Pixel-based partially coherent image method for maskless lithography system

Maskless lithography (ML) provides a fast and low-cost method for projecting the images of IC or micro features onto photoresist. However, it needs an efficient simulation method to evaluate the performance of lithography process. In this paper, a pixel-based partially coherent image method for digital micro-mirror device (DMD) based ML is proposed based on the linear invariant theory. In our method, the mask is sampled by DMD pixel (each pixel corresponding to each micro-mirror) and expressed by rect function. Using the shift theory of Fourier transform and the stacked pupil operator approach, we build a matrix Φ for system response function of rect function. If the DMD pixel state matrix is S, then the aerial image can be calculated with two matrix multiplication I(x,y) = SΦ.     

A novel method to measure coma aberration of projection system

A novel method to measure coma aberration by pattern displacements at different defocus positions is proposed in this paper. The effect of defocus on coma-induced pattern displacement is analyzed. The measuring principle of the method is described in detail. Using the simulation program PROLITH, the proportionality factors between pattern displacement and coma aberration at different defocus positions are calculated. It is proved that the method is simple to perform and the measurement accuracy of coma can increase approximately by 25% by this novel method.     

X光透镜及其应用

着重介绍了Ｘ光透镜的原理，制作方法，及其在Ｘ光产业中的应用和发展前景。     

Manufacturing at Nanoscale: Top-Down,Bottom-up and System Engineering

The current nano-technology revolution is facing several major challenges: to manufacture nanodevices below 20 nm, to fabricate three-dimensional complex nano-structures, and to heterogeneously integrate multiple functionalities. To tackle these grand challenges, the Center for Scalable and Integrated NAno-Manufacturing (SINAM), a NSF Nanoscale Science and Engineering Center, set its goal to establish a new manufacturing paradigm that integrates an array of new nano-manufacturing technologies, including the plasmonic imaging lithography and ultramolding imprint lithography aiming toward critical resolution of 1–10 nm and the hybrid top-down and bottom-up technologies to achieve massively parallel integration of heterogeneous nanoscale components into higher-order structures and devices. Furthermore, SINAM will develop system engineering strategies to scale-up the nano-manufacturing technologies. SINAMs integrated research and education platform will shed light to a broad range of potential applications in computing, telecommunication, photonics, biotechnology, health care, and national security.     

微接触印刷法制造聚合物多层次准三维立体微结构

直接用聚合物稀溶液作为“印墨”进行微接触印刷,制作了诸如聚苯乙烯和聚甲基丙烯酸甲酯等聚合物的微细结构,通过重复交叉盖印得到多层次准三维立体微结构,并用可聚合的双(甲苯磺酸)-2,4-己二炔-1,6-二醇脂的丙酮稀溶液作微接触印刷,观察了微条纹上的聚合.对聚合物溶液的微接触印刷的过程中溶剂挥发等因素的影响进行了观察分析,结果表明,溶剂挥发时间对微图形的准确复制是十分重要的,过长或过短的溶剂挥发时间都不利于得到清晰精确的微结构.     

X射线光刻技术的进展及问题

Ｘ射线光刻是一种能满足下世纪初超大规模集成电路（ＶＬＳＩ）生产的深亚微米图形加工技术。论述了这种光刻技术的发展历史及近年来的主要进展。重点讨论了在Ｘ射线源、接近式曝光和全反射投影曝光等方面取得的成就与存在的问题。展望了这种技术的发展前景     

1:1分步亚微米光刻镜头

本文介绍一个数值孔径0.4、视场10×10mm~2可用于1:1分步投影光刻机的镜头的光学设计及其模型实验结果.光学设计在Wynne-Dyson的1:1折反式系统的基础上,对该系统作了某些改变.实验结果表明,该镜头具有亚微米的光刻分辨率.     

用无衍射光子束写入细微图形的CAM技术

本文提出了用无衍射光子束写入细微图形的新方法,从理论上论证了无衍射光子束的生成机理.设计了无衍射光子束的发生装置.介绍了已研制成功的CAM光刻机.     

自支撑透射光栅的设计、制作和测试

采用标量衍射理论和严格耦合波理论分别计算和讨论了金自支撑透射光栅的衍射效率随波长和光栅周期变化的情况并设计了光栅的结构参数.制作了周期为300 nm、线宽/周期比为055、厚度为200 nm、总面积为1 mm×1 mm、有效面积比为65%的金自支撑透射光栅.在国家同步辐射实验室检测了该光栅在55—38 nm波长范围内的绝对衍射效率.检测结果表明所制作的光栅在8 nm附近具有接近10%的最大衍射效率,并且该光栅对于波长15—35 nm范围内的极紫外波段具有基本稳定的衍射效率. 关键词： 自支撑透射光栅 电子束光刻 电镀