高频ECR离子源的最新进展

As they are first optimized for their ion losses,ECRISs are always under a fundamental compromise: having high losses and strong confinement at the same time.To help ECR ion source developers in the design or improvement of existing machines,general comments are presented in a review article being soon published. In this 160 pages contribution,fundamental aspects of ECRISs are presented,with a discussion of electron temperature and confinement and ion confinement.Then,as microwaves play a key role in these machines, a chapter presents major guidelines for microwave launching and coupling to ECR plasma.Moreover,once ECR plasma is created,understanding this plasma is important in ion sourcery;and a section is dedicated to plasma diagnostics with an emphasis on the determination of electron and ion density and temperature by vacuum ultraviolet(VUV)spectroscopy.Another chapter deals with the role of magnetic confinement and presents updated scaling laws.Next chapter presents different types of ECRISs designed according to the main parameters previously described.Finally,some industrial applications of ECRISs and ECR plasmas in general are presented like ion implantation and photon lithography.Some hints taken from this review article are presented in the following article.     

On the origin of solar wind. Alfvén waves induced jump of coronal temperature

Absorption of Alfvén waves is considered to be the main mechanism of heating in the solar corona. It is concluded that the sharp increase of the plasma temperature by two orders of magnitude is related to a self-induced opacity with respect to Alfvén waves. The maximal frequency for propagation of Alfvén waves is determined by the strongly temperature dependent kinematic viscosity. In such a way the temperature jump is due to absorption of high frequency Alfvén waves in a narrow layer above the solar surface. It is calculated the power per unit area dissipated in this layer due to damping of Alfvén waves that blows up the plasma and gives birth to the solar wind. A model short wave-length (WKB) evaluation takes into account the 1/f² frequency dependence of the transversal magnetic field and velocity spectral densities. Such spectral densities agree with old magnetometric data taken by Voyager 1 and recent theoretical calculations in the framework of Langevin-Burgers MHD. The presented theory predicts existence of intensive high frequency MHD Alfvén waves in the cold layer beneath the corona. It is briefly discussed how this statement can be checked experimentally. It is demonstrated that the magnitude of the Alfvén waves generating random noise and the solar wind velocity can be expressed only in terms of satellite experimental data. It is advocated that investigation of properties of the solar surface as a random driver by optical methods is an important task for future solar physics.     

Organic contaminants removal by oxygen ECR plasma

Recently electron cyclotron resonance (ECR) plasma have been explored for wafer cleaning applications, since it is known to do less damage to silicon surface than conventional plasma. Organic contaminants removal efficiency and plasma radiation damage of the ECR plasma cleaning have been investigated. In oxygen ECR plasma cleaning, the plasma exposure time needed to remove the organic contaminants on the silicon surface down to the detection limit is 40 s, but the one to reach the lowest surface roughness is 10 s. The leakage current level of the MOS capacitor made using the Si substrate exposed to oxygen ECR plasma for 40 s is 8 × 10⁻⁹ A. The optimum exposure time determined by considering the contaminants removal efficiency and the plasma radiation damage (or the leakage current level) is 40 s. Organic contaminants seem to be removed through both sputter-off mechanism by oxygen ion bombardment and evaporation mechanism by chemical reactions with excited oxygen atoms.     

磁镜装置中ECR等离子体硬X射线强度观测

本文描述用硬X射线针孔成象法测量简单磁镜装置中ECR等离子体辐射特性的方法及其结果。这种非破坏性的成象法,直接显示了热电子等离子体的空间分布,一次放电可成一帧清晰的象,且由此可得出二维的等发射强度线。大量结果表明电子环是非轴对称的,并非为一个整环,而是在微波注入口的对面有一个缺口。当微波功率改变时,环也在改变。     

ECR源的新工作模式

叙述了兰州重离子加速器ＥＣＲ２源所使用的新工作模式的条件、特点及高电荷态离子束的输出性能，给出了对该模式特点的初步分析．     

6.4 GHz ECR ion source at VECC

The 6.4 GHz ECR ion source that was indigenously developed a few years ago has been operating continuously for injecting oxygen and neon beams to the cyclotron since 1997. VEC-ECR is a single stage high magnetic field ion source provided with a negatively biased electron repeller placed on the axis, near the injection mirror point. The supply of cold electrons and use of low mass mixing gas improve the stability of ECR plasma. Very recently, the effect of aluminum oxide coating on the copper plasma chamber wall has been studied. The plasma chamber wall was coated with aluminum by vacuum evaporation method and then exposed to oxygen gas to form aluminum oxide. It was noticed that the process substantially shifts the charge state distribution to the higher charge state with an enhancement of ion current by an order of magnitude. With the aluminized plasma chamber, the VEC-ECR can now produce 12 μA of O⁷⁺, 6.5 μA of Ar¹²⁺, 1.5 μA of Kr²⁰⁺ and 1.0 μA of Xe³¹⁺.     

ECR离子源六极永磁体的设计研究

分别从材料、结构、尺寸等方面全面地研究了Halbach结构六极永磁铁的设计方法.针对个别磁块可能存在的退磁问题给出了相应的解决方案.通过优化结构,使六极磁铁在离子源等离子体弧腔内壁产生的磁场达到最大.用POISSON,PERMAG,TOSCA等多个磁场模拟程序计算模拟了六极磁场的大小与分布,并给出了一些相应的曲线     

2.45 GHz ECR离子源的微波阻抗匹配

ECR离子源的等离子体阻抗对其微波传输与阻抗匹配设计至关重要。在中国科学院近代物理研究所现有的2.45 GHz ECR 质子源上,对等离子体阻抗进行了测量。首先用水吸收负载代替等离子体负载测量得到了所用微波窗阻抗,然后根据质子源测量数据,推算得到了等离子体阻抗。实验结果表明,脊波导输出端阻抗与后续负载不完全匹配,等离子体阻抗随微波功率变化呈非线性。这些结果为ECR离子源过渡匹配和微波窗的设计提供了参考依据。Plasma impedance of an ECR ion source is important for microwave transmission and impedance matching design. Plasma impedance was measured indirectly with the 2.45 GHz ECR proton source at the Institute of Modern Physics, Chinese Academy of Sciences. In the test, we got microwave window mpedance by using water absorption load instead of plasma load, and the source plasma impedance was derived from the test data with the 2.45 GHz ECR proton source and microwave window impedance. The experimental results show that ridge waveguide output impedance and the subsequent load does not exactly match, plasma impedance variation is nonlinear with microwave power. The achievedresult is useful in the design of ridged waveguide and microwave window.     

ECR氧离子源及整体分离环RFQ加速器低能输运系统的研制

根据研制分离作用RFQ和升级改造1MeV ISR RFQ的需要,设计了一台ECR O⁺离子源及低能输运(LEBT)系统. 低能输运系统使用2个静电透镜聚焦束流, 在引出电压22kV时, LEBT末端得到6mA以上总脉冲束流、束流归一化均方根发射度为0.12πmm﹒mrad. 束腰可前后移动160mm.     

一台14.5GHz新型高磁场高电荷态ECR离子源

自行研制成功一台14.5GHz新型高磁场高电荷态电子回旋共振(ECR)离子源.描述了该离子源结构特点、参数优化及其磁场分布,并给出了调试测量结果.该离子源轴向磁镜场在轴线上的最高磁场可达1.5T,六极永磁体在弧腔内表面磁场可达1.0T.经初步调试,可得到0⁷+140eμA,Ar¹¹+185eμA,Xe²⁶⁺50eμA.所得结果与1998年国际上最好的ECR离子源进行了比较.