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1.
It is thought that the extensive industrial use of arsenic, gallium and indium, which have applications as the materials for III–V semiconductors, will increase human exposure to these compounds in the near future. We have undertaken the development of new biological indicators for assessing exposure to these elements. Element-specific alterations in protein synthesis patterns were expected to occur following exposure to arsenic compounds. We examined alterations in protein synthesis in primary cultures of rat kidney proximal tubule epithelial cells by sodium arsenite, gallium chloride and indium chloride, utilizing two-dimensional gel electrophoresis. After incubation with the chemicals for 20 h, newly synthesized proteins were labeled with [35S]methionine. A protein with a molecular weight (Mr) of 30 000 was markedly induced on exposure to 10 μM arsenite or 300 μM gallium chloride, and synthesis of proteins with Mr values of 85 000, 71 000, 65 000, 51 000, 38 000 and 28 000 were also increased by exposure to arsenite and gallium chloride. No significant changes were observed upon exposure to indium. Some of these increased proteins could be heat-shock proteins.  相似文献   
2.
Pancreatic cancer has an extremely poor prognosis, due, in part, to lack of methods for early diagnosis. The present study was designed to evaluate the potential of labeling low‐density lipoprotein (LDL) with a radionuclide using a lipid chelating agent, bis(stearylamide) of diethylenetriaminepentaacetic acid (L), to detect pancreatic tumors by gamma‐scintigraphy. Previous studies indicated that the difficulty of visualization of pancreatic tumors was due to their poor vascularization. This study compares the ability of two radiotracers, 111In–L–LDL and 153Gd–L–LDL to target highly vascularized rat pancreatic tumors (AR4‐2J) implanted in nude mice. Biodistribution studies showed that the tumor uptake of 111In–L–LDL and 153Gd–L–LDL tracers was twofold and fivefold higher respectively than with the controls (111In citrate and 153Gd citrate respectively). These tracers would thus be suitable for scintigraphic imaging. We show here that LDL could be employed as a delivery system for tracers such as 111In or 153Gd when these two radionuclides are complexed by a lipid‐chelating anchor, and that 111In–L–LDL and 153Gd–L–LDL enabled better visualization of the pancreatic tumor tissues, with a better result with 153Gd–L–LDL. Copyright © 2004 John Wiley & Sons, Ltd.  相似文献   
3.
The performance of high power transistor devices is intimately connected to the substrate thermal conductivity. In this study, the relationship between thermal conductivity and dislocation density is examined using the 3 omega technique and free standing HVPE GaN substrates. Dislocation density is measured using imaging cathodoluminescence. In a low dislocation density regime below 105 cm−2, the thermal conductivity appears to plateau out near 230 W/K m and can be altered by the presence of isotopic defects and point defects. For high dislocation densities the thermal conductivity is severely degraded due to phonon scattering from dislocations. These results are applied to the design of homoepitaxially and heteroepitaxially grown HEMT devices and the efficiency of heat extraction and the influence of lateral heat spreading on device performance are compared.  相似文献   
4.
A new ammonium indium phosphate (NH4)In(OH)PO4 was prepared by hydrothermal reaction in the In2O3-NH4H2PO4-NH3/OH system (T=200°C, autogenous pressure, 7 days). The formula (NH4)In(OH)PO4 was determined on the basis of chemical and thermal analysis (TG/DSC), X-ray powder diffraction and IR-spectroscopy. (NH4)In(OH)PO4 crystallizes in the tetragonal system with space group P43212 (No. 96); a=9.4232(1) Å, c=11.1766(1) Å, V=992.45(2) Å3; Z=8. The crystal structure was refined by the Rietveld method (Rw=6.35%, Rp=5.10%). The second-harmonic generation study confirmed that structure of (NH4)In(OH)PO4 does not have a center of symmetry. The cis-InO4(OH)2 octahedra form helical chains, parallel to the c-axis. The In-O-In bonds are nearly equidistant. The chains are interconnected by phosphate tetrahedra and create tunnels containing the NH4+ ions along the c-axis. (NH4)In(OH)PO4 is isostructural with RbIn(OH)PO4.  相似文献   
5.
分别通过VLS和VS生长机制得到了Si3N4纳米线和纳米带.产物经X射线衍射(XRD)、扫描电镜(SEM)、透射电镜(TEM)等表征手段进行了分析.FTIR图谱表明它们在800~1100cm-1的波数范围内有一个宽的吸收带,这是Si-N键伸缩振动模式的典型吸收带.它们的室温光致发光图谱显示,在420nm左右都有一很强的发射带,表明其将在纳米光电器件中有潜在应用.另外,Si3N4纳米线发光峰与纳米带的发光相比有少许蓝移(蓝移约4nm),这可能和晶须尺寸的少许差别有关.至于纳米带的发光强度大于纳米线的原因,可能是纳米带的比表面积相对较大,有利于悬键的形成,从而导致材料结构内缺陷的浓度较大.  相似文献   
6.
