Air‐Stable Lithium Spheres Produced by Electrochemical Plating

Lithium metal is an ideal anode for next‐generation lithium batteries owing to its very high theoretical specific capacity of 3860 mAh g^?1 but very reactive upon exposure to ambient air, rendering it difficult to handle and transport. Air‐stable lithium spheres (ASLSs) were produced by electrochemical plating under CO₂ atmosphere inside an advanced aberration‐corrected environmental transmission electron microscope. The ASLSs exhibit a core–shell structure with a Li core and a Li₂CO₃ shell. In ambient air, the ASLSs do not react with moisture and maintain their core–shell structures. Furthermore, the ASLSs can be used as anodes in lithium‐ion batteries, and they exhibit similar electrochemical behavior to metallic Li, indicating that the surface Li₂CO₃ layer is a good Li⁺ ion conductor. The air stability of the ASLSs is attributed to the surface Li₂CO₃ layer, which is barely soluble in water and does not react with oxygen and nitrogen in air at room temperature, thus passivating the Li core.     

Repair of Pd/α-Al_2O_3 composite membrane with defects

A palladium composite membrane with a large number of defects was repaired using the electroless plating combined with the technique of osmosis. The loose structure of palladium film prepared by the conventional electroless plating was densified. Defects were repaired. Hydrogen selectivity was thus significantly increased without significantly increasing palladium film thickness and reducing hydrogen permeability.     

酸性溶液中NaH2PO2在铂电极上氧化的原位红外光谱研究

用SNIFTIRS和循环伏安法研究酸性溶液中次亚磷酸钠在多晶铂电极上的电氧化机理.分析了0.5mol/LH2SO4+0.1mol/LNaH2PO2溶液中原位红外反射谱图与电极电位的关系,发现在发生反应的电位下Pt电极上的吸附物种有氢原子和H2PO2,最终的氧化产物是H3PO4而不是H2PO3-,据此提出了酸性介质中次亚磷酸根离子在Pt上氧化的新机理.     

Reflective and conductive surface‐silvered polyimide films prepared by surface graft copolymerization and electroless plating

Argon plasma‐pretreated polyimide (PI) films were subjected to UV‐induced surface graft copolymerization with 4‐vinylpyridine(4VP) under atmospheric conditions. Electroless plating of silver was carried out effectively on the 4VP graft copolymerized PI (PI‐g‐P4VP) surface after PdCl₂ activation and in the absence of SnCl₂ sensitization (the Sn‐free process). The surface compositions of the modified PI films were studied by X‐ray photoelectron spectroscopy (XPS). XPS results showed that the PI‐g‐P4VP surface is ready for electroless deposition of silver via the Sn‐free process. The grafted 4VP layer with well‐preserved pyridine groups was used not only as the chemisorption sites for the palladium complexes (without the need for prior sensitization by SnCl₂) during the electroless plating of silver, but also as an adhesion promotion layer for the electrolessly deposited silver. The silver metallized PI films show high reflectivity and conductivity with a surface resistance of 1.5 Ω and a reflectivity of 91.3%, respectively. Copyright © 2007 John Wiley & Sons, Ltd.     

化学镀镍磷镀层及其耐蚀性研究

针对工业实际对提高防护层防腐、耐磨性能的要求,对化学镀镍磷镀层的方法,镀敷液配方等进行了分析,对其腐蚀率进行了测定,并对镀层性能进行了表征;讨论了影响腐蚀率的若干重要因素;对有关工艺进行了优化,从而在多种基质上获得了抗腐蚀性较好的镍磷镀层,初步研究证明,其性能优于电镀方法所获得的镀层.     

Unsupported palladium alloy foil membranes fabricated by electroless plating

It is desirable to create thin (<25 μm), unsupported, defect-free palladium and palladium alloy foils in a cost-effective manner in order to study intrinsic material properties exclusive of support effects. We have developed a novel technique for producing unsupported palladium films by electroless plating upon mirror-finished stainless steel supports followed by mechanical removal. High quality pure palladium films as thin as 7.2 μm were produced. Single gas steady state permeation experiments were performed using hydrogen and nitrogen to examine permeability and selectivity. The pure palladium membranes showed hydrogen permeabilities comparable to cold-rolled unsupported foils, and high H₂/N₂ selectivity. Palladium-copper membranes were prepared by sequential electroless plating of copper onto palladium foils followed by in situ annealing. The annealing process produces films of desired composition with permeabilities comparable to those in the literature. The annealing process does not appear to produce defects in the film, and the membranes thus produced have performed 15 days without increased leak rates.     

