Au/(SiO2/Si/SiO2)纳米双势垒/n+-Si结构的电致发光研究

利用射频磁控溅射方法 ,在n Si衬底上淀积SiO2 /Si/SiO2 纳米双势垒单势阱结构 ,其中Si层厚度为 2至 4nm ,间隔为 0 .2nm ,邻近n Si衬底的SiO2 层厚度固定为 1.5nm ,另一SiO2 层厚度固定为 3nm .为了对比研究 ,还制备了Si层厚度为零的结构 ,即SiO2 (4.5nm) /n Si结构 .在经过 6 0 0℃氮气下退火 30min ,正面蒸上半透明Au膜 ,背面也蒸Au作欧姆接触后 ,所有样品都在反向偏置 (n Si的电压高于Au电极的电压 )下发光 ,而在正向偏压下不发光 .在一定的反向偏置下 ,电流和电致发光强度都随Si层厚度的增加而同步振荡 ,位相相同 .所有样品的电致发光谱都可分解为相对高度不等的中心位于 2 .2 6eV(5 5 0nm)和 1.85eV(6 70nm)两个高斯型发光峰 .分析指出该结构电致发光的机制是 :反向偏压下的强电场使Au/ (SiO2 /Si/SiO2 )纳米双势垒 /n Si结构发生了雪崩击穿 ,产生大量的电子 空穴对 ,它们在纳米SiO2 层中的发光中心 (缺陷或杂质 )上复合而发光 .     

耦合微腔结构的有机电致发光器件

研究了耦合微腔结构的有机发光器件的光学和电致发光性能。通过将被动腔作为底部反射镜的方法,简化了耦合微腔的光学和发光性能的模拟,所得到的结果与实验符合得较好。在相同电流密度下与同样结构的普通OLED相比,耦合腔OLED的光谱强度在502 nm处增强了3.6倍,在550 nm处增强了5.6倍,光谱积分强度增加了0.5倍。普通OLED的最大电流效率和亮度是4.2 cd/A 和13 600 cd/m²。而耦合腔OLED则为7.0 cd/A 和 22 660 cd/m²。这种结构的器件出射光更集中于腔轴方向,有利于设计开发较高效率的有机激光器件。     

Organic low-dimensional structure electroluminescent material characteristics and devices

Photoluminescence (PL) characteristics of organic doped films are studied as a function of dopant concentration, doped layer thickness. The luminescence properties of doped films are decided by Förster energy transfer rate between host and guest and fluorescence quenching effect of guest. For Alq:rubrene doped film at 5% doping level, we fabricated and characterized organic doped quantum-well structure device, and observed significant quantum size effect. For Alq:QAD doping system, at low doping level of 0.4%, the intermolecular spacing between QAD molecules is relatively large, the interaction between neighboring QAD molecules is very small due to the strong localization of the carriers in the single QAD molecules, the PL properties of Alq:QAD doped films only depends on the PL properties of single isolated QAD molecules, which is somewhat similar to the inorganic quantum dot structure. We also reported the electroluminescent performance of the Alq:QAD system.     

Excitation and recombination processes during electroluminescence of rare earth-activated materials

Electroluminescence phenomena in rare earth doped materials are reviewed. The main emphasis is in the basic physics of EL processes, viz. direct and indirect excitation and nonradiative and radiative recombination of rare earth ions. The device structures, the recent material development, and the present state of art in AC operated thin fdm EL devices have been reviewed as well.     

ZnS:Mn、Cu粉末直流电致发光器件直流和交流电致发光一致性的研究

本文研究了粉末直流电致发光(DCEL)器件在直流(DC)和交流(AC)电压下光电特性的关联和区别及其物理机制. 实验发现,在DC和AC条件下DCEL器件的阻抗特性之间没有任何有规律的关联,而AC条件下的激发电流I_A和亮度B_A以及DC条件下的亮度B_D和发光效率η_D四个参量之间则表现出某种程度的一致性,但AC条件下的发光效率η_A与上述四个参量之间却表现出某种相反和相对立的关系. DCEL器件的光电特性具有强烈非线性和对电压方向的非对称性.正半周(或DC条件下)DCEL器件是在高电场和低电流激发下的发光.对发光起主要作用的是电场强度.在负半周时则是低电场和大电流激发下的发光.对发光起主要作用的是激发电流而不是电场强度.在AC条件下依材料、工艺、形成条件和工作电压的不同,DCEL器件可能更多地显示出正半周,负半周或两半周综合的光电特性.上述观点可以解释本文的实验结果.     

