Hybrid electron cyclotron resonance-radio-frequency plasma etching of III–V semiconductors in Cl2-based discharges. Part I: GaAs and related compounds

A systematic study has been performed of the dry etching characteristics of GaAs, Al_0.3Ga_0.7As, and GaSb in chlorine-based electron cyclotron resonance (ECR) discharges. The gas mixtures investigated were CCl₂F₂/O₂, CHCl₂F/O₂, and PCl₃. The etching rates of all three materials increase rapidly with applied RF power, while the addition of the microwave power at moderate levels (150 W) increases the etch rates by 20–80%. In the microwave discharges, the etch rates decrease with increasing pressure, but at 1 m Torr it is possible to obtain usable rates for self-bias voltages 100 V. Of the Freon-based mixtures, CHCl₂F provides the least degradation of optical (photoluminescence) and electrical (diode ideality factors and Schottky barrier heights) properties of GaAs as a result of dry etching. Smooth surface morphologies are obtained on all three materials provided the microwave power is limited to 200 W. Above this power, there is surface roughening evident with all of the gas mixtures investigated.     

Phosphan-, Phosphit- und Phosphido-Komplexe des Vanadiums(V)

Phosphane, Phosphite, Phosphido, Complexes of Vanadium(V) Complex formation of tert-butylimidovanadium(V)trichloride ( 1 ) with phosphanes und phosphites has been studied. Syntheses of phosphidovanadium(V) compounds ^tC₄H₉N?VCp(NH^tC₄H₉)[P(SiMe₃)₂] and ^tC₄H₉N?VCp(NⁱProp₂)(PR₂) (R?SiMe₃, Ph) are described starting from the corresponding chlorovanadium(V) complexes. The reaction of 1 with silver hexafluorophosphate yields a bis(fluoro)phosphidovanadium(IV complex [(μ-PF₂)₂V₂Cl₂)(N^tC₄H₉)₂]; as primary intermediate product of the unknown redox reaction a cationic vanadium(V) complex [^tC₄H₉N?VCl₂ · PPh₃]⁺PF₆^? has been isolated. 1 reacts with an excess of diisopropylamine forming ^tC₄H₉N?V(NⁱProp₂)Cl₂ ( 16 ); in addition the following diisopropylamido-tert-butylimidovanadium(V) compounds ^tC₄H₉N?VCp(NⁱProp₂)Cl ( 3 ) and ^tC₄H₉N?V(NⁱProp₂)X₂ (X?CH₂CMe₃, O^tC₄H₉, CH₃COO) has been prepared. All compounds obtained are characterized by ¹H, ⁵¹V, ³¹P NMR spectroscopy. The X-ray diffraction analysis of 16 and 3 indicate a planar coordination sphere of the amido nitrogen atom.     

RP-HPLC study of redox equilibria in vanadium-PAR binary and ternary systems: Direct determination of vanadium in steel

The reversed-phase high-performance liquid Chromatographic (RP-HPLC) behaviour of the binary chelates of V(V) and V(IV) with 4-(2-pyridylazo) resorcinol (PAR) and ternary chelates of vanadium with PAR and auxiliary ligands: hydrogen peroxide, hydroxylamine, tartrate and citrate were studied using a C₁₈ column. The complex double-peak chromatograms of V(IV)/V(V)-PAR systems were studied and the origin of each peak was proved. Vanadium in ternary systems with PAR and hydrogen peroxide was found exclusively in V(V)-H₂O₂-PAR complex (single peak on the chromatogram) despite its initial oxidation state. The double role of hydroxylamine (complex agent and reductor) in vanadium systems with PAR was confirmed: in the V(V) system three species were identified (V(V)-PAR, V(V)-NH₂OH-PAR and V(IV)-PAR), but in the V(IV) system only two: V(IV)-PAR and V(V)-NH₂OH-PAR. Citrate and tartrate giving single peak were found as auxiliary ligands in ternary V(V) systems of analytical importance. Due to its masking potential towards iron (III) ions, citrate was chosen as the most suitable third component of a ternary vanadium system with PAR, to form the basis of an RP-HPLC method for direct determination of V in steel.     

