Mg掺杂PST薄膜的溶胶-凝胶法制备及晶相形成研究

利用溶胶-凝胶法成功制备了Mg掺杂Pb_0.4Sr_0.6Mg_xTi< sub>1-xO_3-x薄膜，利用x射线衍射仪对薄膜的物相和结构进行了分析， 用扫描电子显微镜对薄膜的形貌和断面等进行了观察.研究结果表明，薄膜以立方钙钛矿为 晶相，薄膜中晶相以团聚状颗粒存在，晶相含量受热处理条件和Mg的掺杂量所控制.Mg掺杂 对Pb_0.4Sr_0.6Mg_xTi_1-xO_3-x 薄膜晶相含量的影响与钙钛矿中的氧空位缺陷相关.在一定的掺杂范围内，由掺杂引起晶相 的晶格畸变较小时，体系掺Mg平衡了晶体内本征氧空位引入的电荷不平衡，使晶相更为稳定 ，析晶能力提高，晶体形成量随掺杂浓度的提高而提高.当掺杂浓度达到一定量时， 随着Mg 掺杂浓度增加，一方面使形成晶体时杂质浓度增加造成参与形成晶相的组成含量下降，另一 方面使进入钙钛矿结构的Mg增加，氧空位大量增加使畸变程度提高，形成的晶相不稳定，析 晶能力下降，晶体含量随掺杂Mg浓度的增加而不增反降.在相同条件下制备的Pb_{0.4Sr0.6MgxTi1-xO3-x薄膜中Mg掺量约为 x=0.01时，得到的钙钛矿相含量最高，本征氧缺陷所带入的正电荷和Mg引入时带入的负电荷 间达到平衡.此外，Mg的掺入还影响到析晶与热处理过程之间的关系.在高Mg掺量范围，Mg含 量越高，形成的晶相越不稳定，热处理时间越长，使热处理过程中分解的晶相量越多，随Mg 掺量越高和热处理时间越长，薄膜中晶相含量越低. 关键词： 溶胶-凝胶法 PST薄膜 Mg掺杂 晶相形成}     

直流磁控溅射沉积含He钛膜的研究

研究了用He/Ar混合溅射气体的直流磁控溅射制备钛膜中，He的掺入现象.分析结果表明，大量的He原子（He/Ti原子比高达56%）被均匀地引入到Ti膜中，其He含量可由混合溅射气体的He分量精确控制.通过调节溅射参数，可实现样品中He的低损伤引入.研究还发现，溅射沉积的含氦Ti膜具有较高的He成泡剂量和高的固He能力，这可能是溅射沉积形成了纳米晶Ti膜所致.纳米晶Ti膜较粗晶材料具有很高浓度的He捕陷中心，使He泡密度增大而泡尺寸减小.随He引入量的增加，Ti膜的晶粒尺寸减小，He引起的晶体点阵参数和X射线衍射峰宽度增大，晶体的无序程度增加.Helium trapping in the Ti films deposited by DC magnetron sputtering with a He/Ar mixture was studied. He atoms with a surprisingly high concentration (He/Ti atomic ratio is as high as 56%)incorporate evenly in deposited film. The trapped amount of He can be controlled by the helium partial amount. The introduction of the helium with no extra damage(or very low damage) can be realized by choosing suitable deposition conditions. It was also found that because of the formation of nanophase Ti film a relative high He flux for bubble formation is needed and the amount of the retain He in sputtering Ti films is much higher than that in the coarse grain Ti films. The nanophase Ti film can accommodate larger concentration of trapped sites to He, which results in a high density and small size of the He bubbles. With the increasing He irradiation flux, the grain size of Ti film decreases and the lattice spacing and width of the X ray diffraction peak increase due to the He introduction, and the film tends to amorphous phase.     

3ω法加热/测温膜中温度波解析及其在微/纳米薄膜导热系数测量中的应用

给出了3ω法测试系统中描述薄膜表面加热/测温膜中温度波动的级数形式解，并将复数温度波动的实部和虚部分开表示.利用该解分析了交流加热频率、加热膜宽度和材料热物性的组合参数对加热膜温度波动幅度的影响.并根据此解对测量原理的数学模型进行了修正，建立了相应的3ω测试系统，首先测定了厚度为500 nm SiO₂薄膜的导热系数，验证了实验系统的合理性.加大了测试频率，利用级数模型在高频段直接得到SiO₂薄膜的导热系数，结合低频段的数据同时确定了Si基体的导热系数.利用级数解分析测试了激光晶体Nd:YAG〈111〉面上多层ZrO₂/SiO₂增透膜的导热系数，测试的ZrO₂薄膜的导热系数比体材料小.进行了不确定度分析.结果表明，提出的分析方法可以有效研究微器件表面薄膜结构的导热性能. 关键词： ω法')" href="#">3ω法 微/纳米薄膜 导热系数 微尺度加热膜     

三维多孔花状ZnO微纳结构的合成及光催化性能

采用电沉积及后续的热处理技术,在Ti衬底上合成了一种三维多孔花状ZnO微纳结构薄膜. 这种ZnO结构是由包含大量纳米颗粒和孔洞的纳米薄片组成,纳米颗粒的大小可以通过调节电沉积时间和煅烧温度控制. 光催化性能的测试表明这种多孔ZnO薄膜是一种理想的光催化剂.     

