Fabrication of mesoporous ZnO nanosheets from precursor templates grown in aqueous solutions

Mesoporous ZnO nanosheets were successfully prepared by pyrolytic transformation of zinc carbonate hydroxide hydrate, Zn₄CO₃(OH)₆·H₂O. The nanosheets were initially formed as assemblies on glass substrates during chemical bath deposition (CBD) in aqueous solutions of urea and zinc acetate dihydrate, zinc chloride, zinc nitrate hexahydrate, or zinc sulfate heptahydrate at 80°C. It was key to induce heterogeneous nucleation of Zn₄CO₃(OH)₆·H₂O by promoting a gradual hydrolysis reaction of urea and controlling the degree of supersaturation of zinc hydroxide species. Morphology of Zn₄CO₃(OH)₆·H₂O was largely influenced by the anions present in the CBD solutions. The Zn₄CO₃(OH)₆·H₂O nanosheets were transformed into wurtzite ZnO by heating at 300°C in air without losing the microstructural feature.     

Nanostructured ZrO2 and Zr‐C‐N Coatings from Chemical Vapor Deposition of Metal‐Organic Precursors

Nanocrystalline zirconium carbonitride (Zr‐C‐N) and zirconium oxide (ZrO₂) films were deposited by chemical vapor deposition (CVD) of zirconium‐tetrakis‐diethylamide (Zr(NEt₂)₄) and ‐tert‐butyloxide (Zr(OBu^t)₄), respectively. The films were deposited on iron substrates and characterized by scanning electron microscopy (SEM), X‐ray diffraction (XRD) and X‐ray photoelectron spectroscopy (XPS). The Zr‐C‐N films show blue, golden brown or bronze colours, with colour stability depending upon the precursor composition (pure metal amide or mixed with Et₂NH). The deposition temperature showed no pronounced effect on the granular morphology of the Zr‐C‐N films. The XRD data of the films correspond to the formation of carbonitride phase whereas the XPS analyses revealed a strong surface oxidation and incorporation of oxygen in the film. The films deposited using a mixture of Zr(NEt₂)₄ and Et₂NH showed higher N content, better adhesion and scratch resistance when compared to films obtained from the CVD of pure Zr(NEt₂)₄. Subject to the precursor composition and deposition temperature (550‐750 °C), the microhardness values of Zr‐C‐N films were found to be in the range 2.11‐5.65 GPa. For ZrO₂ films, morphology and phase composition strongly depend on the deposition temperature. The CVD deposits obtained at 350 °C show tetragonal ZrO₂ to be the only crystalline phase. Upon increasing the deposition temperature to 450 °C, a mixture of tetragonal and monoclinic modifications was formed with morphology made up of interwoven elongated grains. At higher temperatures (550 and 650 °C), pure monoclinic phase was obtained with facetted grains and developed texture.     

Lead underpotential deposition on Au(110)

The electrochemical underpotential deposition (UPD) of lead on Au(110) was investigated by XPS using a custom‐built ultrahigh vacuum apparatus containing a chamber for electrochemical studies. A two‐step deposition process for lead UPD was confirmed. A large increase in the surface concentration of oxygen was found in solutions containing lead. The presence of lead was detected on the gold surface at all potentials within the range investigated (?500 mV to 1500 mV vs. Ag/AgCl). Degradation of chlorine by x‐rays was observed. The change in surface components with potential was investigated and linked to models of UPD and oxidation. The initial random deposition of lead from solution led to surface disordering. Copyright © 2003 John Wiley & Sons, Ltd.     

Optimization of the electrophoretic deposition of YBa2Cu3O7−x superconducting large area coatings

Large area coatings (>10cm²) of the high temperature superconductor YBa₂Cu₃O_7–x (x = 0.1 – 0.2) (YBCO) have been prepared by scale up an electrophoretic deposition technique using silver sheets and Si-wafers coated with Ag or Au as substrates. Several parameters, like the kind of the solvent, the applied voltage, the distance between the electrodes, the initial concentration of the suspension and the temperature during the electrophoresis were investigated in order to attain high deposition rates, as well as uniform YBCO coatings with the proper stoichiometry. To obtain a strongly adherent and dense coating a subsequent appropriate sintering and annealing procedure has been developed. The coatings obtained were characterized for their stoichiometry and superconducting properties by X-ray diffraction (XRD), Raman spectroscopy and magnetic measurements. The homogeneity and thickness of the films and the average grain size of the deposited particles have been investigated by optical and scanning electron microscopy (SEM).     

