Molecular deposition film of porphyrin and phthalocyanine bearing oppositely charged substituents

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Underpotential deposition of tin(II) on a gold disc electrode and determination of tin in a tin plate sample

This work describes a study of the underpotential deposition (UPD) of Sn²⁺ on a polycrystalline gold disc electrode using cyclic voltammetry (CV) and chronocoulometry (CC). Sn²⁺ ions showed well-defined peaks from UPD and UPD stripping (UPD-S) in 1 mol/L HCl solutions, while bulk deposition (BD) and BD stripping (BD-S) of the ions were also observed. The measured UPD shifts, E_UPD, between the UPD-S and the BD-S peaks were more than 200 mV. The UPD charge and the surface coverage of tin were measured by CC. A new method for determining Sn²⁺ was therefore developed, based on the excellent electrochemical properties of the Au/Sn UPD system. A plot of the UPD-DPASV (differential pulse anodic stripping voltammetry) signal versus the Sn(II) concentration was obtained for [Sn(II)] of 1.98×10^–7 to 3.64×10^–5 M. The method developed here has been applied to determine the tin in a tin plate sample.     

VA族元素对阳极铅(Ⅱ)氧化物膜半导体性质的影响(Ⅱ)

用光电化学电流法研究了铅、铅砷、铅锑和铅铋合金在4．5mol·L－1H2SO4溶液（22℃）中，以0．9V（vs．Hg／Hg2SO4）极化7h而形成的阳极膜中的氧化铅的半导体性质，合金添加剂砷、锑和铋对t－PbO（四方氧化铝）和o-PbO（斜方氧化铝）的禁带宽度没有影响，从量子效率和电位的关系可求Pb，Pb－lat％As（at％表示原子百分比，全文同），Pb-lat％Sb和Sb－lat％Bi上膜中t－Pbo的施主密度（ND）分别为9．3×1015，1．0×1016，3．1×1016和1．3×1017cm-3，平带位分别为-0．20，－0．22，－0．28和-0．08V（vs．Hg／Hg2SO4）．比较VA元素砷、锑和铋对上述膜中t－Pbo的ND（从而自由电子密度）和膜中t－Pbo的生长速率的影响，可认为法添加剂砷、锑和铋对阳极膜中t-Pbo的作用符合Hauffe规则．     

双波长分光光度法同时测定岩石矿物中的微量金和钯

本文提出以硫代米蚩酮为显色剂，用双波长分光光度法同时测定岩石矿物中的微量金和钯的方法，消除了测定金钯的相互干扰，该方法简便，快速，选择性好，用于矿石样品中金和钯的测定，结果满意。     

壳聚糖-聚羟基丁酸酯共混膜的制备与性质

以乙酸为共溶剂,制备了壳聚糖-聚羟基丁酸酯(CTS-PHB)共混膜,利用红外光谱(FT-IR)、广角X粉末衍射(WAXD)、扫描电镜(SEM)及差热分析(DTA)表征了共混膜的化学组成、晶形、形貌和热稳定性能。研究表明:CTS和PHB可在体积百分数为62.5%的乙酸溶液中共混,形成表面光滑、不透明的膜,干态共混膜具备一定的力学强度。各比例的CTS-PHB共混膜有相同的热分解温度,共混膜的形貌特征随两组分质量配比变化,其中mPHB/mCTS=1/1的共混膜显示出良好的有序结构。     

A supported gold catalyst for the elimination of hydrogen from CO2 feed gas in the production of urea

Supported gold catalyst for eliminating hydrogen from CO₂ feed gas in the production of urea is found to be superior to other industrial catalysts (e.g. Pt/Al₂O₃ and PdPt/Al₂O₃) in catalytic activity and resistance to sulfur poisoning.     

有机硅耐磨透明涂层的固化分析

ＦＴＩＲ、ＴＧ、ＴＢＡ等对有机硅耐磨涂料（有机硅溶胶）的热固化过程研究表明有机硅胶体中缔合羟基间的脱水缩合速率很高；羟基脱水程度与固化温度有关，温度越高，达平衡时羟基的浓度越低，在１０５～１３０℃间羟基的浓度变化最大，加入适当的固化剂，对羟基的脱水交联有促进作用，在较高的固化温度下，反应体系中出现了环氧环异构化产生的酮羰基的吸收峰