Demagnetization in photomagnetic films

We present a model for demagnetization in photomagnetic films, and investigate different regimes for the magnetizing process using finite element analysis. It is found that the demagnetizing factor may depend strongly upon the high-spin fraction of the film, and the specifics of the dependence are dictated by the microscopic morphology of the photomagnetic domains. This picture allows for facile interpretation of existing data on photomagnetic films, and can even explain an observed photoinduced decrease in low-field magnetization concurrent with increase in high-spin fraction. As a whole, these results reiterate the need to consider demagnetizing effects in photomagnetic films.     

New materials research for high spin polarized current

The author reports here a thorough investigation of structural and magnetic properties of Co₂FeAl_0.5Si_0.5 Heusler alloy films, and the tunnel magnetoresistance effect for junctions with Co₂FeAl_0.5Si_0.5 electrodes, spin injection into GaAs semiconductor from Co₂FeAl_0.5Si_0.5, and spin filtering phenomena for junctions with CoFe₂O₄ ferrite barrier. It was observed that tunnel magnetoresistance ratio up to 832%(386%) at 9 K (room temperature), which corresponds to the tunnel spin polarization of 0.90 (0.81) for the junctions using Co₂FeAl_0.5Si_0.5 Heusler electrodes by optimizing the fabrication condition. It was also found that the tunnel magnetoresistance ratio are almost the same between the junctions with Co₂FeAl_0.5Si_0.5 Heusler electrodes on Cr buffered (1 0 0) and (1 1 0) MgO substrates, which indicates that tunnel spin polarization of Co₂FeAl_0.5Si_0.5 for these two direction are almost the same. The next part of this paper is a spin filtering effect using a Co ferrite. The spin filtering effect was observed through a thin Co-ferrite barrier. The inverse type tunnel magnetoresistance ratio of −124% measured at 10 K was obtained. The inverse type magnetoresistance suggests the negative spin polarization of Co-ferrite barrier. The magnetoresistance ratio of −124% corresponds to the spin polarization of −0.77 by the Co-ferrite barrier. The last part is devoted to the spin injection from Co₂FeAl_0.5Si_0.5 into GaAs. The spin injection signal was clearly obtained by three terminal Hanle measurement. The spin relaxation time was estimated to be 380 ps measured at 5 K.     

ZnS:Tb薄膜电致发光的量子效率及过热电子分布

采用高频溅射的方法制备了高亮度的ZnS:Tb薄膜电致发光器件.测量了发射强度比I(5D3-7F6)/I(5D4-7F4)随激发电压的变化关系、弛豫时间及发光的量子效率,计算了碰撞截面,分析ZnS:Tb的过热电子的分布,并与ZnS:Mn进行了比较.指出了ZnS:Tb效率与ZnS:Mn效率差异的可能原因.     

MOCVD技术制备的ZnS:Mn电致发光薄膜结晶性及Mn2+分布

本文报导了用MOCVD技术制备的ZnS:Mn电致发光薄膜为立方晶相,结晶取向性好,颗粒大。从高倍率的扫描电镜拍摄的照片观察到薄膜的表面平滑。SIMS测量表明Mn2+在ZnS薄膜纵向分布均匀,但在两侧有起伏,可能的原因是在生长的初终阶段流量的突变使化合物的化学计量比偏离而产生位错,引起原子的局部堆积,并且由于初终阶段ZnS:Mn生长的衬底不同使原子堆积层厚度不同。     

高频溅射生长ZnS:Tb,F薄膜的结构与发光

本文采用X射线衍射和阴极射线发光技术对溅射法生长的ZnS:Tb,F薄膜的发光光谱和薄膜的微观结构进行了研究,得出了激晶薄膜的晶粒尺寸与发光强度的关系.讨论了稀土离子的价态对掺杂稀土微晶薄膜的发光性质与晶粒尺寸的关系的影响.     

短波长相变光盘记录介质Ge2Sb2Te5薄膜的制备及静态性能研究

研究了６３２．８ｎｍ波长下适用的相变光盘介质Ｇｅ２Ｓｂ２Ｔｅ５薄膜的制备方法和静态光存诸记录特性，发现该薄膜可在１００ｎｓ条件下实现直接重写，在优化膜层结构后，写擦循环次数高达１０＾６，反射率对比度在１５％以上。