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11.
Ari Sihvola 《Optik》2006,117(7):317-320
A geometric visualization is presented for the Brewster angle for a plane wave reflecting from an interface. The surface is assumed to be isotropic but it is allowed to display both dielectric and magnetic susceptibility, and hence the Brewster (polarizing) angle can attain any value between 0 and 90°, and can exist for both parallel and perpendicular polarizations. The geometric construction (a tetrahedron) is spanned by the basic material parameters of the surface. The Brewster angle appears in one of the faces of the tetrahedron.  相似文献   
12.
姚焜  康士秀  孙霞  吴自勤  黄宇营  巨新  冼鼎昌 《物理》2002,31(2):105-112
比较了同步辐射(SR)X射线荧光(XRF),电子和质子激发的X射线谱,介绍了XRF谱的采集方法及数据处理方法(主要是能谱方法),智能方法的无标样(基本参数法)定量分析原理,以及近期在植物微量元素分析中得到的结果。  相似文献   
13.
运用层析法、结晶法从狭苞橐吾全草中分离得到艾里莫芬烷型倍半萜8β-hydroxyeremophil-7(11)-ene-12,8α(4β,6α)-diolide化合物,并通过质谱、核磁共振氢谱和碳谱、氢核-氢核相关谱、异核多量子相干谱和异核多键相干谱进行结构鉴定.其单晶经X射线衍射测试表明,其晶体属正交晶系,空间群为P212121,晶胞参数为: a=6.8519(5),b=10.7191(8),c=18.5942(14)A,V=1365.67(18) A3,Z=4,Dc=1.354 mg/m3.F(000)=592,μ=0.101 mm-1  相似文献   
14.
Given an oblique projector P on a Hilbert space, i.e., an operator satisfying P 2=P, which is neither null nor the identity, it holds that ||P|| = ||IP||. This useful equality, while not widely-known, has been proven repeatedly in the literature. Many published proofs are reviewed, and simpler ones are presented.  相似文献   
15.
Crack free, dense and transparent CdTiO3 thin films have been prepared by sol-gel technique using titanium butoxide and cadmium acetate. The formation of the CdTiO3 phase started from 500°C annealing temperature onwards. The complete orthorhombic structure of CdTiO3 was formed on Silicon (100) substrate at an annealing temperature of 600°C for 5 h. As the annealing temperature increased from 600 to 700°C, we have observed the cadmium silicate phase at the interface of Si and CdTiO3 phase. Structural, morphological and elemental evolution of these CdTiO3 thin films produced by sol-gel synthesis were characterised by grazing incidence X-ray diffraction (GIXRD), tapping mode atomic force microscopy (TMAFM), scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) respectively.  相似文献   
16.
激光产生的铝、硅、氧、铜、硒等离子体X光谱   总被引:7,自引:3,他引:4  
利用长晶格的OHM晶体谱仪,从激光等离子体中获得丰富的铜、硒类氖、类氟、类钠离子的二、三、四级软X射线衍射光谱和铝、氧、硅的类氢、类氦、类锂离子一到四级谱,波长在14~40(?)之间,在此基础上,本文较为细仔地分析了各光谱结构.  相似文献   
17.
周海涛  陶冶  刘涛  黎刚  朱满康 《中国物理 C》2006,30(10):1022-1026
在北京同步辐射装置(BSRF)1W1B光束线和XAFS实验站上国内首次建立了硬X射线波段的磁圆二色实验(XMCD)方法. 以单晶金刚石作为相位延迟片, 在透射劳埃(Laue)模式下, 利用衍射双折射效应, 将入射的单色线偏振光转变为相应的左旋和右旋圆偏振光, 测量磁化样品对左旋和右旋圆偏振光吸收的差异, 获得了XMCD信号. 本实验使用透射方法测量了Pt-Fe合金Pt L2,3边的XMCD, 获得了XMCD信号. XMCD实验方法的建立, 为研究磁性材料尤其是磁性薄膜材料的电子结构和磁结构提供了实验基础.  相似文献   
18.
Eldad Herceg 《Surface science》2006,600(19):4563-4571
The formation of a well-ordered p(2 × 2) overlayer of atomic nitrogen on the Pt(1 1 1) surface and its reaction with hydrogen were characterized with reflection absorption infrared spectroscopy (RAIRS), temperature programmed desorption (TPD), low energy electron diffraction (LEED), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS). The p(2 × 2)-N overlayer is formed by exposure of ammonia to a surface at 85 K that is covered with 0.44 monolayer (ML) of molecular oxygen and then heating to 400 K. The reaction between ammonia and oxygen produces water, which desorbs below 400 K. The only desorption product observed above 400 K is molecular nitrogen, which has a peak desorption temperature of 453 K. The absence of oxygen after the 400 K anneal is confirmed with AES. Although atomic nitrogen can also be produced on the surface through the reaction of ammonia with an atomic, rather than molecular, oxygen overlayer at a saturation coverage of 0.25 ML, the yield of surface nitrogen is significantly less, as indicated by the N2 TPD peak area. Atomic nitrogen readily reacts with hydrogen to produce the NH species, which is characterized with RAIRS by an intense and narrow (FWHM ∼ 4 cm−1) peak at 3322 cm−1. The areas of the H2 TPD peak associated with NH dissociation and the XPS N 1s peak associated with the NH species indicate that not all of the surface N atoms can be converted to NH by the methods used here.  相似文献   
19.
 强流脉冲电子束在材料中的能量沉积剖面、能量沉积系数和束流传输系数受其入射角的影响很大,理论计算了0.5~2.0MeV的电子束以不同的入射角在Al材料中的能量沉积剖面和能量沉积系数,并且还计算了0.4~1.4MeV电子束以不同入射角穿透不同厚度C靶的束流传输系数。计算结果表明,随着入射角的增大,靶材表面层单位质量中沉积的能量增大,电子在靶材料中穿透深度减小,能量沉积系数减小,相应的束流传输系数也减小;能量为0.5~2.0MeV的电子束当入射角在60°~70°时在材料表面层单位质量中沉积的能量较大。  相似文献   
20.
A series of low density polyethylene systems has been studied with respect to structural evolution and short-term dielectric breakdown behaviour. All materials were based upon a single polymer, that is commonly used in high voltage applications, but with different additives. In all three of these systems, multiple melting transitions were observed, as a result of molecular fractionation effects during crystallization. In the virgin polymer, a space-filling banded spherulitic morphology was found to develop at low temperatures (102 °C and below) whereas, at higher temperatures, only a few isolated axialites were observed. Inclusion of the antioxidant resulted in greatly increased nucleation densities, such that, at low temperatures, no evidence of spherulitic organisation remained. At higher temperatures, sheaf-like lamellar aggregates developed, which were much smaller and much more numerous than in the case of the virgin polymer. Further addition of dicumyl peroxide (DCP) resulted in the rapid formation of a crosslinked network at 200 °C. Some crosslinking also occurred at 150 °C, but over a much longer timescale. Where extensive crosslinking occurred prior to crystallization, the resulting gel inhibited structural development, such that only a few small, isolated sheaves were able to form at 102 °C. In view of the principal application area of this material, the breakdown strength of each of the above systems was then measured and the whole data set was analysed statistically. When structural factors were considered alongside the statistics, no clear trends emerged to indicate that either the compositional or morphological variations were reflected in the short-term electrical failure processes.  相似文献   
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