载波钝化和钼酸盐后处理对不锈钢钝化膜性能的影响

一般认为交流电对金属的腐蚀过程具有加速作用,但我们发现,在直流电位基础上叠加适当波形、幅值和频率的交流电对不锈钢进行载波钝化,尔后再进行适当后处理可使钝化膜的稳定性提高,我们曾就不经后处理的载波钝化过程进行过探讨,本文着重探讨钼酸盐后处理对载波钝化膜表面状态和化学稳定性改善的作用机理。     

Na3V2(PO4)2O2F的合成及其在钠离子电池中的应用

目前,合成Na3V2(PO4)2O2F(NVPF)材料的方法包括高温固相法、水热法、溶剂热法等,这些方法均不利于该材料的大规模工业化生产.本文开发了温和的低温共沉淀法合成NVPF材料,该材料首次放电容量为105.6 mAh·g-1,首次效率为90.16％.经过简单的热处理过程,可以有效去除由于液相合成带来的结晶水以及吸...     

V2O5纳米片固载Pt纳米粒子催化剂的构建及其增强催化空气氧化脱硫性能

以铂系金属为代表的贵金属催化剂在工业反应中通常表现出优异的催化性能,这是因为其具有独特的d带电子结构和较高的价电子比.近年来,由于大气排放法规愈发严苛,铂系贵金属催化剂在催化空气氧化燃油脱硫方面的研究引起了广泛关注.在该催化反应中,铂系金属纳米粒子可以有效活化空气中的氧气,产生的活性氧物种可以将油品中的噻吩类硫化物氧化为其对应的强极性砜类物质,从而可以将其从非极性的油品中分离出来,有效实现油品中硫化物的深度氧化脱除.然而,在反应过程中铂系贵金属纳米粒子易发生流失和烧结,从而导致催化剂的失活.因此,急需寻找一类可以有效固载铂系贵金属纳米粒子的载体.在目前已报道的众多载体中,以ZrO₂、TiO₂、CeO₂、ZnO等为代表的过渡金属氧化物引起了广泛的关注.通常认为,铂系贵金属纳米粒子的d轨道电子和过渡金属氧化物之间可形成金属-载体强相互作用.然而,目前所使用的过渡金属氧化物载体的比表面积较小,从而导致铂系贵金属纳米粒子难以有效且均匀地分散于其表面.本文采用热膨胀气相剥离法制备了超薄V2O5纳米片,并通过超声辅助沉积法将Pt纳米粒子固载于其表面,从而得到一系列可高效活化空气氧化脱硫的催化剂(Pt NPs-n/V₂O₅纳米片).通过电感耦合等离子体光谱、高倍透射电镜、原子力显微镜、X射线光电子能谱、X射线衍射、拉曼光谱和氮气吸附脱附等方法对催化剂的结构和形貌进行了表征.结果表明,尺寸为4-5 nm的Pt纳米粒子可有效均匀分散于层数约为6层的V2O5纳米片表面;在空气氧化脱硫反应中,当催化剂中Pt理论负载量为2 wt%时,反应5 h后,油品的脱硫率可达99.1%,实现了硫化物的深度氧化脱除.该反应体系对不同硫浓度、不同含硫底物的油品均有较好的脱除效果,但对含有烯烃、芳烃的油品脱除效果较差.此外,催化剂循环使用7次后,其脱硫活性仍无明显下降,表现出优异的重复使用性能.对反应后的催化剂进行表征,发现Pt几乎不发生流失,这可能是由于Pt纳米粒子和V₂O₅纳米片之间形成了金属-载体强相互作用.该结果为其他空气氧化反应的有效进行提供了新思路.     

Aryl groups,supplement of amino protecting group chemistry!

Amino group protective strategy has consequently emerged in multistep organic synthesis. Easy and selective deprotection procedures are crucial to facilitate the chemical transformation. Recently, Zhang's group from Henan Normal University collaborating with Chen's group of Nankai University developed a novel strategy for the regiospecific cleavage of inert aryl C-N bonds in N-aryl amides by hypervalent iodine(V) reagents. These procedures allow removal of sort of aryl groups under mild conditions to give primary amides in high efficiency. It bestows these aryl groups with the characteristics of amino protecting groups that might be the supplement of amino protecting group chemistry.     

Tchebycheff-Fourier级数的Vallce Poussin平均逼近函数类Lip α

本文考虑用ＴｃｈｅｂｙｃｈｅｆＦｏｕｒｉｅｒ级数的ＶａｌéｅＰｏｕｓｉｎ平均逼近函数类Ｌｉｐα,在ｆ（ｘ）∈Ｃ［－１,１］时获得了逼近阶及逼近误差的表达式,推广并较大地改进了文献［１,２］中的有关结果．     

Casimir effect in source theory III

A proper-energy method is used to find the energy of attraction between two dielectric slabs. Independent derivations of the attractive force are also presented.