Structural and electrical properties of crystalline (1−x)Ta2O5−xTiO2 thin films fabricated by metalorganic decomposition

Polycrystalline (1−x)Ta₂O₅−xTiO₂ thin films were formed on Si by metalorganic decomposition (MOD) and annealed at various temperatures. As-deposited films were in the amorphous state and were completely transformed to crystalline after annealing above 600 °C. During crystallization, a thin interfacial SiO₂ layer was formed at the (1−x)Ta₂O₅−xTiO₂/Si interface. Thin films with 0.92Ta₂O₅–0.08TiO₂ composition exhibited superior insulating properties. The measured dielectric constant and dissipation factor at 1 MHz were 9 and 0.015, respectively, for films annealed at 900 °C. The interface trap density was 2.5×10¹¹ cm⁻² eV⁻¹, and flatband voltage was −0.38 V. A charge storage density of 22.8 fC/μm² was obtained at an applied electric field of 3 MV/cm. The leakage current density was lower than 4×10⁻⁹ A/cm² up to an applied electric field of 6 MV/cm.     

Improved coating method for uniform polymer layer in infrared hollow fiber

An improved coating method was proposed in order to form a uniform polymer layer in the fabrication of cyclic olefin polymer-coated silver (COP/Ag) hollow fiber. A COP solution was flowed in a closed loop, in which the silver-coated tube was used as a part of the loop. Owing to the constant flowing speed of the COP solution and the airtight flowing environment, a COP layer was uniformly formed. The hollow fibers attain high performance and deliver multi-wavelength laser light from the infrared to the visible simultaneously. The method was successfully applied to the fabrication of practical hollow fibers with 2 m length for the near and mid-infrared lasers.     

单层光学薄膜中薄膜－衬底体系的双重干涉效应及其应用

提出了单层光学薄膜中薄膜与衬底反射光之间的双重干涉效应的理论，实验结果证实了理论分析的正确性。双重干涉效应使薄膜－衬底体系的热致反射调制度高达８０％，这一效应可望有极广泛的应用     

Molecular deposition film of porphyrin and phthalocyanine bearing oppositely charged substituents

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VA族元素对阳极铅(Ⅱ)氧化物膜半导体性质的影响(Ⅱ)

用光电化学电流法研究了铅、铅砷、铅锑和铅铋合金在4．5mol·L－1H2SO4溶液（22℃）中，以0．9V（vs．Hg／Hg2SO4）极化7h而形成的阳极膜中的氧化铅的半导体性质，合金添加剂砷、锑和铋对t－PbO（四方氧化铝）和o-PbO（斜方氧化铝）的禁带宽度没有影响，从量子效率和电位的关系可求Pb，Pb－lat％As（at％表示原子百分比，全文同），Pb-lat％Sb和Sb－lat％Bi上膜中t－Pbo的施主密度（ND）分别为9．3×1015，1．0×1016，3．1×1016和1．3×1017cm-3，平带位分别为-0．20，－0．22，－0．28和-0．08V（vs．Hg／Hg2SO4）．比较VA元素砷、锑和铋对上述膜中t－Pbo的ND（从而自由电子密度）和膜中t－Pbo的生长速率的影响，可认为法添加剂砷、锑和铋对阳极膜中t-Pbo的作用符合Hauffe规则．     

壳聚糖-聚羟基丁酸酯共混膜的制备与性质

以乙酸为共溶剂,制备了壳聚糖-聚羟基丁酸酯(CTS-PHB)共混膜,利用红外光谱(FT-IR)、广角X粉末衍射(WAXD)、扫描电镜(SEM)及差热分析(DTA)表征了共混膜的化学组成、晶形、形貌和热稳定性能。研究表明:CTS和PHB可在体积百分数为62.5%的乙酸溶液中共混,形成表面光滑、不透明的膜,干态共混膜具备一定的力学强度。各比例的CTS-PHB共混膜有相同的热分解温度,共混膜的形貌特征随两组分质量配比变化,其中mPHB/mCTS=1/1的共混膜显示出良好的有序结构。     

有机硅耐磨透明涂层的固化分析

ＦＴＩＲ、ＴＧ、ＴＢＡ等对有机硅耐磨涂料（有机硅溶胶）的热固化过程研究表明有机硅胶体中缔合羟基间的脱水缩合速率很高；羟基脱水程度与固化温度有关，温度越高，达平衡时羟基的浓度越低，在１０５～１３０℃间羟基的浓度变化最大，加入适当的固化剂，对羟基的脱水交联有促进作用，在较高的固化温度下，反应体系中出现了环氧环异构化产生的酮羰基的吸收峰     

Preparation and Properties of Anti-Reflection/Anti-Static Thin Films for Cathode Ray Tubes Prepared by Sol-Gel Method Using Photoirradiation

A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered films of SiO₂/SnO₂ were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels.     

Tribological properties of ormosil coatings

Transparent plastics are not scratch resistant. The damage leads to a loss of optical properties. Coatings prepared using either tetraethoxysilane or colloidal silica particles embedded in glymo is a way to avoid these disadvantages. Tribological experiments are carried out to better understand the surface modification due to a sliding friction. It is shown that the wear track is not directly related to usual mechanical properties such as Young's modulus and the hardness of the coating. The different stages leading to material loss are discussed in term of particle removal and debris circulation (accumulation or elimination) through the friction track. The mechanical properties of the film combined with the film to substrate adhesion are expected to play an important role as it can be deduced from results obtained as a function of the coating composition.