Negative plasma potential in unmagnetized DC electropositive plasma with conducting walls

Negative plasma potentials were obtained in DC hot filament unmagnetized electropositive argon plasma for sufficiently low neutral pressure. Double layers provide ion and electron confinement near the walls. The potential profiles from the center of the plasma to the potential minima are quite similar in shape to those observed when the plasma has positive plasma potentials. The primary electrons emitted from the filaments are important for charge conservation and for modification of the Bohm criteria but are not important for current balance.     

On complete graphs with negative r-mean curvature

We generalize Efimov's Theorem for graphs in Euclidean space using the scalar curvature, with an additional hypothesis on the second fundamental form.     

Effect of low-temperature processing on dry film photoresist properties for flexible electronics

This study presents the mechanical characterization of the dry film photoresist PerMX and its adhesion properties when laminated onto Kapton® E (PI) and Melinex® ST506 (PET). Additionally, the processing temperature, the adhesion strength, and the neutral plane position are investigated and optimized. A relatively low-temperature (85 °C) process is developed to protect the integrity of the polymers with low glass transition temperature and reduce the thermal mismatch stress. Reduction in processing temperature led to a decrement in the adhesion strength. To counteract this unwanted effect, surface treatments (oxygen plasma) are performed on the polymer surface before lamination. Using the latter techniques, adhesion of PerMX to PET (hard bake: 1 h at 85 °C) is increased from 0.07 to 0.26 N mm⁻¹ (variation of 270%). Finally, the mechanical robustness is investigated and increased by tuning the position of the neutral plane, after 50,000 bending cycles and a radius of curvature of 2.5 mm. © 2013 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2013     

A Simplified Model for the Etch Rate of Novolac-Based Photoresist

The novolac-based resins used as positive-tone photoresists are frequently etched in an oxygen plasma. It is desirable to have a predictive model of the photoresist etch rate but, for process improvement, control, and analysis, the development of a rigorous mechanistic model is impractical. Instead, a simplified mechanistic model is derived, here, according to the method proposed by Hougen and Watson for the study of fluid–solid interactions. This model derivation method is employed in order to arrive at a functional form that represents chemical etching of the resist by oxygen radicals, assisted by the plasma ion flux. Values for model parameters are determined from process data by nonlinear regression. The quality of the model fit to the data is tested statistically.     

First-order phase transitions: equivalence between bimodalities and the Yang–Lee theorem

First-order phase transitions in finite systems can be defined through the bimodality of the distribution of the order parameter. This definition is equivalent to the one based on the inverted curvature of the thermodynamic potential. Moreover we show that it is in a one-to-one correspondence with the Yang–Lee theorem in the thermodynamic limit. Bimodality is a necessary and sufficient condition for zeroes of the partition sum in the control intensive variable complex plane to be distributed on a line perpendicular to the real axis with a uniform density, scaling like the number of particles.     

Measuring the performance of manufacturing firms with super slacks based model of data envelopment analysis: An application of 500 major industrial enterprises in Turkey

Data envelopment analysis (DEA) is a mathematical programming technique which has a wide application area. There are many applications of DEA to measure firms’ performance. Balance sheet data is frequently used in order to measure performance of firms through DEA. So it is the characteristic of balance sheets that assets and liabilities amount to the same value. When the data for inputs and outputs are selected from both assets and liabilities sections of the balance sheet, it is important that more attention be paid to the analysis since values assigned to inputs and outputs could be included in assets and liabilities at the same time. Such a situation could create problems concerning the conclusions drawn as a result of analysis.     

LIQUID-LIQUID PHASE EQUILIBRIUM OF POLYMER SOLUTIONS AND POLYMER BLENDS UNDER POSITIVE AND NEGATIVE PRESSURE

In this paper we would like to give a brief review about the extensibility of the liquid-liquid locus into the negativepressure region. Negative pressure states are hardly explored; most researchers believe that the pressure scale ends at p = 0.We would like to show that this is not true, the p = 0 point is not a special point for liquids, it can be "easily" crossed. We aregoing to give a few example, where the extension of liquid-liquid locus for polymer blends and solutions below p = 0 givesus some interesting results, like the merging of UCST and LCST branches in weakly interacting polymer solutions or thereason why most UCST blends exhibit pressure induced immiscibility. Also, we will see what happens with the immiscibilityisland of aqueous polymer solutions when -- reaching the critical molar mass -- it "disappears".     

集合风险模型的可分解性

本文讨论了集合风险模型中 ,在复合二项分布和复合负二项分布两种情况下的可分解性问题 ,得到了同复合泊松分布情况下类似的结果     

A different construction of Gaussian fields from Markov chains: Dirichlet covariances

We study a class of Gaussian random fields with negative correlations. These fields are easy to simulate. They are defined in a natural way from a Markov chain that has the index space of the Gaussian field as its state space. In parallel with Dynkin's investigation of Gaussian fields having covariance given by the Green's function of a Markov process, we develop connections between the occupation times of the Markov chain and the prediction properties of the Gaussian field. Our interest in such fields was initiated by their appearance in random matrix theory.     

从几何光学研究负折射率透镜的有限尺寸效应

从几何光学理论证明了,在左手系材料(负折率材料)透镜中存在完善聚焦的概念。当该透镜的尺寸可以认为是无穷大时,该透镜是无几何像差透镜。进一步考虑了有限透镜孔径对成像面上成像质量的影响,模拟结果表明:成像面上亮度对比度分布不均匀;且随着透镜孔径大小与厚度的比值减小,像的对比度将会增加。