用于先进半导体制程的光刻反向计算技术(ILT)

此篇论文将介绍一个用于半导体光罩上图样设计以及可用于实际生产的光刻反向计算技术（ILT）。在论文中将讨论有关ILT的最新发展，包括在超成像极限协助图样（SRAF）的生成，可增加制程宽容度的ILT，以及如何生成满足光罩生产标准的图样等方面。从内部的研究结果和客户的使用结果可以看出，ILT已经不再只是一种用于研究的工具，而是已经可以用于先进半导体制程的大规模生产。在对各个环节优化之后，ILT可以增加制程的宽容度，同时将光罩的成本控制在可以接受的水平。     

Programmable Engineering of a Biosensing Interface with Tetrahedral DNA Nanostructures for Ultrasensitive DNA Detection

Self‐assembled DNA nanostructures with precise sizes allow a programmable “soft lithography” approach to engineer the interface of electrochemical DNA sensors. By using millimeter‐sized gold electrodes modified with several types of tetrahedral DNA nanostructures (TDNs) of different sizes, both the kinetics and thermodynamics of DNA hybridization were profoundly affected. Because each DNA probe is anchored on an individual TDN, its lateral spacing and interactions are finely tuned by the TDN size. By simply varying the size of the TDNs, the hybridization time was decreased and the hybridization efficiency was increased. More significantly, the detection limit for DNA detection was tuned over four orders of magnitude with differentially nanostructured electrodes, and achieved attomolar sensitivity with polymeric enzyme amplification.     

Fast Photoresponse and Long Lifetime UV Photodetectors and Field Emitters Based on ZnO/Ultrananocrystalline Diamond Films

We have designed photodetectors and UV field emitters based on a combination of ZnO nanowires/nanorods (ZNRs) and bilayer diamond films in a metal–semiconductor–metal (MSM) structure. The ZNRs were fabricated on different diamond films and systematic investigations showed an ultra‐high photoconductive response from ZNRs prepared on ultrananocrystalline diamond (UNCD) operating at a lower voltage of 2 V. We found that the ZNRs/UNCD photodetector (PD) has improved field emission properties and a reduced turn‐on field of 2.9 V μm^?1 with the highest electron field emission (EFE) by simply illuminating the sample with ultraviolet (UV) light. The photoresponse (I_photo/I_dark) behavior of the ZNRs/UNCD PD exhibits a much higher photoresponse (912) than bare ZNRs (229), ZNRs/nanocrystalline diamond (NCD; 518), and ZNRs/microcrystalline diamond (MCD; 325) under illumination at λ=365 nm. A photodetector with UNCD films offers superior stability and a longer lifetime compared with carbon materials and bare ZNRs. The lifetime stability of the ZNRs/UNCD‐based device is about 410 min, which is markedly superior to devices that use bare ZNRs (92 min). The ZNRs/UNCD PD possesses excellent photoresponse properties with improved lifetime and stability; in addition, ZNRs/UNCD‐based UV emitters have great potential for applications such as cathodes in flat‐panel displays and microplasma display devices.     

Direct On‐Surface Patterning of a Crystalline Laminar Covalent Organic Framework Synthesized at Room Temperature

We report herein an efficient, fast, and simple synthesis of an imine‐based covalent organic framework (COF) at room temperature (hereafter, RT‐COF‐1 ). RT‐COF‐1 shows a layered hexagonal structure exhibiting channels, is robust, and is porous to N₂ and CO₂. The room‐temperature synthesis has enabled us to fabricate and position low‐cost micro‐ and submicropatterns of RT‐COF‐1 on several surfaces, including solid SiO₂ substrates and flexible acetate paper, by using lithographically controlled wetting and conventional ink‐jet printing.     

Facile fabrication of metallic nanostructures by tunable cracking and transfer printing

You crack me up: A topographically patterned PDMS stamp was coated with thin metal film and swelled under organic vapor to induce the tunable cracking of the brittle film into metallic nanostructures (see SEM images, scale bars 1?μm). UV/Vis spectra, OLED efficiency, and SERS spectra demonstrate the fine controllability of the metallic nanostructures, the well-ordered and highly regulable surface plasmons, and the facile fabrication process.     

Pixel-based partially coherent image method for maskless lithography system

Maskless lithography (ML) provides a fast and low-cost method for projecting the images of IC or micro features onto photoresist. However, it needs an efficient simulation method to evaluate the performance of lithography process. In this paper, a pixel-based partially coherent image method for digital micro-mirror device (DMD) based ML is proposed based on the linear invariant theory. In our method, the mask is sampled by DMD pixel (each pixel corresponding to each micro-mirror) and expressed by rect function. Using the shift theory of Fourier transform and the stacked pupil operator approach, we build a matrix Φ for system response function of rect function. If the DMD pixel state matrix is S, then the aerial image can be calculated with two matrix multiplication I(x,y) = SΦ.