波片相位延迟量精密测量新方法

利用旋转波片的偏振干涉技术，结合机械－光学旋光调制器对光相位的调制，通过判断方波信号的有无，可精密地确定被测定片相位延迟的数值，机械－光学旋光调制器的使用，大大简化被测样品和测试装置中四分之一波片光轴方位的调整，也显著地提高了装置测量的灵敏度和波长测量范围，对环境不作特殊控制，依据本方法建立的测试装置的相对测量误差可小于千分之五。     

铜-康铜热电偶的低温不均匀性实验研究

从冰点到液氮温度的宽低温区内,对随机选取的铜-康铜热电偶进行了重复性精度标定.测试结果表明,多次断偶重复焊接行为将产生约0.272 mV的标准差.这意味着在液氮条件下,温度测量过程的最大误差将达8.98 ℃.所以,对现场、尤其对深冷区的现场进行精确测温实验中出现的断偶故障,重新焊接后必须重新标定才能继续使用.     

CVD金刚石中的氮对等离子体刻蚀的影响

采用非对称磁镜场电子回旋共振等离子体分别对沉积过程中掺氮和未掺氮的化学气相沉积金刚石膜进行了刻蚀研究, 结果表明: 掺氮制备的金刚石膜的刻蚀主要集中在晶棱处, 经过4h刻蚀后其表面粗糙度由刻蚀前的4.761 μm下降至3.701 μm, 刻蚀对金刚石膜的表面粗糙度的影响较小; 而未掺氮制备的金刚石膜的刻蚀表现为晶面的均匀刻蚀, 晶粒坍塌,刻蚀4h后其表面粗糙度由刻蚀前的3.061 μm下降至1.083 μm. 刻蚀导致表面粗糙度显著降低. 上述差别的主要原因在于金刚石膜沉积过程中掺氮导致氮缺陷在金刚石晶棱处富集, 晶棱处电子发射加强, 引导离子向晶棱运动并产生刻蚀, 从而加剧晶棱的刻蚀. 而未掺氮金刚石膜,其缺陷相对较少且分布较均匀 ,刻蚀时整体呈现为 (111) 晶面被均匀刻蚀继而晶粒坍塌的现象. 关键词： 掺氮 金刚石膜 刻蚀 非对称磁镜场     

基于SOA和NOLM的光脉冲放大与压缩的设计模型

设计了一种基于半导体光放大器(SOA)和非线性光学环镜(NOLM)的光脉冲放大与压缩的模型。数值研究结果表明:在NOLM中,当调节合适的控制脉冲的输入和初始时延时,具有较低峰值功率、宽度为几十皮秒的高斯信号脉冲经此模型放大压缩后,可以得到脉冲峰值增益高、脉冲宽度窄以及基本无基座的高质量超短信号光脉冲。     

Design and Cold Tests of Asymmetric Quasioptical Resonators

This paper presents the design and test of asymmetric quasioptical resonators for gyrotron applications, where most of the diffraction output coupling comes from the smaller of two mirrors. A computer code based on scalar diffraction theory is used to calculate the resonator losses and the electric field near the mirrors. Resonators with mirror separations approaching confocal have reduced side lobes in the diffraction patterns, which should allow for better power transmission and focusing. Cold tests have been performed at 94 and 141 GHz to measure the quality factor of the asymmetric resonators as a function of mirror separation and mirror misalignment. Typical resonator parameters include 65 cm mirror separation, 1-3% output coupling and 85% of the losses from the small mirror. A half-symmetric resonator with one flat and one curved mirror has also been investigated. The calculated values of Q are in reasonably good agreement with the cold test measurements.     

非对称Halo异质栅应变Si SOI MOSFET的二维解析模型

为了进一步提高深亚微米SOI (Silicon-On-Insulator) MOSFET (Metal-Oxide Semiconductor Field Effect Transistor) 的电流驱动能力, 抑制短沟道效应和漏致势垒降低效应, 提出了非对称Halo异质栅应变Si SOI MOSFET. 在沟道源端一侧引入高掺杂Halo结构, 栅极由不同功函数的两种材料组成. 考虑新器件结构特点和应变的影响, 修正了平带电压和内建电势. 为新结构器件建立了全耗尽条件下的表面势和阈值电压二维解析模型. 模型详细分析了应变对表面势、表面场强、阈值电压的影响, 考虑了金属栅长度及功函数差变化的影响. 研究结果表明,提出的新器件结构能进一步提高电流驱动能力, 抑制短沟道效应和抑制漏致势垒降低效应, 为新器件物理参数设计提供了重要参考. 关键词： 非对称Halo 异质栅 应变Si 短沟道效应     

单载流子传输的双异质结光敏晶体管探测器的研究

基于器件仿真器Atlas, 建立了InP/InGaAsP单向载流子传输的双异质结光敏晶体管(UTC-DHPT)的二维模型, 分析讨论了器件性能与外延结构参数的关系. 设计出同时具有高响应度(≥17.93 A/W)和高特征频率(≥121.68 GHz)的UTC-DHPT, 缓解了传统的异质结光敏晶体管光电探测器中探测效率和工作速度的矛盾. 关键词： 单向载流子 光敏晶体管 电流放大倍数 响应度     

Theoretical analysis of the radiation effect on the transient behavior of optoelectronic integrated devices

Theoretical analysis of the radiation effect on transient behavior of an optoelectronic integrated device composed of a heterojunction phototransistor and a light emitting diode is studied theoretically. First, the transient behavior and the rise time of this device before radiation are investigated based on the frequency response of the constituent devices and the optical feedback inside the device. Second, the effect of neutron irradiation flux on the transient behavior of this device is theoretically studied. The results show that, by increasing the optical feedback inside the device, the rise time in the amplification mode is increased along with an increasing output, while that in the switching mode can be reduced effectively, and the neutron irradiation reduces the transient response and the rise time in both the amplification and switching modes. This type of model can be exploited as optical amplifier, optical switching device, and other applications.     

Frequency doubling of Nd:YAG- and GaAs-lasers by KNbO3: Ta crystals

Abstract

For KNb_1-xTa_xO₃ crystals the influence of the Ta-concentration on the phase-matching properties for optical second harmonic generation (SHG) was measured. For non-critical phase matched SHG of the Nd:YAG-laser (1064nm) the coefficient d₃₁ of the tensor of the nonlinear susceptibility was applied, while for the GaAs-laser (905 nm) the coefficient d₃₂ was used. For both laser wavelengths the phase-matching temperature decreases with increasing Ta-concentration. Non-critical phase-matching at room temperature can be reached with the GaAs-laser for a Ta-concentration of ≈9%. The corresponding value for the Nd:YAG-laser is ≈14%.