Effect of the pore surface modification of an inorganic substrate on the plasma‐grafting behavior of pore‐filling‐type organic/inorganic composite membranes

We have investigated the effect of the surface state and surface treatment of the pores of an inorganic substrate on the plasma‐grafting behavior of pore‐filling‐type organic/inorganic composite membranes. Shirasu porous glass (SPG) was used as the inorganic substrate, and methyl acrylate was used as the grafting monomer. The grafting rate increased as the density of silanol on the SPG substrate increased. This result suggests that radicals are generated mainly at the silanol groups on the pore surface by plasma irradiation. The SPG substrates were treated with silane coupling agents used to control the mass of organic material bonded to the pore surface. The thickness of the grafted layer became thinner as the mass of organic material bonded to the pore surface of SPG increased. This decrease in the thickness of the grafted layer could be explained by the decrease in the penetration depth of vacuum ultraviolet rays contained in plasma having a wavelength of less than 160 nm that generated radicals in the pores of the substrate. The thickness of the grafted layer inside the SPG substrates could be controlled through the control of the mass of organic material bonded to the pore surface of the SPG substrate. © 2005 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 44: 846–856, 2006     

Radiation induced decomposition of halogenated organic compounds in water

Decomposition by ionizing radiations of p-chlorophenol and tetrachloroethylene in synthetic water samples at about 2 mg Cl L⁻¹, has been studied on laboratory-scale experiments. Bicarbonate/carbonate and nitrate ions, at two concentration levels (20 and 200 mg HCO₃⁻¹ and 1 and 50 mg NO₃⁻L⁻) were added to synthetic samples in order to evaluate their influence on decomposition yield. At 5 kGy γ dose level, a quantitative degradation of p-chlorophenol is obtained whereas only qualitative consideration can be drawn on tetracholoroethylene. Comparative study with respect to degradation of p-cholophenol solutions (about 2 mg Cl L⁻¹) by γ-rays and electron beam irradiation treatment at 0.5 kGy dose level, are in progress; preliminary results indicate that irradiation with γ-rays seems to be more efficient in terms of removal efficiency respect to electron beams source.     

Synthesis in solid state, structural regularity and reaction mechanism for [VS_4-Cu_n] clusters

The reaction system (NH4)3VS4/CuCl/PPh3/Et4NBr afforded a series of [VS4-Cun] dusters with various core configurations in the solid state at low heating temperature. The structural regularity of [VS4-Cun] dusters and the influence of the CuCl:(NH4)3VS4 ratio as well as that of reaction temperature and time on the formation of duster core have been summarized. The reaction mechanism of forming V-Cu-S clusters has also been explored.     

抗有机杂质镀镍添加剂对阴极极化性能的影响

研究了有机杂质以及抗有机杂质添加剂对镀镍过程中阴极极化性能的影响．实验结果表明，有机杂质增大了阴极极化，而抗有机杂质添加剂却能减小阴极极化．实验结果还显示，添加剂消除有机杂质污染的效果同其降低阴极极化的能力密切相关     

有机薄膜电致发光器件失效过程的动态观测及分析

对有机薄膜电致发光器件失效的全过程进行了显微动态观察，发现器件工作时，有机层／金属界面形成的气泡逐渐变大变多，最终导致器件完全失效，气泡不仅含有水汽，还存在大量有机气体。     

恒电流吸附计时电位法的研究 Ⅱ.铜、铅的微分吸附计时电位法连测

研究了ＮＨ３／ＮＨ４Ｃｌ底液中，铜、铅与水杨基荧光酮（ＳＡＦ）形成的络合物在悬汞电极上的恒电流吸附计时电位溶出行为。讨论了富集时间，溶液ｐＨ值，溶出恒电流大小及铜、铅浓度比值等对ｄｔ／ｄＥ～Ｅ溶出曲线的影响。并得出了连测铜铅的条件。     

2,3-吡啶二羧酸铜(Ⅰ)配合物的合成与结构

铜配合物具有多变的配位结构,可活化小分子,可用于氧转移、氧化加成、新陈代谢、均相催化等许多领域。还可以用作金属酶的化学模拟和配合物结构及反应性能研究方面[1-3]。本文以2,3 二羧酸 吡啶为辅助配体及[(PPh3)2Cu(BH4)]作为起始原料,室温下,通过取代反应合成了单核铜(Ⅰ)配合物[(PPh3)2Cu(C7H4NO4)],经元素分析、电导、光电子能谱、红外光谱及单晶XRD方法对配合物进行了表征。1　实验部分1 1　仪器和试剂意大利ERBA 1106元素分析仪,JA96 970等离子光谱仪,Nicolet170SX分析仪(CsI压片),AV 300Bruker分析仪(CDCl3溶剂,8…     

芳烃金属配合物在有机合成中的应用

本文讨论了芳烃金属配合物中的芳香部份在与金属配合后性质上的变化,以及这些变化后的性质在有机合成中的应用。     

热活化延迟荧光聚合物及其电致发光器件

热活化延迟荧光(TADF)聚合物,不仅具有小分子TADF材料高的激子利用效率特性,而且还具备分子多样性好、可溶液加工、低成本、以及易实现大面积柔性器件等诸多优势,在近几年受到广泛的关注并展现了良好的应用前景。本文从TADF聚合物分子设计原理、器件结构及发光机理出发,依据TADF聚合物的构筑方法不同,概括了其结构设计策略,详述了各种类型TADF聚合物的分子结构和光电性能及其在有机电致发光器件领域应用的研究进展,最后探讨了TADF聚合物存在的问题,并展望了其发展前景。     

催化动力学光度法测定痕量铜的研究

本研究了在氨水介质中铜（Ⅱ）催化过氧化氢氧化亮黄的褪色反应及其动力学条件，建立了一种超高灵敏、高选择性的测定环境试样中痕量铜的新方法，可测定０．００４～０．５μｇ／２５ｍＬ范围内的铜（Ⅱ）。