Multireference configuration interaction calculations are carried out on 11 Λ-S low-lying electronic states of indium dimers. The states are investigated with spin-orbit pseudopotentials via the state-interacting method, and characterized by fitted spectroscopic constants based on computed potential energy curves. The vibrational structures of the double-potential well 0+g (I) ( 3 Σ g ) state are also analyzed. The experimentally observed absorption spectrum centred at ~ 13000cm-1 is simulated and assigned to X 3 Πu (v=0)-3Πg transition according to the present ab initio calculations on transition energies and dipole moment functions.  相似文献   
7.
Carbon nitride (CNx) films were deposited from acetonitrile at low voltage (150-450 V) through electrodeposition. The films were characterized by atomic force microscopy (AFM), Raman spectroscopy and Fourier transform infrared (FT-IR) spectroscopy. AFM investigations revealed that the grain size was ∼200 nm and roughness was ∼10 nm. The films were found to be continuous and close packed. IR spectra revealed existence of strong sp3, sp2 type bonding and weak sp type carbon nitrogen bonds and these bonds were found to increase with voltage. The fraction of sp3-bonded species in the sample increased in low voltage range and after reaching maximum at 350 V, decreased for higher voltages. However, the concentration of sp2 CN ring structures in the film increased with increasing voltage. Also, the peak width decreased at low voltages reaching a minimum and increased thereafter. It was observed that the voltage dependent increase in the concentration of polymeric type sp2 CN (chain) structures was much more pronounced than that of graphitic type sp2 CN (ring) structures. Raman spectra showed the presence of both the D and G bands. The shift in the G band indicated the presence of nitrogen in the film. The ID/IG ratio was found to increase with the incorporation of nitrogen. Auger electron spectroscopy (AES) showed a clear increase in the nitrogen content with increase in the voltage. The formation of the film could be explained on the basis of dissociation of electrolyte under applied voltage.  相似文献   
8.
张维佳  王天民  崔敏  戎霭伦 《物理学报》2006,55(3):1295-1300
理论研究了有ITO(indium tin oxide)透明导电膜的多层平面分层介质系统的电磁性能,给出的理论曲线和实测曲线符合很好.多层平面分层介质系统的电磁性能与ITO膜(方块电阻为8Ω)所在界面位置和平面分层介质系统层数及各层厚度等有关.优化设计了一种含有ITO透明导电膜的厚度仅7.35mm的四层平面分层介质系统,其在8—18GHz频段内电磁波反射性能很好.作为多层平面分层系统中的ITO导电膜,其方块电阻应低于30Ω,并且越小,其反射性能越好. 关键词: 多层平面介质系统 电磁性能 ITO透明导电膜  相似文献   
9.
A new boron nitride polymorph, P213 BN (space group: P213), is investigated by first-principles calculations, including its structural properties, stability, elastic properties, anisotropy and electronic properties. It is found that the new boron nitride polymorph P213 BN is mechanically, dynamically and thermodynamically stable. The bulk modulus (B), shear modulus (G) and Young's modulus of P213 BN are 91 GPa, 41 GPa and 107 GPa, respectively, all of which are larger than that of Y carbon and TY carbon. By comparing with c-BN, the Young's modulus, shear modulus and Poisson's ratio of P213 BN show tiny anisotropy in the (001), (010), (100) and (111) planes. At the same time, in contrast with most boron nitride polymorphs, P213 BN is a semiconductor material with a smaller band gap of 1.826 eV. The Debye temperature and the anisotropic sound velocities of P213 BN are also investigated in this work.  相似文献   
10.
采用射频等离子体辅助分子束外延技术生长得到了In组分精确可控且高质量的InxGa1-xN (x ≤ 0.2) 外延薄膜. 生长温度为580 ℃的In0.19Ga0.81N薄膜(10.2) 面非对称衍射峰的半高宽只有587弧秒, 背景电子浓度为3.96× 1018/cm3. 在富金属生长区域, Ga束流超过N的等效束流时, In组分不为零, 即Ga并没有全部并入外延层; 另外, 稍微增加In束流会降低InGaN的晶体质量. 关键词: InGaN 外延薄膜 射频等离子体辅助分子束外延 In 并入 晶体质量  相似文献   
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