Improvement of solar cell efficiency by applying Si3N4 nanopattern on glass substrate

A cylindrical Si₃N₄ nanopattern whose heights was 200 nm was fabricated on a glass substrate, and an aluminum-doped zinc oxide (AZO) layer was grown on the nanopatterned glass substrate. The nanopattern was applied to an amorphous silicon solar cell in order to increase the light-scattering effect, thus enhancing the efficiency of the solar cell. The reflectance of the solar cell on the Si₃N₄ nanopattern decreased and its absorption increased. Compared to a flat substrate, the short-circuit current density (J_sc) and conversion efficiency of a solar cell on the Si₃N₄ nanopatterned substrate were improved by 17.9% and 24.2%, respectively, as determined from solar simulator measurements.     

Future of the Particle Replication in Nonwetting Templates (PRINT) Technology

Particle replication in nonwetting templates (PRINT) is a continuous, roll‐to‐roll, high‐resolution molding technology which allows the design and synthesis of precisely defined micro‐ and nanoparticles. This technology adapts the lithographic techniques from the microelectronics industry and marries these with the roll‐to‐roll processes from the photographic film industry to enable researchers to have unprecedented control over particle size, shape, chemical composition, cargo, modulus, and surface properties. In addition, PRINT is a GMP‐compliant (GMP=good manufacturing practice) platform amenable for particle fabrication on a large scale. Herein, we describe some of our most recent work involving the PRINT technology for application in the biomedical and material sciences.     

Scaling Up DNA Origami Lattice Assembly

The surface-assisted hierarchical assembly of DNA origami nanostructures is a promising route to fabricate regular nanoscale lattices. In this work, the scalability of this approach is explored and the formation of a homogeneous polycrystalline DNA origami lattice at the mica-electrolyte interface over a total surface area of 18.75 cm² is demonstrated. The topological analysis of more than 50 individual AFM images recorded at random locations over the sample surface showed only minuscule and random variations in the quality and order of the assembled lattice. The analysis of more than 450 fluorescence microscopy images of a quantum dot-decorated DNA origami lattice further revealed a very homogeneous surface coverage over cm² areas with only minor boundary effects at the substrate edges. At total DNA costs of € 0.12 per cm², this large-scale nanopatterning technique holds great promise for the fabrication of functional surfaces.     

Tuning the phase transition of ZnO thin films through lithography: an integrated bottom‐up and top‐down processing

An innovative approach towards the physico‐chemical tailoring of zinc oxide thin films is reported. The films have been deposited by liquid phase using the sol–gel method and then exposed to hard X‐rays, provided by a synchrotron storage ring, for lithography. The use of surfactant and chelating agents in the sol allows easy‐to‐pattern films made by an organic–inorganic matrix to be deposited. The exposure to hard X‐rays strongly affects the nucleation and growth of crystalline ZnO, triggering the formation of two intermediate phases before obtaining a wurtzite‐like structure. At the same time, X‐ray lithography allows for a fast patterning of the coatings enabling microfabrication for sensing and arrays technology.     

The influence of Au-nanoparticles presence in PDMS on microstructures creation by ion beam lithography

3D microstructures in pure poly(dimethylsiloxane) (PDMS) and PDMS with embedded Au nanoparticles were prepared by ion beam lithography without any further etching. Two mega-electron volts helium and 10 MeV oxygen ions were used for ion microstructuring. Parallel lines of 1 mm in length and 10 μm in thickness were fabricated for investigation of the effect of the nanoparticles presence in the polymer on the surface morphology of the created microstructures. The created microstructures were checked by optical microscope. Infrared (IR) spectrometry was used to study the effect of the ions type and fluence on the chemical changes of the material. Atomic force microscopy was used for the fine detail study as well as for checking the microstructure quality. Analysis revealed an increased radiation resistance of the nanocomposite compared to the pure PDMS. Shrinkage is proportional to the fluence, but the maximum value for both materials is limited by saturation. 3D microstructure in modified PDMS obtained at the same irradiation condition as pure PDMS is characterized by its smaller height. Obtaining the microstructure in nanocomposite of the same height as in pure PDMS by increasing the fluence can be impossible due to saturation of shrinkage and/or radiation-induced heating of the material.     

