Direct patterning of polysilanes and polygermanes using interference lithography

The direct patterning of poly(p‐methoxyphenylmethylsilane) (PMPMS) and poly(p‐methoxyphenylmethylgermane) (PMPMG) by interference lithography is reported. Copyright © 2011 John Wiley & Sons, Ltd.     

还原氧化石墨烯/Au复合微电极阵列的制备及光电特性

利用双光束干涉-无掩模光刻技术制备了周期性氧化石墨烯微结构阵列,利用肼蒸气对氧化石墨烯脱氧还原,然后蒸镀超薄Au薄膜制备了还原氧化石墨烯/Au复合微电极阵列(R-GO/Au).对复合电极在可见光波段的透过率和表面电阻进行了表征,结果表明,R-GO/Au复合微电极阵列具有良好的光电特性.将R-GO/Au复合微电极阵列引入到有机太阳电池中作为半透明阳极,器件的光电转化效率可达3.43%.     

Transfer of Two‐Dimensional Oligonucleotide Patterns onto Stereocontrolled Plasmonic Nanostructures through DNA‐Origami‐Based Nanoimprinting Lithography

The precise functionalization of self‐assembled nanostructures with spatial and stereocontrol is a major objective of nanotechnology and holds great promise for many applications. Herein, the nanoscale addressability of DNA origami was exploited to develop a precise copy‐machine‐like platform that can transfer two‐dimensional oligonucleotide patterns onto the surface of gold nanoparticles (AuNPs) through a deliberately designed toehold‐initiated DNA displacement reaction. This strategy of DNA‐origami‐based nanoimprinting lithography (DONIL) demonstrates high precision in controlling the valence and valence angles of AuNPs. These DNA‐decorated AuNPs act as precursors in the construction of discrete AuNP clusters with desired chirality.     

Improved self‐assembly of poly(dimethylsiloxane‐b‐ethylene oxide) using a hydrogen‐bonding additive

Block copolymers with increased Flory–Huggins interaction parameters (χ) play an essential role in the production of sub‐10 nm nanopatterns in the growing field of directed self‐assembly for next generation lithographic applications. A library of PDMS‐b‐PEO block copolymers were synthesized by click chemistry and their interaction parameters (χ) determined. The highest χ measured in our samples was 0.21 at 150 °C, which resulted in phase‐separated domains with periods as small as 7.9 nm, suggesting that PDMS‐b‐PEO is a prime candidate for sub‐10 nm nanopatterning. To suppress PEO crystallization, PDMS‐b‐PEO was blended with (l )‐tartaric acid (LTA) which allows for tuning of the self‐assembled morphologies. Additionally, it was observed that the order‐disorder transition temperature (T_ODT) of PDMS‐b‐PEO increased dramatically as the amount of LTA in the blend increased, allowing for further control over self‐assembly. To understand the mechanism of this phenomenon, we present a novel field‐based supramolecular model, which describes the formation of copolymer‐additive complexes by reversible hydrogen bonding. The mean‐field phase separation behavior of the model was calculated using the random phase approximation (RPA). The RPA analysis reproduces behavior consistent with an increase of the effective χ in the PDMS‐b‐(PEO/LTA suprablock). © 2016 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2016 , 54, 2200–2208     

Ambiguous anti-fouling surfaces: Facile synthesis by light-mediated radical polymerization

In an attempt to create a polymer brush-based platform for the systematic study for anti-biofouling surfaces, the benefits of surface initiated, visible light-mediated radical polymerization are utilized to fabricate well-defined, chemically ambiguously patterned surfaces. A variety of analytical tools are used to illustrate the precise tuning of surface chemistry and thoroughly characterize spatially well-defined, hydrophilic/hydrophobic surfaces composed of poly(ethylene glycol methacrylate) and poly(trifluoroethyl methacrylate) with chemical definition on the micron scale. Advantages of both visible light-mediated photopolymerization and traditional copper-catalyzed atom transfer radical polymerization are combined to achieve both high spatial control and expanded monomer tolerance. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2016, 54, 253–262     

微流控芯片计算机辅助设计、辅助制造方法研究

介绍了一种采用计算机辅助制造中快速成型技术实现微流控芯片快速制作的方法。采用VB二次开发工具(VBA),在计算机辅助设计(CAD)二次开发平台上建立微流控芯片三维CAD立体模型,并通过计算机软件算法对CAD模型进行分层切片,为实现微流控芯片计算机辅助制造提供加工数据。文中针对微流控芯片加工精度要求高的特点,提出了采用位图数据图像格式(BMP)数据格式取代快速成型分层切片中常用的三角面片数据格式(STL),并对具体实现方法进行了详细介绍。