研究(英文)

采用基于密度泛函理论的第一性原理方法(DMOL3程序),在广义梯度近似(GGA)下,计算了硅纳米晶(Si75H76)在B和P掺杂和乙基(—CH2CH3)、异丙基(—CH(CH3)2)表面改性等情形下态密度、结合能及能隙的变化。结果表明:掺杂对体系的禁带宽度(约3.12eV)几乎没有影响,但会引入带隙态;三配位的B掺杂,在禁带中靠近导带约0.8eV位置引入带隙态,三配位的P掺杂在禁带中靠近价带0.2eV位置引入带隙态;四配位的B掺杂,在禁带中靠近价带约0.4eV位置引入带隙态,四配位的P掺杂在禁带中靠近导带约1.1eV位置引入带隙态;且同等掺杂四配位时体系能量要低于三配位;适当的乙基或异丙基表面覆盖可以降低体系的总能量,且表面覆盖程度越高体系能量越低,但在表面嫁接有机基团过多将导致过高位阻,计算时系统不能收敛。     

立方铂纳米粒子的形状变化与熔化特性的分子动力学研究

采用分子动力学方法结合嵌入原子多体势,对立方铂纳米粒子的热稳定性进行了模拟研究.计算结果表明,立方纳米粒子在升温过程中首先转变为由{111}和{100}面所构成的十四面体,然后再转变为球形,最后熔化为液态.通过计算立方铂钠米粒子的统计半径,发现形状转变温度在1250 K左右.尽管形状不同,立方纳米粒子和球形纳米粒子的熔点是相同的. 关键词： 纳米粒子 热稳定性 分子动力学     

ZnO一维纳米结构的形貌调控与亲疏水性研究

分别使用金属、半导体等类型的基片作沉积衬底,采用气相沉积的方法合成了多种ZnO一维纳米结构,如塔状结构、锥状结构、蘑菇状结构、环状结构等等.用扫描电镜,透射电镜等对合成产物的形貌和结构进行了研究,结果发现沉积衬底对合成产物形貌和结构有着重要的影响.同时对合成塔状纳米结构的生长机理做了系统地分析,并研究了其相应的亲疏水性能. 关键词： 纳米结构 气相沉积 形貌调控 结构表征     

纳米氧化锆水悬浮液的稳定性

通过黏度、表面张力、密度及粒度测试等手段研究了球磨剂、球磨时间、pH值、添加剂等因素对纳米氧化锆水悬浮液稳定性的影响。结果表明:球磨时间2h,球磨剂与氧化锆质量比为3.5%,添加剂可用乙二醇,悬浮液pH值为10.0,氧化锆粒径小于15nm时,纳米氧化锆水悬浮液可稳定30天。     

Nanoscale Thermal Response in ZnO Varistors by Atomic Force Microscopy

We report the application of customer-built scanning thermal microscopy （SThM） based on a commercial atomic force microscope to investigate local thermal inhomogeneity of ZnO varistors. The so-called 3ω method, generally used for measuring macroscale thermal conductivity, is set up and integrated with an atomic force microscope to probe the nanoseale thermal property. Remarkably, thermal contrasts of ZnO varistors are firstly imaged by the SThM, indicating the uniform distribution of spinel phases at triple points. The frequency-dependent thermal signal of ZnO varistors is also studied to present quantitative evaluation of local thermal conductivity of the sample.     

多层纳米薄膜结构热物性重构

基于谐波探测技术测量材料导热系数和热扩散系数的基本原理,给出3ω法用于多层纳米薄膜结构热物性实验表征的方法.考虑了层间接触热阻的作用,在频域内定义了热阻抗的概念.理论分析了各层纳米薄膜的导热系数、热扩散系数等热参数对加热膜温度波动影响的敏感性.将敏感系数与实验数据处理相结合,利用三次谐波的实部和虚部分量测量了ZrO2/SiO2增透膜多层膜结构中各层的导热系数和热扩散系数.该方法可用来有效表征其他微纳米结构的热性能.     

铁镧复合氧化物纳米米微粒的制备及其光催化性能

以溶胶-凝胶法制备了纳米铁镧复合氧化物.通过了XRD、TG-DTA等手段,对该氧化物进行了分析.研究了焙烧温度、光催化剂的用量、光照等因素对催化剂光催化降解活性染料的影响.并用红外光谱分析方法验证光催化降解效果.结果表明在适当的用量和700C焙烧并在紫外光照射下铁镧复合氧化物对活性翠蓝KGL和活性B-GFF黑有较强的光催化降解活性.     

Enhanced photocatalytic activity of TiO2 thin film coating on microstructured silicon substrate

Photocatalytic TiO2 thin film is prepared by sol–gel technique on microstructured silicon substrate produced by femtosecond laser cumulative irradiation. The photocatalytic activity is evaluated by the degradation of methylene blue (MB) solution under ultraviolet (UV) irradiation. For 6-ml MB solution with initial concentration of 3.0×10~-5 mol/L, the degradation rate caused by TiO2 thin film of 2-cm~2 area is higher than 70% after 10-h UV irradiation. Microstructured silicon substrate is found to enhance photocatalytic activity of the TiO2 thin film remarkably. The femtosecond laser microstructured silicon substrate is suitable to support TiO2 thin film photocatalysts.