Determination of molecular weight distributions of novolac resins by gel permeation chromatography

The number- and weight-average molecular weights of several statistical and high ortho novolac resins were determined using gel permeation chromatography (GPC). The standards used were pure compounds having between 2 and 12 phenol units bridged via methylene linkages. Three series of compounds were studied: (i) those with methylene linkages substituted in only the ortho positions relative to the phenolic hydroxyl group; (ii) those in which all para positions, together with sufficient ortho positions, were used to synthesize the compounds; and (iii) those in which the methylene linkages were substituted at a mixture of ortho and para positions. Such compounds, having known molecular architecture and units similar to the segments of industrial novolac resins, provide for a more exact measurement of the molecular weight than do the commonly used poly(styrene) standards. Using these new standards the number average molecular weights of the resins determined by GPC were in good agreement with the average molecular weight obtained by ¹H-NMR spectra of the resins, particularly for low molecular weight resins. GPC analysis of higher molecular weight resins tends to underestimate the molecular weights because of complications introduced by hydrogen bonding. © 1997 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 35: 1399–1407, 1997     

Novel Photobleachable Deep UV Resists Based on Single Component Nonchemically Amplified Resist System

Summary: Photobleachable deep UV resists were designed by introducing diazoketo groups in polymer side chains. The diazoketo groups undergo the Wolff rearrangement upon irradiation in the deep UV, affording ketenes that react with water to provide base‐soluble photoproducts. The polymers were synthesized by radical copolymerization of 2‐(2‐diazo‐3‐oxo‐butyryloxy)‐ethyl methacrylate, 2‐hydroxyethyl methacrylate, and γ‐butyrolacton‐2‐yl methacrylate. The single component resist showed 0.7 µm line and space patterns using a mercury‐xenon lamp in a contact printing mode.

Scanning electron micrograph of 0.7 µm line and space patterns printed with polymer B at a dose of 70 mJ · cm⁻².     

发展中的电子化工材料

本文介绍了国内外电子化工材料部分大类品种的现状及发展趋向,并提出至2000年发展我国电子化工材料的措施和建议。     

Isothermal cure kinetics of epoxy/phenol‐novolac resin blend system initiated by cationic latent thermal catalyst

The investigation of the cure kinetics of a diglycidyl ether of bisphenol A (DGEBA)/phenol‐novolac blend system with different phenolic contents initiated by a cationic latent thermal catalyst [N‐benzylpyrazinium hexafluoroantimonate (BPH)] was performed by means of the analysis of isothermal experiments using a differential scanning calorimetry (DSC). Latent properties were investigated by measuring the conversion as a function of curing temperature using a dynamic DSC method. The results indicated that the BPH in this system for cure is a significant thermal latent initiator and has good latent thermal properties. The cure reaction of the blend system using BPH as a curing agent was strongly dependent on the cure temperature and proceeded through an autocatalytic kinetic mechanism that was accelerated by the hydroxyl group produced through the reaction between DGEBA and BPH. At a specific conversion region, once vitrification took place, the cure reaction of the epoxy/phenol‐novolac/BPH blend system was controlled by a diffusion‐control cure reaction rather than by an autocatalytic reaction. The kinetic constants k₁ and k₂ and the cure activation energies E₁ and E₂ obtained by the Arrhenius temperature dependence equation of the epoxy/phenol‐novolac/BPH blend system were mainly discussed as increasing the content of the phenol‐novolac resin to the epoxy neat resin. © 2000 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 38: 2945–2956, 2000     

Laser nanofabrication in photoresists and azopolymers

Recent progress in the field of single‐ and two‐photon nanofabrication, both 2‐ and 3‐dimensional, in photopolymerizable resins and in films of photoisomerizable azopolymers are reviewed. The basic processes as well as technological advances and applications of nanofabrication by light are discussed. Recent advances and achievements in polymer photomechanics and light‐activated molecular movement in azopolymers are also reviewed.