Influence of the blend compatibility on the morphology of thin polymer blend films

Thin films of incompatible polymer blends can form a variety of structures on preparation. For the polymer blend system consisting of two poly(styrene-co-para-bromo-styrene)s at different degrees of bromination, PBr_xS/PBr_yS, the compatibility can be tuned through a variation of the difference in the degree of bromination. Within this blend system, two series of samples with different compatibilities were investigated at various blend compositions. The surface morphology of the thin films was investigated by atomic force microscopy (AFM) measurements, while diffuse X-ray scattering provided additional depth sensitivity at a comparable lateral resolution. The results are indicative for phase separation lateral, as well as perpendicular, to the sample surface.     

Nanoindentation analysis of the pop-in events on SiGe single layer

The growth of metastable silicon germanium (Si_0.8Ge_0.2) thin film on Si(1 0 0) by ultrahigh-vacuum chemical vapor deposition has been subjected to residual indentation studies. A nanoindentation system has been applied to analyze SiGe film after different annealing treatments. A number of phenomena have been found for the heteroepitaxial growth of SiGe film at the critical thickness of 350 nm, including single discontinuity (the so-called “pop-in” event) as well as the elastic/plastic contact translation. Atomic force microscopy is employed to investigate the surface impression. Pop-in events in the load-indentation depth curves of 400 and 500 °C and no nano-cracks in the vicinity regions are found. The values of H ranging from 13.13±0.9, 21.66±1.3, 18.52±1.1, 14.47±0.7 GPa and the values of E ranging from 221.8±5.3, 230.7±6.4, 223.5±4.6, 156.7±3.8 GPa, are obtained. The elastic/plastic contact translation of the SiGe film occurs at different annealing conditions, with h_f/h_max values in the range of 0.501, 0.392, 0.424, and 0.535 for samples are treated at RT, 400, 500, and 600 °C, respectively. The mechanism responsible for the pop-in event in such crystal structure is due to the interaction of the indenter tip with the pre-existing threading dislocations, since the release of the indentation load is bound to be reflected in the directly compressed volume.     

Cathodic and anodic pre-treated boron doped diamond with different sp content: Morphological,structural, and impedance spectroscopy characterizations

In this work, the influence of cathodic (Red) and anodic (Ox) pre-treatment on boron doped diamond (BDD) films grown with different sp²/sp³ ratios was systematically studied. The sp²/sp³ ratios were controlled by the addition of CH₄ of 1,3,5 and 7 sccm in the gas inlet during the growth process. The electrodes were treated in 0.5 mol L⁻¹ H₂SO₄ at −3 and 3 V vs Ag/AgCl, respectively, for 30 min. The electrochemical response of BDD films was investigated using electrochemical impedance spectroscopy (EIS) and Mott–Schottky Plot (MSP) measurements. Four film sample sets were produced in a hot filament chemical vapor deposition reactor. During the growth process, an additional H₂ line passing through a bubbler containing the B₂O₃ dissolved in methanol was used to carry the boron. The scanning electron microscopy morphology showed well faced films with a small decrease in their grain size as the CH₄ concentration increased. The Raman spectra depicted a pronounced sp² band, mainly for films with 5 and 7 sccm of CH₄. MSP showed a decrease in the acceptor concentration as the CH₄ increased indicating the CH₄ influence on the doping process for Red–BDD and Ox–BDD samples. Nonetheless, an apparent increase in the acceptor concentrations for both Ox–BDD samples was observed compared to that for Red–BDD samples, mainly attributed to the surface conductive layer (SCL) formation after this strong oxidation process. The EIS Nyquist plots for Red–BDD showed a capacitance increase for the films with higher sp² content (5 and 7 sccm). On the other hand, the Nyquist plots for Ox–BDD can be described as semicircles near the origin, at high frequencies, where their charge transfer resistance strongly varied with the sp² increase in such films.     

Near infrared to UV dielectric functions of Al doped ZnO films deposited on c-plane sapphire substrate using pulsed laser deposition

Transparent conducting polycrystalline Al-doped ZnO (AZO) films were deposited on sapphire substrates at substrate temperatures ranging from 200 to 300 °C by pulsed laser deposition (PLD). X-ray diffraction measurement shows that the crystalline quality of AZO films was improved with increased substrate temperature. The electrical and optical properties of the AZO films have been systematically studied via various experimental tools. The room-temperature micro-photoluminescence (µ-PL) spectra show a strong ultraviolet (UV) excitonic emission and weak deep-level emission, which indicate low structural defects in the films. A Raman shift of about 11 cm⁻¹ is observed for the first-order longitudinal-optical (LO) phonon peak for AZO films when compared to the LO phonon peak of bulk ZnO. The Raman spectra obtained with UV resonant excitation at room temperature show multi-phonon LO modes up to third order. Optical response due to free electrons of the AZO films was characterized in the photon energy range from 0.6 to 6.5 eV by spectroscopic ellipsometry (SE). The free electron response was expressed by a simple Drude model combined with the Cauchy model are reported.     

