Electrodeposition in Ionic Liquids

Due to their attractive physico‐chemical properties, ionic liquids (ILs) are increasingly used as deposition electrolytes. This review summarizes recent advances in electrodeposition in ILs and focuses on its similarities and differences with that in aqueous solutions. The electrodeposition in ILs is divided into direct and template‐assisted deposition. We detail the direct deposition of metals, alloys and semiconductors in five types of ILs, including halometallate ILs, air‐ and water‐stable ILs, deep eutectic solvents (DESs), ILs with metal‐containing cations, and protic ILs. Template‐assisted deposition of nanostructures and macroporous structures in ILs is also presented. The effects of modulating factors such as deposition conditions (current density, current density mode, deposition time, temperature) and electrolyte components (cation, anion, metal salts, additives, water content) on the morphology, compositions, microstructures and properties of the prepared materials are highlighted.     

A Sensitive Biosensor for Determination of Cu2+ by One‐step Electrodeposition

A simple one‐step electrodeposition method is described to fabricate three dimensional ordered macroporous chitosan?prussian blue?single walled carbon nanotubes (3DOM CS?PB?SWCNTs) film onto the gold electrode surface to fabricate a copper ions (Cu²⁺)‐specific DNAzyme biosensor. The new sensing strategy for sensitive and selective detection of Cu²⁺ was based on Au nanorods (AuNRs) as signal amplification labels. The electrochemical signal of glucose increased with the concentration of Cu²⁺ increasing. The morphologies and electrochemistry of the composites were investigated by using scanning electron microscopy (SEM), transmission electron microscopy (TEM) and electrochemical techniques including cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS) and so on. Linear correlations of copper ion concentration were obtained in the range from 10^?18 M to 10^?5 M, achieving with a limit of detection of 10^?19 M (S/N=3). Parameters affecting the biosensor response such as temperature, the cleavage time and the time of hybridization were optimized. This biosensor showed a wide range, low detection limit, good reproducibility and high stability. Additionally, these striking properties endow the biosensor with a great promise for analytical applications.     

Nafion effect on the lead dioxide electrodeposition kinetics

Electrodeposition of lead dioxide in the presence of Nafion in solution is described by a four-stage kinetic scheme. The limiting stage at low polarizations is that of the second-electron transfer, and at high polarizations, the stage of delivery of lead compounds to the electrode surface. Nafion adsorption at the oxide profoundly affects the process kinetics.     

水溶液中Ni-La-P合金的电沉积行为

为了开发含稀土的功能材料,我们研究了从水溶液中电沉积Ni-La-P合金工艺[1].刘淑兰等[2]报道了电沉积的Ni-La合金上的阴极析氢行为,但未见Ni-La合金电沉积行为的报道.本文采用动电位扫描法,研究了电沉积Ni-La-P合金过程中,镀液中的配体、H3PO3和Ni2 离子的作用.采用动电位扫描法测量合金电沉积时的阴极极化曲线.所用仪器有DHW型恒电位仪（延边电化学仪器厂）,YEW-TYPE-3086型X-Y函数记录仪（四川仪表四厂）.电极：阴极为1cm2铜片,阳极为5cm2Pt片,参比电极：饱和甘汞电极（SCE）.实验溶液广：NiCl2·6H2O25g/L,NH4Cl9g/L,L1-…     

Polypyrrole electrodeposition on inorganic semiconductors CuInSe2 and CuInS2 for photovoltaic applications

Thin polypyrrole (PPy) layers with an average thickness of about 0.5 μm were deposited, using potentiostatic and galvanostatic techniques, on CuInSe₂ (CISe) structures prepared electrochemically on glass/ITO substrates and on CuInS₂ (CIS) structures fabricated on Cu tape substrates. The polymer layer of p-type is considered as an alternative to the traditional buffer layer and window layer in the conventional cell structure. The deposition proceeded from an aqueous solution containing sodium naphthalene-2-sulfonate as a dopant. In order to prepare stable PPy films of high quality with a good adherence to the surface of inorganic semiconductors CIS and CISe, the optimal concentrations of reagents, current densities and electrodepositing potentials were selected experimentally. Electrochemical polymerization of pyrrole to PPy on CIS surfaces is faster under white light irradiation and the polymerisation starts at lower potential than in the dark. Significant photovoltage and photocurrent of the fabricated CISe/PPy and CIS/PPy structures have been observed under standard white light illumination.     

以SBA-16为模板电沉积生长多孔氧化铁纳米线阵列

采用电化学沉积法以Mn改性的三维体心立方结构的介孔SBA-16膜为模板制备Fe纳米线.沉积Fe后的SBA-16膜以2%HF溶解SiO₂骨架,样品于550℃焙烧4 h.SEM和TEM的研究结果显示,所制备的Fe₂O₃纳米线互相平行,孔径均匀.XRD、电子衍射及HRTEM研究表明Fe₂O₃纳米线具有(多孔)单晶结构.     