Complex three-dimensional microparticles from microfluidic lithography

Complex 3D microparticle, as an emerging and attractive field, has attracted more and more attention due to its versatile morphologies and broad range of applications. In this review, we provide an overall recent progress in 3D microparticles fabricated by microfluidic lithography. This review will focus on the synthesis mechanisms, synthesis process, the resultant 3D microparticles, and their applications. Finally, we will look into the future trends in complex 3D microparticles. This review will be beneficial for researchers in numerous fields, including functional materials, sensors, encryption, and biomedical engineering.     

High-refractive index acrylate polymers for applications in nanoimprint lithography

The development of polymeric optical materials with a higher refractive index,transparency in the visible spectrum region and easier processability is increasingly desirable for advanced optical applications such as microlenses,image sensors,and organic light-emitting diodes.Most acrylates have a low refractive index(around 1.50)which does not meet the high perfo rmance requirements of advanced optical materials.In this research,three novel acrylates were synthesized via a facile one-step approach and used to fabricate optical transparent polymers.All of the polymers reveal good optical properties including high transparency(≥90%)in the visible spectrum region and high refractive index values(1.6363)at 550 nm.Moreover,nanostructures of these acrylate polymers with various feature sizes including nanogratings and photonic crystals were successfully fabricated using nanoimprint lithography.These results indicate that these acrylates can be used in a wide range of optical and optoelectronic devices where nanopatterned films with high refractive index and transparency are required.     

Enhanced Photochromism of Diarylethene Induced by Excitation of Localized Surface Plasmon Resonance on Regular Arrays of Gold Nanoparticles

Localized surface plasmon resonance (LSPR) excitation on the photochromic reaction of a diarylethene derivative (DE) was studied by surface enhanced Raman scattering (SERS). UV and visible light irradiations transform reversibly DE between open-form (OF) and closed-form (CF) isomers, respectively. A mixture of PMMA and DE (either OF or CF isomer) was spin-coated onto gold nanorods (GNRs) arrays, designed by electron beam lithography, with two localized surface plasmon resonances (LSPR) at distinct wavelengths, due to their anisotropy. The photochromic reaction rates from CF to OF isomers, under LSPR excitation, were monitored from SERS spectral changes under different polarizations, on the same GNR substrate to compare the effect of LSPR field strength. It appears that the photoisomerization rate was faster when LSPR was excited with the polarization parallel to the GNR long axis. The present results highlight a potential genuine mechanism, from near field LSPR excitation, involved in the photochromic enhancement of diarylethene photochromes.     

分辨力增强技术的频谱分析

离轴照明和衰减型相移掩模作为重要的分辨力增强技术,不仅可以提高光刻的分辨力,同时还可以改善成像焦深,扩大光刻工艺窗口,实现65~32 nm分辨成像。从频谱的角度分析了离轴照明和衰减型相移掩模对成像系统交叉传递函数和像场空间频率分布的影响,研究这两种技术的物理光学本质,由此进一步优化光学成像系统设计、分辨力增强技术和确定设备使用的参量。对分辨力增强技术的频谱分析研究表明,分辨力增强技术通过调整像场频谱分布,改善了光学光刻的图形质量。对于65 nm密集图形,离轴照明和相移掩模结合后可以使成像衬比度最高达到0.948,工艺窗口在5%曝光范围内焦深达到0.51μm。     

基于分步式压印光刻的激光干涉仪纳米级测量及误差研究

针对在未做隔离保护处理的环境中,基于Michelson干涉原理的激光干涉仪测量系统存在严重的干扰误差,不适合分步式压印光刻纳米级对准测量的要求.采用Edlen公式的分析及计算,不仅在理论上揭示出环境温度、湿度、气压等变化对激光干涉仪测量准确度的影响,而且证明影响测量准确度的最大干扰源是空气流动的结果.通过气流隔离措施和系统测量反馈校正控制器,能够实时补偿激光干涉仪两路信号的相差.最终,测量漂移误差在10 min内由13 nm降低到5 nm以内,满足压印光刻在100 mm行程中达到20 nm定位准确度要求.