脉冲激光沉积法制备高温压电薄膜0.20 BiInO$lt;sub$gt;3$lt;/sub$gt;-0.80PbTiO$lt;sub$gt;3$lt;/sub$gt;$lt;strong$gt;$lt;font color="#ff0000"$gt;$lt;font color="#ff0000"$gt;（已撤稿）$lt;/font$gt;$lt;/font$gt;$lt;/strong$gt;

采用脉冲激光沉积法制备了0.20BiInO₃-0.80PbTiO₃（20BI-PT）高温压电薄膜,并与0.15BiInO₃-0.85PbTiO₃（15BI-PT）样品进行了比较研究. X射线衍射谱显示,20BI-PT样品100峰出现了明显的劈裂,显示样品具有更高的四方对称性. FESEM图显示,20BI-PT样品中出现了部分111取向的三角形晶粒. 20BI-PT样品的铁电剩余极化（P_r）为～28 μC/cm²,矫顽场（E_c）为～120 kV/cm,相较15BI-PT样品,P_r略有增加,但同时E_c也有增加. 20BI-PT样品的横向压电系数（e_31,f）约为–4.7±0.6 C/m²,和15BI-PT相比几乎一样. 介电温度谱显示,20BI-PT 样品的居里温度比15BI-PT增加了约30 ℃,达590 ℃,且介电峰没有明显的频率依赖性. Rayleigh分析显示,20BI-PT样品中内在本征因素及可翻转畴对介电非线性的贡献和15BI-PT基本相同,但是外在因素的贡献没有15BI-PT的贡献大,这可能和20BI-PT样品中晶粒111相对取向率较高有关. 关键词： 薄膜 脉冲激光沉积 铁电 压电     

掺杂Y2O3和BaCeO3提高MOD-YBCO超导性能的研究

本文通过在前驱液中添加过量钇盐和铈的有机盐,采用三氟乙酸盐-金属有机沉积法(TFA-MOD) 在铝酸镧单晶基体上制备了含有纳米氧化钇和纳米铈酸钡的YBCO薄膜. 与纯YBCO薄膜相比,掺杂Y₂O₃/BaCeO₃的YBCO膜的临界转变温度几乎保持不变,为91 K左右. 而掺杂Y₂O₃/BaCeO₃的YBCO膜的临界电流密度达到5.0 MA/cm² (77 K, 0T), 是纯YBCO膜临界电流密度的1.5倍.薄膜中的Y₂O₃和BaCeO₃可能在YBCO内部起到了 有效的钉扎磁通作用. 关键词： 钇钡铜氧薄膜 2O₃和纳米BaCeO₃')" href="#">纳米Y₂O₃和纳米BaCeO₃ 磁通钉扎 三氟乙酸盐-金属有机沉积     

Controlled surface crystallization of fused silica by Li+-Ion implantation

A new method of producing a glass-ceramic surface layer on fused silica has been demonstrated using Li⁺-ion implantation and relatively low-temperature annealing. Infrared reflection spectroscopy (IRS) was used to study the effects of ion implantation on structural changes. Isochronal annealing of samples implanted with 250 keV Li⁺/cm² brings about a dramatic change in the IRS spectra at 800°C in that it becomes identical with that of α-quartz. The dependence of the degree of crystallization on temperature, Li⁺-ion fluence, and silica type was studied.     

Effect of pit formation and surface roughness on size-dependent thermal conductivity of nanometer-thick semiconducting films

In this work, the thermal conductivity variation due to pit formation and surface roughness in nanometer-thick semiconducting films has been studied. It is shown that the thermal conductivity of thin films is reduced due to the presence of these effects in the films. This reduction in thermal conductivity is dependent on film thickness. The present analysis has been done on GaAs nanometer-thick films using the available experimental data.     

Rare complication resulting from radiotherapy of spinal cord malignancy

A rare complication of irradiation is reported of a ten-year-old boy who had been treated by supervoltage irradiation following decompressive-laminectomy for his primary spinal cord neoplasm.

He probably received average dose of (4500) rads to a limited segment of his duodenum, within the six weeks. He developed this complication nine months after the completion of treatment. The dose-time-volume factors are considcred sufficient enough to produce such complications, however, there were apparent contributory factors such as unusual duodenal fixation and duodeno-jejunal ligament foreshortening.     

Effects of γ rays irradiation on structure and property of TiO2 thin films

TiO₂ thin films were deposited on a glass substrate by the radio frequency magnetron sputtering method, and annealed for 2 h at temperatures of 550°C. Then, ⁶⁰Co γ rays with different doses were used to irradiate the resulting TiO₂ thin films. The surface features of films before and after irradiation were observed by scanning electron microscope (SEM). Simultaneously, the crystal structure and optical properties of films before and after irradiation were studied by X-ray diffraction (XRD), UV–VIS transmission spectrum and Photoluminescence (PL) spectrum, respectively. The SEM analysis shows that the film is smooth with tiny particles on the film surface, and non-crystallization trend was clear after irradiated with γ rays. The XRD results indicated that the structure of the film at the room temperature mainly exists in the form of amorphous and mixed crystal at a sputtering power of 200 W, and non-crystallinity was more obvious after irradiation. Obvious difference can be found for the transmissibility of the irradiated and pre irradiation TiO₂ films by the UV-VIS spectra. The color becomes light yellow, and the new absorption edge also appeared at about 430 nm. PL spectra and photocatalysis experiments indicate that the photocatalysis degradation rate of the TiO₂ films on methylthionine chloride solution irradiated with the maximum dose can be increased to 90%.