量子垒结构对Si衬底GaN基绿光LED光电性能的影响

在Si衬底上外延生长了3种不同量子垒结构的绿光外延片并制作成垂直结构芯片,3种量子垒结构分别为Ga N、In0.05Ga0.95N/Al0.1Ga0.9N/In0.05Ga0.95N、In0.05Ga0.95N/Ga N/In0.05Ga0.95N,对应的3种芯片样品为A、B、C,研究了3种样品的变温电致发光特性。垒结构的改变虽然对光功率影响很小,但是在光谱性能上会引起显著改变,结果如下:在低温(13 K)大电流下,随着电流密度的增大,样品的EL谱峰值波长蓝移更为显著,程度依次为BA≈C;在高温(300 K)小电流下,随着电流密度的增大,样品EL谱的峰值波长蓝移程度的大小依次为ABC。在同一电流下,随着温度的升高,样品在大部分电流下的EL谱峰值波长出现"S"型波长漂移,在极端电流下又表现出不同的漂移情况。这些现象与局域态、应力、压电场、禁带宽度等因素有关。     

新结构电致发光薄膜器件各层的优化

本文比较了以SiO为预热层和以SiO2/Y2O3、SiO2/Ta2O5为复合预热层的新结构器件的发光亮度和传导电流,并拟合出这三种器件热电子能量,得出以SiO为预热层的新结构器件的热电子能量和发光亮度最高,比较了以SiO2和ZnS分别作加速层对发光和传导电荷的影响,得出在提高注入电荷方面,以ZnS做加速层优于SiO2做加速层；在提高热电子能量和发光亮度方面,以SiO2做加速层要好于ZnS做加速层。     

Er离子注入的富硅SiO2MOS-LED的可见和红外电致发光特性

通过Er离子和Si离子注入并结合高温退火制备了Er掺杂的富硅SiO2薄膜以及ITO/SiON/富硅SiO2:Er/Si MOS结构电致发光器件.研究了富Si浓度的变化对Er3+离子掺杂的电致发光器件的发光性能和传导特性的影响.发现不同Si含量对Er3+离子的不同能级的电致发光会产生不同作用.在富Si量小于5％的条件下,...     

有机稀土Eu（DBM）3bath配合物电致发光

有机稀土Ｅｕ（ＤＢＭ）３ｂａｔｈ配合物电致发光＊梁春军李文连＊＊洪自若彭俊彪ａ）虞家琪ａ）赵丹赵东旭（中国科学院长春物理研究所，长春１３００２１）ａ）（中国科学院激发态物理开放研究实验室，长春１３００２１）关键词有机电致发光，稀土配合物，窄带发射近几...     

Efficiency droop in InGaN/GaN-based LEDs with a gradually varying In composition in each InGaN well layer

Temperature-dependent and driving current-dependent electroluminescence spectra of two different InGaN/GaN multiple quantum well structures SA and SB are investigated,with the In composition in each well layer(WL)along the growth direction progressively increasing for SA and progressively decreasing for SB.The results show that SB exhibits an improved efficiency droop compared with SA.This phenomenon can be explained as follows:owing to the difference in growth pattern of the WL between these two samples,the terminal region of the WL in SB contains fewer In atoms than in SA,and therefore the former undergoes less In volatilization than the latter during the waiting period required for warming-up due to the difference in the growth temperature between well and barrier layers.This results in SB having a deeper triangular-shaped potential well in its WL than SA,which strongly confines the carriers to the initial region of the WL to prevent them from leaking to the p-GaN side,thus improving the efficiency droop.Moreover,the improvement in the efficiency droop for SB is also partly attributed to its stronger Coulomb screening effect and carrier localization effect.