ZnO：V薄膜后退火处理前后的微结构与发光特性

利用溶胶-凝胶(Sol-gel)法在单晶硅(100)衬底上分别制备了ZnO:V薄膜和纯ZnO薄膜。为进一步研究后退火对ZnO:V薄膜结构和发光性质的影响,在两段式快速退火后又在800℃下进行了后退火处理。X射线衍射的结果表明:后退火处理前,钒(V)的掺入使ZnO结晶质量变差,而800℃退火处理后,从ZnO的衍射峰中可以看出,相对于无V杂样品其结晶质量变好。扫描电子显微镜形貌图中可以看出制备的样品薄膜颗粒大小均匀,薄膜致密度较高。光致发光(PL)谱的研究表明:ZnO:V薄膜在800℃退火处理后,紫外和绿带发光峰均增强,但紫外发光峰增强得更多;与同样条件下制备的纯ZnO薄膜的PL谱比较,发现V掺杂后样品的紫外激子复合发光峰的强度明显增强且峰位发生蓝移,而缺陷引起的绿带发光峰的强度降低。     

Tl-based superconducting films prepared by aerosol spray deposition and thallinated in an open system

Superconducting Tl-based films were prepared on a LaAlO₃ single crystal substrate. Spray pyrolysis of Ba, Ca and Cu nitrate solutions was used for deposition of the precursor films. They were subsequently ex-situ thallinated in flowing oxygen (open system). While the superconducting Tl-2212 phase formed at an annealing temperature of 880°C, thallination at 900°C led to the formation of a Tl-2223 /Tl-2212 mixture. The amount of Tl-2223 increased with prolonged thallination, whereas the Tl-2212 phase progressively disappeared. Films prepared in such a manner were c-oriented and contained only low amounts of non-superconducting impurities. The resulting samples were characterized by XRD and SEM and their T _C values were determined by resistive four-point measurements. They showed critical temperatures in the range of T _ON = 125–135 K, T _C0 = 91–93 K. Differences between the composition and properties of the obtained films and those thallinated in closed systems under 50 kPa of oxygen are discussed in this paper. Results show that the Tl-2212 → Tl-2223 transformation proceeds at a slower rate under flowing oxygen than in a closed system. Presented at 5-th International Conference Solid State Surfaces and Interfaces, November 19–24, 2006, Smolenice Castle, Slovakia.     

Study on typical behavior of transient nature (I-t) and hysterisis nature of I–V characteristics of dye doped solid state thin film photoelectrochemical cell

In this present investigation, we describe the steady state current voltage (I–V) characteristic of Crystal violet dye dispersed solid state photoelectrochemical cell (PEC). Typical behavior of dark current-voltage characteristic by increasing and decreasing external bias voltage has a similar form like hysterisis in nature. Although we have already observed this hysterisis nature in case of both forward and reverse bias condition, yet it is clear that the reverse hysterisis curve is more prominent than forward hysterisis. In this paper, we are getting double values of current (I) for a single value voltage, which is also helpful to understand the charge transport process through disordered materials. As the bias increases, the distribution of traps depth, which is exponential in nature, changes toward order state (resulting increase in disordered parameter α) This means that as α increases, it tends to reach the most order state of material. When external bias voltage is at 3.5 V, the value of disorder parameter becomes 1, and when bias voltage is beyond 3.5 V, the diffusion comes enhanced in nature.     

Zn离子注入和退火对ZnO薄膜光学性能的影响

 利用溶胶凝胶方法在石英玻璃衬底上制备了ZnO薄膜，将能量56 keV、剂量1×10¹⁷ cm^-2的Zn离子注入到薄膜中。离子注入后，薄膜在500~900 ℃的氩气中退火，利用X射线衍射谱、光致发光谱和光吸收谱研究了离子注入和退火对ZnO薄膜结构和光学性质的影响。结果显示：衍射峰在约700 ℃退火后得到恢复；当退火温度小于600 ℃时，吸收边随着退火温度的提高发生蓝移，超过600 ℃时，吸收边随着退火温度的提高发生红移；近带边激子发光和深能级缺陷发光都随退火温度的提高而增强。     

