Influence of internal radiation on the heat transfer during growth of YAG single crystals by the Czochralski method

Heat and mass transfer taking place during growth of Y₃Al₅O₁₂ (YAG) crystals by the Czochralski method, including inner radiation, is analyzed numerically using a Finite Element Method. For inner radiative heat transfer through the crystal the band approximation model and real transmission characteristics, measured from obtained crystals, are used. The results reveal significant differences in temperature and melt flow for YAG crystals doped with different dopands influencing the optical properties of the crystals. When radiative heat transport through the crystal is taken into account the melt‐crystal interface shape is different from that when the radiative transport is not included. Its deflection remains constant over a wide range of crystal rotation rates until it finally rapidly changes in a narrow range of rotation rates. (© 2003 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Using a Phase‐field‐like Approach for the Calculation of Melt Flow and Interface Shape during Czochralski Growth

A phase‐field‐like approach is introduced into the commercial general‐purpose program FIDAP^TM to calculate the melt‐crystal interface for a quasi‐stationary approach of the Czochralski growth. Temperature and flow field are solved using the segregated solver of the FIDAP^TM software.     

A finite element method for analysis of fluid flow,heat transfer and free interfaces in Czochralski crystal growth

A finite element algorithm is presented for simultaneous calculation of the steady state, axisymmetric flows and the crystal, melt/crystal and melt/ambient interface shapes in the Czochralski technique for crystal growth from the melt. The analysis is based on mixed Lagrangian finite element approximations to the velocity, temperature and pressure fields and isoparametric approximations to the interface shape. Galerkin's method is used to reduce the problem to a non-linear algebraic set, which is solved by Newton's method. Sample solutions are reported for the thermophysical properties appropriate for silicon, a low-Prandtl-number semiconductor, and for GGG, a high–Prandtl–number oxide material. The algorithm is capable of computing solutions for both materials at realistic values of the Grashof number, and the calculations are convergent with mesh refinement. Flow transitions and interface shapes are calculated as a function of increasing flow intensity and compared for the two material systems. The flow pattern near the melt/gas/crystal tri-junction has the asymptotic form predicted by an inertialess analysis assuming the meniscus and solidification interfaces are fixed.     

Fast and slow lifetime degradation in boron‐doped Czochralski silicon described by a single defect

A demonstration that boron–oxygen related degradation in boron‐doped Czochralski silicon could be caused by a single defect with two trap energy levels is presented. In this work, the same two‐level defect can describe the fast and slow lifetime decay with a capture cross‐section ratio of electrons and holes for the donor level of σ_n/σ_p = 19 ± 4. A model is proposed for the multi‐stage degradation involving a single defect, in which the product of the slow reaction is a reactant in the fast reaction. After thermal processing, a population of interstitial oxygen (O_i) exists in a certain state (the precursor state) that can rapidly form defects (fast degradation) and another population of O_i exists in a state that is required to undergo a slow transformation into the precursor state before defect formation can proceed (slow degradation). Kinetic modelling is able to adequately reproduce the multi‐stage degradation for experimental data. Dark annealing is also shown to impact the extent of ‘fast’ degradation. By decreasing the dark annealing time on pre‐degraded wafers, a more severe ‘fast’ degradation of the samples can be enabled during subsequent illumination, consistent with this theory. The paper then discusses possible candidates for the chemical species involved. (© 2016 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Influence of Ba addition on the dielectric and optic properties of (1 – x) Na0.5Bi0.5TiO3–xBaTiO3 (x = 0, 0.025, 0.0325 and 0.05) single crystals

High-quality, large-size lead-free (1 – x)Na_0.5Bi_0.5TiO₃–xBaTiO₃ ((1 – x)NBT–xBT) single crystals (x = 0, 0.025, 0.0325 and 0.05) were grown using the Czochralski method. Dielectric and transmitted light intensity properties were measured for these crystals. The broad anomalies exhibited in the temperature dependence of the transmitted light corresponded to structural and dielectric anomalies and were related to the temperature dependence of polar regions and the appearance of a long-range ferroelectric state. We explain our results based on local electromechanical fields, by inhomogeneity of the ion distribution and the mismatch in ion size. We suggested that the NBT–BT system can be a promising lead-free piezoelectric material for ultrasonic delay-line applications, broadband transducers and sensors.     

Nd^3＋：Gd3Ga5O12晶体的室温吸收光谱和荧光光谱

用提拉法生长了掺钕的钆镓石榴石 (Nd3 + :GGG)激光晶体。研究了室温下的吸收光谱和荧光光谱性质 ,分析了Nd3 + :GGG晶体4F3 / 2 →4I11/ 2 能级跃迁与 1.0 6 μm附近的荧光谱线之间的关系。吸收系数、发射系数、荧光寿命分别是 4 .32× 10 -2 0 cm-2 ,2 .3× 10 -19cm-2 ,2 4 0 μs,比较了Nd3 + ∶GGG和Nd3 + ∶YAG的物理参数 ,实验表明 :Nd3 + ∶GGG较Nd3 + ∶YAG有一系列的优点。     

Segregation of Ga during growth of Si single crystal

Segregation phenomenon of Ga in Czochralski (CZ)–Si crystal growth has been investigated. The effective segregation coefficient, k_eff, of Ga was obtained for different growth rates by assuming the simple relationship between the concentration of Ga in Si crystal and the bulk Ga concentration in melt. Applying BPS theory to effective segregation coefficients which is valid for the melt-solidified fraction up to 0.38, an equilibrium segregation coefficient of Ga was obtained, k₀=0.0079.     

提拉法生长镓酸锂晶体及缺陷研究

研究了提拉法生长的镓酸锂单晶的生长习性和结晶质量.晶体表面呈乳白色且表面粗糙.通过光学显微镜、四晶X射线衍射、透射光谱和电感耦合等离子体发射光谱对样品进行了表征,结果表明,在(001)面的抛光样品上存在三种缺陷: [110]和[-110]方向的十字线、[010]方向排列的气泡包裹物以及平行于(010)面的界面,界面的产生起因于(010)晶面的滑移;晶体的结晶质量从顶部到底部逐渐下降,这是由于在生长过程中氧化锂的挥发导致熔体成分偏离化学计量比造成的.     

Co2+:BeAl2O4晶体的提拉法生长及光谱特性

应用提拉法,采用合适的化学组分配比和化料过程、以及选用适宜的固液界面温度梯度与生长速度等优化工艺条件,成功地生长出了初始Co2+离子掺杂浓度为0.15mol;、尺寸φ48×85mm2的优质Co2+:BeAl2O4晶体.测定了晶体的吸收光谱,观测到496与 640nm二个主要吸收带,它们分别归属于八面体配位中Co2+的T1(4F)→4T1(4P)跃迁与四面体配位中Co2+的A2(4F)→4T1(4P)跃迁.从晶体的吸收光谱与呈现的粉红色颜色特征可推断大多数的Co2+离子取代BeAl2O4晶体中的Al3+,形成Co2+离子的八面体格位.研究了不同光波长激发下,晶体在可见光波段的荧光特征,观测到678nm波段的荧光发射,这归属于四面体格位中Co2+的电子从4T1(4P)到4A2(4F) 能级的跃迁.