预镀铋膜修饰铂电极差分脉冲溶出伏安法测定痕量铅、镉

采用预镀铋膜法修饰铂电极,用该电极对痕量Pd、Cd同时进行了差分脉冲溶出伏安法测定,Pd、Cd在富集中和铋形成类似于汞齐的合金,溶出峰良好。讨论了在不同沉积液和沉积时间下得到的铋膜电极的性能和富集时间、富集电位及底液pH对金属离子测定的影响。在优化的实验条件下,分别对10~100μg/L、20~200μg/L和50~500μg/L3个不同浓度系列的Pb2 、Cd2 进行了同时测定,Pb、Cd溶出峰电流与Pb2 、Cd2 浓度呈良好的线性关系(r≥0.999),Pb2 、Cd2 浓度的线性范围均为10~500μg/L;富集时间为180 s时,Pb2 、Cd2 的检出限分别为0.38μg/L和0.82μg/L。利用本方法测定了蔬菜中Pb的含量,并与原子荧光分析法做了对比,结果令人满意。     

Permeability and electric resistivity of spin-sprayed Zn ferrite films for high-frequency device applications

By spin-spray ferrite plating, an aqueous process, we prepared Zn_xFe_3−xO₄ (0?x?0.97) films at 90 °C on polyimide and glass substrates, on which complex permeability (μ=μ′–jμ″) was measured. As Zn content x increases from 0 to 0.70 static permeability, μ_s, increases from 14 to 119, but natural resonance frequency, f_r, reduces from 1 GHz to 200 MHz. This is because magnetic anisotropy field decreases more rapidly than saturation magnetization. With increasing x DC electric resistivity, ρ, increases, exceeding 50 Ω cm (a measure of the lower limit for the high-frequency application) when x>0.15. Film with x=0.70 has relatively high μ′≈119 and μ″=0 up to 20 MHz, and is promising to be used as MHz core inductors. Film with x=0.36 has relatively high μ′=80 and μ″=0 up to 100 MHz, and it may be used as inductors at the ten MHz range and noise suppression sheets at the hundred MHz range.     

High-temperature oxidation resistant (Cr, Al)N films synthesized using pulsed bias arc ion plating

(Cr, Al)N films were deposited by pulsed bias arc ion plating on HSS and 316L stainless steel substrates. With pulsed substrate bias ranging from −100 V to −500 V, the effect of pulsed bias on film composition, phase structure, deposition rate and mechanical properties was investigated by EDX, XRD, SEM, nanoindentation and scratch measurements. The high-temperature (up to 900 °C) oxidation resistance of the films was also evaluated. The results show that Al contents and deposition rates decrease with increasing pulsed bias and the ratio of (Cr + Al)/N is almost constant at 0.95. The as-deposited (Cr, Al)N films crystallize in the pseudo-binary (Cr, Al)N and Al phases. The film hardness increases with increasing bias and reaches the maximum 21.5 GPa at −500 V. The films deposited at −500 V exhibit a high adhesion force, about 70 N, and more interestingly good oxidation resistance when annealed in air at 900 °C for 10 h.     

Studies of the porosity in electroless nickel deposits on magnesium alloy

In the present paper, the porosity of the plating coating was evaluated by the combination of corrodkote and filter paper, the effects of the plating solution on the porosity were investigated, and the properties of the porous coatings were studied through scanning electron microscopy (SEM) and electrochemical potentiodynamic polarization. The results show that the eriothrome black T indicator used as an indicator of the coating porosity for coatings on magnesium alloy is more effective than magneson indicator and sodium alizarinesulfonate indicator. The porosity in electroless nickel deposits on magnesium alloy was well evaluated by the combination of corrodkote and filter paper. It is revealed that the pores exist on both grain surface and grain boundaries. An affecting trend of the plating bath parameters on the coating porosity was obtained.