四种多变量校准方法在FTIR多组分分析中的性能比较

本文对四种多变量校准方法－－经典最小二乘法（CLS），偏最小二乘法（PLS），卡尔曼滤波法（KFM）以及人工神经网络法（ANN）－－在多组分浓度分析方面的性能进行了比较。选择五种红外谱图严重混叠的大气有机毒物－－1，3－丁二烯，苯，邻二甲苯，氯苯和丙烯醛－－作为分析对象。分别计算各种方法对该5组分体系的平均预测误差MPE和平均相对误差MRE进行比较。结果表明，偏最小二乘法在处理这类问题中是最稳健的方法。     

类型γ射线能谱指纹的识别机理

放射源的辐射指纹能起到标识和鉴别放射性物体的作用.在涉及核弹头不可逆销毁过程的深度核裁军核查中,核弹头的辐射指纹对标识和鉴别裁减下来的核弹头将起到关键作用.预先研究辐射指纹的有关技术,如识别机理的研究,将有助于深度核裁军的核弹头核查技术发展.以实验室放射源为研究对象,探索了类型γ射线能谱指纹的同一性识别机理.类型γ射线指纹识别机理的研究,就是要找出一种合适的方法,以较高的置信度,描述两个正在进行比较的γ射线指纹是否为同一放射源的指纹.采用了谱形比较法,并用谱相似度概念来描述两个指纹的相似程度.在谱形比较思想的指导下,编制了放射源类型指纹识别软件,并通过放射源同一性的识别实验验证了软件的有效性,同时研究了谱相似度随统计涨落和测量条件,如时间、源强和本底等因素的变化情况.研究结果表明:1)用相似度概念来描述两个指纹的相似程度,回答两个待比较的γ射线能谱是否代表同一类型放射源,是切实可行的;2)该识别机理只具备识别放射源类型的能力,而对同一类型、差异甚微的放射源个体还不能识别 关键词： γ射线能谱指纹 辐射指纹 识别机理 核查技术     

光放大器前置可调光学滤波器

介绍Ｆ－Ｐ干涉滤波器实现中心波长可调的两种机理，给出通过改变腔距来改变中心波工的滤波器的典型结构，并且给出了相应的电压驱动电路，实验表明选择合适的光放大器前置滤波器可以提高系统的灵敏度。     

A notch filter for 140 GHz microwave radiation

The construction of a notch-filter for 140 GHz with very low passband insertion loss is described. It is based on a single-mode rectangular waveguide and cylindrical cavities matched to it. The typical transmission characteristic is also presented.     

A New Method for Rotation and Brightness Invariant Pattern Recognition Based on Modified Multiple Circular Harmonic Expansions

A new method for rotation and brightness invariant pattern recognition was proposed by applying multiple circular harmonic expansions to the joint transform correlator. The amplitudes of the multiple orders of circular harmonic expansions made from a detecting image were synthetically modified to respond to the same auto-correlation peaks. These modified circular harmonic expansions were arranged in the input plane as reference patterns together with an arbitrary target pattern, and the correlation signals between them were calculated in the subtracted joint transform correlator. The fraction of the correlation-peak intensities between the target and the references were extracted as a new discrimination parameter. This new parameter performs pattern recognition under rotation and brightness invariance with good discriminability. Its high discriminability has been proved in computer simulations using the face image patterns of many individuals.     

A graph theory approach to subcontracting, machine duplication and intercell moves in cellular manufacturing

We address in this paper the problem of finding an optimal strategy for dealing with bottleneck machines and bottleneck parts in the cell formation process in group technology. Three types of economic decisions are considered: subcontracting, machine duplication and intercell moves. The problem is formulated as a minimum weighted node covering problem in a hypergraph, and we show that it can be solved in polynomial time by finding a maximum weighted stable set in a bipartite graph. We extend this result to cellular manufacturing systems in which the sequence of operations of each part is known in advance.     

Production and characterization of refractive index gratings in high-birefringence fibre optics

In this work, we report production and modelling of both Bragg gratings and rocking filters in high birefringence fibre optics. Bragg gratings are produced by UV (257.0 nm) external interferometric exposition of a frequency-doubled Ar⁺ ion laser, whereas for rocking filters formation the visible Ar⁺ ion laser lines in 488.0 and 514.5 nm are used in an internal method. The spectral characteristics due to the birefringence properties are studied through numerical methods and experimental techniques. The spectral responsivity of the structures under temperature changes and stress application is presented.     

Manufacturing cell formation using similarity coefficients and a parallel genetic TSP algorithm: Formulation and comparison

Many algorithms have been proposed to form manufacturing cells from component routings. However, many of these do not have the capability of solving large problems. We propose a procedure using similarity coefficients and a parallel genetic implementation of a TSP algorithm that is capable of solving large problems of up to 1000 parts and 1000 machines. In addition, we also compare our procedure with many existing procedures using nine well-known problems from the literature.

The results show that the proposed procedure compares well with the existing procedures and should be useful to practitioners and researchers.     

技术不确定环境下新产品策略的设计应用

技术的动态发展和企业间的竞争对企业新产品策略有很大影响,直接决定新产品的引进周期。本文在产业技术动态变化的随机环境下构建随机动态规划模型,关注产业技术进步、投资成本和产品市场竞争等影响因素,探讨企业进行新产品引进的周期选择,对新产品引进的周期和质量决策进行方法设计和应用举例。利用随机动态规划模型得出新产品引进的最优时间周期,用算例分析技术进步和产品研发成本对企业引进周期策略的影响,采取策略迭代的方法进行求解,发现技术进步较快时企业的新产品引进步伐也较快,研发成本的提高使企业的新产品引入步伐降低。     

UV protection filters by dielectric multilayer thin films on Glass BK-7 and Infrasil 301

The increasing use of Ultraviolet (UV) light in medicine, industrial environments, for cosmetic use, and even in consumer products necessitates that greater attention be paid to the potential hazards of this type of electromagnetic radiation. To avoid any adverse effects of exposure to this type of radiation, four suitable protection filters were produced to block three UV bands (UVA, UVB, and UVC). The design structure of the required dielectric multilayer filters was done by optical thin film technology using the absorbing property of UV radiation for the substrates and dielectric materials. The computer analyses of the multilayer filter formulas were prepared using Macleod Software for the production processes. The deposition technique was achieved on optical substrates (Glass BK-7 and Infrasil 301) by dielectric material combinations including Titanium dioxide (Ti₂O₃), Hafnium dioxide (HfO₂), and Lima (mixture of oxides SiO₂/Al₂O₃); deposition being achieved using an electron beam gun. The output results of the theoretical and experimental transmittance values for spectral band from 200 nm to 800 nm were discussed in four processes. To analyze the suitability for use in ‘real world’ applications, the test pieces were subjected to the durability tests (adhesion, abrasion resistance, and humidity) according to Military Standard MIL-C-675C and MIL-C-48497A.