The modified characteristic finite difference fractional steps method for the coupled system of fluid dynamics in porous media and its analysis

For the coupled system of multilayer fluid dynamics in porous media, the modified characteristic finite difference fractional steps method applicable to parallel arithmetic is put forward and two‐dimensional and three‐dimensional schemes are used to form a complete set. Some techniques, such as calculus of variations, energy method, piecewise biquadratic interpolation, multiplicative commutation rule of difference operators, decomposition of high order difference operators and prior estimates are adopted. Optimal order estimates in L² norm are derived to determine the error in the approximate solution. This method has already been applied to the numerical simulation of multilayer fluid dynamics in porous media. © 2003 Wiley Periodicals, Inc. Numer Methods Partial Differential Eq 19: 665–681, 2003.     

Maximal σ‐polynomials of connected 3‐chromatic graphs

In the set of graphs of order n and chromatic number k the following partial order relation is defined. One says that a graph G is less than a graph H if c_i(G) ≤ c_i(H) holds for every i, k ≤ i ≤ n and at least one inequality is strict, where c_i(G) denotes the number of i‐color partitions of G. In this paper the first ? n/2 ? levels of the diagram of the partially ordered set of connected 3‐chromatic graphs of order n are described. © 2003 Wiley Periodicals, Inc. J Graph Theory 43: 210–222, 2003     

On the condition number of matrices arising in the tikhonov regularization method

In this work, we consider the regularization method for linear ill-posed problems. For operators and approximating subspaces satisfying certain conditions and for a specific form of the regularization parameter, upper and lower bounds are given for the condition number of the corresponding discrete problem.     

随机删失场合半参数回归模型参数估计的重对数律‘

本文探讨了随机删失场合半参数回归模型的参数估计问题.考虑半参数回归模型Y =X}}3 + g(T)十。，其中(X,T)’为取值于Kp X [0,1〕上的随机向量，月为1'维未知参数向量，8为定义于【0.1]上的未知函数，。为随机误差，Ee = 0 . Eez = az }。未知，且(X ,T)与。独立，).被一个与之独立的随机变量V所截.此时仅能观察到:Z=min(Y,V),o=1(Y簇V)，参数I3,az的估计量禽及公 z可综合非参数的权函数估计法与参数的最小二乘估计方法得到.本文对核函数的情形得到了念及ar z的精确收敛速度即重对数律.     

狭义相对论效应──运动时钟变慢的计算机模拟演示实验

利用精炼的C语言进行程序设计，定量模拟狭义相结论的运动时钟变慢，并对处于两种不同时空观的时钟运行进行对比，使得时间膨胀效应变得直观。     

On a problem of Zygmund

It is proved that there exists an integrable function on [0, 1]² whose integral is nondifferentiable in each direction belonging to a set everywhere dense in [0, 2π] but is strongly differentiable. Translated fromMatematicheskie Zametki, Vol. 64, No. 5, pp. 749–762, November, 1998.     

In‐line monitoring of UV photopolymerization with a quartz crystal resonator

An in‐line monitoring device using a quartz crystal resonator for thin film polymerization was proposed, and its performance has been evaluated by implementing in the UV polymerization of 2‐hydroxyethyl methacrylate with a photoinitiator of 1‐chloroanthraquinone. Because the variation of resonant resistance of the resonator is proportional to the square root of viscosity change that is closely related to the polymerization degree, the resistance can be used as a measure of the polymerization degree. The resistance measurements were compared with the outcome of instrumental analyses of polymerization degree using an FTIR spectrometer and a gel permeation chromatograph. The experimental results showed that the resistance measurements were consistent with the experimental outcome of the instrumental analyses, and this indicates the effectiveness of the proposed device. Owing to the simplicity and availability of the resonator system, its wide utilization in the monitoring of a variety of film polymerization processes, including photoresistor application, is expected. © 2006 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 44: 2428–2439, 2006     

Lithographic design of photosensitive polyarylates based on reaction development patterning

The factors affecting pattern‐forming properties in reaction development patterning were examined with polyarylates with various bisphenol moieties. The developability of the photosensitive polyarylates was dependent on the properties of the subtituent (R) in the bisphenol moieties. The development time decreased in the following order: R?C(CH₃)₂ > fluorenyl unit ? phenolphthalein unit > C(CF₃)₂ > SO₂. This order agreed with that of the reactivity between the polyarylates and ethanolamine, and these orders can be explained by pK_a of the bisphenol used to prepare the polyarylates. The development with NH₂? R′? OH resulted in successful positive‐tone pattern formation. However, pattern formation with the developers containing NH₂? R′? OCH₃ was unsuccessful. © 2006 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 44: 2694–2706, 2006     

The response of microstructure to processing in a series of poly(siloxaneimide) copolymers

Poly(siloxaneimide) (PSI) segmented copolymers exhibit organized microdomains if the blocks are sufficiently incompatible. As with neat diblock and triblock copolymers, the processing route employed to prepare films of PSI materials is expected to influence the dimensions and/or morphology of the resultant microstructure. In this work, small-angle neutron scattering (SANS) is utilized to characterize the disordered microstructure found in films of a series of PSI copolymers which are subjected to solvent casting and various thermal treatments. Microstructural dimensions such as the periodicity and correlation length are deduced from the Teubner-Strey (TS) model for disordered microemulsions. The scattering intensity of each copolymer up to q = 5.0 nm^?1, where q is the scattering vector, is found to scale as q^?2.8+?0.1. Results indicate that processing the materials as cast films or as melt-pressed films allowed to cool slowly has a small, but discernible, effect on microstructural characteristics. SANS profiles of films quenched from elevated temperatures reveal a clear transition in microdomain periodicity, which correlates well with the glass transition temperature of the imide microphase in these and other materials of similar chemical structure. © 1993 John Wiley & Sons, Inc.