Preparation of VPS and PVD coatings for metallographic and TEM investigations

The aim of the first part of the paper is to give some advice for the faultless metallographic preparation of vacuum plasma sprayed coatings. Several coating/substrate combinations using metals, alloys and ceramics were investigated to derive some general rules. The second part deals with a preparation technique for cross-sections- of physical vapour deposition coatings. This technique was optimized for TiN and Ti(C, N) coatings on hardmetals which were examined in an analytical transmission electron microscope.     

一步法合成吲哚用Ag／SiO2催化剂的失活及其抑制

 用简单浸渍法制备了Ag／SiO2催化剂．该催化剂对苯胺和乙二醇一步合成吲哚表现出很高的催化活性，但同时存在明显的失活．TG，XRD和TEM表征结果表明，催化剂失活的主要原因是反应过程中催化剂表面的积碳和银粒子的烧结．向反应体系中通入氢和水蒸气能够减少催化 剂表面的积碳；向催化剂体系加入ZnO助剂能较大程度地提高银的分散度，并能有效抑制反应过程中银粒子的烧结．     

化学气相沉积法制备氧化锡自组装纳米结构

采用化学气相沉积法在镀有5-10 nm厚金膜的SiO2衬底上, 通过控制生长条件, 实现了二氧化锡纳米结构的自组装生长, 成功制备出了莲花状和菊花状的二氧化锡自组装纳米结构. 利用扫描电子显微镜、X射线衍射等表征分析手段对样品的表面形貌、结构及成份进行表征和研究. 并在此基础上, 讨论了两种自组装纳米结构的生长机制.     

具有超疏水性质的图案化Ag膜

以重氮树脂(DR)/聚丙烯酸(PAA)自组装膜的微图案作为模板, 通过DNA和聚二甲基二烯丙基氯化铵(PDDA)在模板上的层层沉积制备了图案化的DNA膜. 再在其中进行Ag的化学沉积得到图案化的Ag膜. 最后利用低表面能的十二烷基硫醇对Ag膜进行表面修饰, 制备了具有超疏水性质的图案化Ag膜. 其静态接触角达到约168°.     

镍基气凝胶催化CH4-CO2重整制取合成气反应的研究 Ⅲ.影响催化剂积碳性能因素的探讨

考察了823K焙烧的干凝胶xNCA550、气凝胶aNCA550及浸渍型催化剂iNCA550在923K、1073K、1173K反应温度下的积碳行为，对催化剂表面碳的活性及类型进行了分析，并探讨了影响催化剂积碳的因素。实验结果表明，随反应温度的提高，催化剂的积碳能力减弱，尤以气凝胶催化剂aNCA550明显。催化剂的积碳主要发生在反应的初期，反应温度越高，到达积碳量相对稳定期所需要的时间越短；随着反应时间的延续，催化剂积碳量缓慢增长，并且表面碳的活性降低。催化剂的酸性和镍晶粒大小是影响其积碳性能的主要内在因素，而它们对积碳的影响程度受反应温度的影响，反应温度越高，催化剂表达酸性中心利于积碳的作用越小，小晶粒镍抑制催化剂积碳的能力越强。     

Sol–Gel SiO2-ZrO2 Coatings for Optical Applications

SiO₂-ZrO₂ based nanostructured multilayers films have been prepared by sol–gel processing from metallorganic precursors by low temperature inorganic polymerization reactions. Simultaneous gelation of both precursors was realized. Homogeneous and transparent films were obtained at room temperature by dip- and spin-coating on glass and silicon wafer substrates. Samples with successively deposited layers (1–3 layers) and successive thermal treatments have been also studied. Each deposited layer was thermally treated for 1 h at 300°C. The coatings were characterized by XRD, spectroellipsometry (SE), UV-VIS spectroscopy and AFM methods. The influence of substrates, number of coatings and number of thermal treatments on the optical and structural properties of the films was established. The thickness of three deposited SiO₂-ZrO₂ layers is about 496 nm on glass substrates and 413 nm on the silicon wafer substrate. The films deposited on glass are more porous than those deposited on silicon. The properties of optical waveguide prepared from SiO₂-ZrO₂ layers on silicon substrates will be discussed.