脉冲电沉积抑制锂枝晶生成的研究

采用脉冲充电方法替代传统充电方法,研究了在有机电解液 0.5 mol·L^-1 LiBr/PC (碳酸丙烯酯)中,在铜电极上沉积锂的表面变化. 扫描电镜观测结果显示,在传统直流充电时电极表面明显地出现了枝晶,而使用脉冲充电时能够抑制枝晶的生长. 交流阻抗测试结果显示,在占空比为 0.5 时,沉积锂表面固体电解质界面(solid electrolyte interphase,SEI)膜电阻最大,沉积锂表面枝晶较少;单次脉冲电沉积时间过长,会使沉积锂表面 SEI 膜电阻减小,沉积锂表面枝晶增加;电流密度大于等于 2 mA·cm^-2时,脉冲电沉积可有效抑制枝晶生长.     

激光刻蚀模板中电沉积特殊结构CIGS薄膜

本文利用激光刻蚀模板,在水溶液中电沉积制备金属铜薄膜,讨论了温度、电流、硫酸铜浓度对薄膜形貌的影响. 采用SEM对制备的铜薄膜进行表征,结果表明在沉积温度为30 ℃,沉积电流为4 A·dm^-2(表观工作电流密度),硫酸铜浓度在20 ~ 50 g·L^-1的水溶液中电沉积可以得到中空馒头状和开口碗状结构的铜薄膜. 利用激光刻蚀模板,在离子液体1-丁基-3-甲基咪唑三氟甲磺酸盐([BMI][TfO]) - 30 Vol%丙醇混合电解质中电沉积CIGS薄膜,研究了沉积电势、沉积时间对薄膜形貌的影响. SEM观察发现,在沉积电势为-1.8 V,沉积时间为1.5 h条件下电沉积可以得到近似柱状的簇状花束样的CIGS薄膜, 电沉积铜后再进一步电沉积CIGS,得到了均匀有序的鼓包柱状结构的Cu/CIGS复合薄膜. 用恒电势方波法对制备的薄膜真实表面积进行测试,计算结果表明,与无模板电沉积制备的CIGS薄膜相比,激光刻蚀模板法制备的Cu/CIGS复合薄膜的表面积提高了约8倍.     

Electrodeposition of BixSb2−xTey thermoelectric thin films from nitric acid and hydrochloric acid systems

The electrochemical behaviors of Bi^III, Te^IV and Sb^III single ions and their mixtures were investigated in nitric acid and hydrochloric acid system separately. Based on which, Bi_xSb_2−xTe_y thermoelectric films were prepared by potentiostatic electrodeposition from the solutions with different concentrations of Bi^III, Te^IV and Sb^III in the two acid systems. The morphologies, compositions, structures, Seebeck coefficients and resistivities of the deposited thin films were characterized and compared by ESEM (or FESEM), EDS, XRD, Seebeck coefficient measurement system and four-probe resistivity measuring device respectively. The results show that although Bi_xSb_2−xTe_y thermoelectric thin film which structure is consistent with the standard pattern of Bi_0.5Sb_1.5Te₃ can be gained in both of the two acid solutions by adjusting the deposition potential, their morphologies and thermoelectric properties have big differences in different acid solutions.     

多孔不锈钢基二氧化锰薄膜电极的制备及电容特性

用电化学方法制备了一种多孔不锈钢基二氧化锰薄膜电极。 在不锈钢基体上以聚乙二醇辛基苯基醚（Triton X-100）在水溶液中形成的液晶作掩膜,通过电化学腐蚀制备了多孔基体电极,用恒电位方法在基体上沉积二氧化锰薄膜。 用扫描电子显微镜对二氧化锰薄膜电极形貌进行了考察,循环伏安法和充放电曲线法测试了二氧化锰薄膜电极的电容。 结果表明,腐蚀后的不锈钢基体呈现多孔特征,孔分布无规律,孔径大小从几十纳米到几百纳米不等,沉积的二氧化锰呈颗粒状,直径为80~90 nm。 扫描速率为20 mV/s,沉积电量0.4 C/cm2时,循环伏安法测得的二氧化锰薄膜电极的质量比电容达400 F/g;沉积电量4~5 C/cm2时,面积比电容达到320 ×10-3 F/cm2,此时的质量比电容仍保持在200 F/g左右。 实验结果表明,多孔不锈钢基二氧化锰薄膜电极在超级电容器领域有潜在的应用前景。