室温生长MgO底层诱导(001)取向FePt薄膜的有序化过程对FePt成分的依赖

室温下通过磁控溅射在表面热氧化的Si基片上生长了MgO/Fe_xPt_100-x双层膜和Fe_xPt_100-x单层膜系列样品，Fe_xPt_100-x的原子成分x=48—68.研究了热处理前后不同成分FePt薄膜的晶体结构和磁性的变化，尤其是MgO底层的引入对FePt的晶体结构和磁性的影响 关键词： FePt(001)薄膜 0相')" href="#">L1₀相     

SrBi2Ta2O9/Bi4Ti3O12复合铁电薄膜的制备与特性研究

采用溶胶凝胶工艺在p-Si衬底上制备了SrBi₂Ta₂O₉/Bi₄Ti₃O₁₂复合铁电薄膜. 研究了SrBi₂Ta₂O₉/Bi₄Ti₃O₁₂复合薄膜的微观结构与生长行为、铁电性能和疲劳特性. 研究表明: Si衬底Bi₄Ti< 关键词： 2Ta₂O₉')" href="#">SrBi₂Ta₂O₉ 4Ti₃O₁₂')" href="#">Bi₄Ti₃O₁₂ 复合铁电薄膜 溶胶凝胶工艺     

掺杂偶氮化合物的PMMA光折变聚合物的拉曼光谱分析

光折变聚合物具有良好的光折变效应,采用以惰性聚合物PMMA为基体,掺杂偶氮化合物染料的光折变聚合物具有较好的光学非线性和稳定性。文章主要介绍使用激光拉曼光谱仪对合成聚合物的各单体和聚合物薄膜进行拉曼光谱扫描,对比分析各个单体成分的特征谱峰与聚合物薄膜特征谱峰,肯定了实验中得到的光折变聚合物薄膜与理论上要求得到的一致性。     

存储器用铁电薄膜及电极材料的研究

铁电体独特的自发电极化双稳性质和非线性光学性质使其在光电子器件中得到广泛应用．为了实现器件的小型化和与微电子、光电子工艺兼容，铁电薄膜已成为一个研究热点．自发电极化的大小和取向以及外电场、缺陷和铁电薄膜／电极界面与自发电极化的交互作用决定了铁电薄膜的性质和服役行为．文章以铁电存储器和光电子器件应用为背景，选择了具有重大应用前景的Bi4-xLaxTi3O12（BLT）、SrBi2Ta2O9（SBT）、PbZrxTi1-xO3（PET）和LiNbO3（LN）铁电薄膜以及相关的La（Sr，Co）O3（LSCO）和LaNiO3（LNO）等电极材料为研究对象，研究了缺陷电荷和电畴的交互作用和它们在交变外电场中的动力学行为，探明了铁电薄膜疲劳现象的物理本质；从晶格结构与缺陷的观察研究入手，探索了材料铁电性质的起源和优化材料铁电性质的途径；从铁电薄膜／电极界面结构与性质的研究入手，寻找更有效、更稳定的电极材料与结构，从而为器件应用打下了基础；在研究外电场对铁电薄膜生长机制影响的基础上，找到了利用外电场调控铁电薄膜结构的新途径，发展了新的、与半导体器件和光电子器件工艺兼容的制膜方法．     

交换弹性磁性材料的研究进展

对近年来交换弹性磁性材料（包括高性能永磁和磁存储介质）等方面的最新研究进展作了一些简单的综述，总结了存在的一些问题并指出了用以解决这些问题的可能途径，为进一步的深入研究提供参考。     

原位氧化Zn3N2制备P型ZnO薄膜的性能研究

采用射频反应溅射法在玻璃衬底上制备Zn3N2薄膜,然后向真空室中通入纯氧气进行热氧化制备ZnO薄膜.利用X射线衍射、扫描电子显微镜、霍尔效应测量、透射光谱和光致发光光谱等表征技术,研究了氧化温度和氧化时间对ZnO薄膜的结晶质量、电学性质和光学性能的影响.研究结果显示,450℃下氧化2h后的样品中除含有ZnO外,还有Zn3N2成分,500℃下氧化2h可以制备出电阻率为0.7Ωcm,空穴载流子浓度为1017cm-3,空穴迁移率为0.9cm2/Vs的具有c轴择优取向的p型ZnO薄膜.此时的ZnO薄膜具有良好的光学特性,紫外可见光范围内透过率为85%,处于紫外区域的激子复合产生的发光峰很强,且半高宽较窄,而处于可见光部分来自于深能级发射的绿色发光峰很弱.这种工艺制备的ZnO薄膜质量较好,有利于实现在短波长光电器件方面的应用.