Growth of single crystals of copper and their thermal profile estimation

Copper crystals have been grown by Czochralski technique in a 6-bar argon gas environment. X-ray analysis shows that these are single crystals and are strain-free. A slight pressure environment that is truly hydrostatic seems to improve the quality of the crystals. Thermal profile estimation results show that the values of temperature which decrease upto the neck region are same in magnitude as those measured during the experiments and that necking improves the thermal profile and, consequently, the crystal quality. No facet formation has been observed in these crystals.     

Copper diffusion in Ti-Si-N layers formed by inductively coupled plasma implantation

Ternary Ti-Si-N refractory barrier films of 15 nm thick was prepared by low frequency, high density, inductively coupled plasma implantation of N into Ti_xSi_y substrate. This leads to the formation of Ti-N and Si-N compounds in the ternary film. Diffusion of copper in the barrier layer after annealing treatment at various temperatures was investigated using time-of-flight secondary ion mass spectrometer (ToF-SIMS) depth profiling, X-ray diffractometer (XRD), field emission scanning electron microscopy (FESEM), energy dispersive X-ray (EDX) and sheet resistance measurement. The current study found that barrier failure did not occur until 650 °C annealing for 30 min. The failure occurs by the diffusion of copper into the Ti-Si-N film to form Cu-Ti and Cu-N compounds. FESEM surface morphology and EDX show that copper compounds were formed on the ridge areas of the Ti-Si-N film. The sheet resistance verifies the diffusion of Cu into the Ti-Si-N film; there is a sudden drop in the resistance with Cu compound formation. This finding provides a simple and effective method of monitoring Cu diffusion in TiN-based diffusion barriers.     

槲皮素包裹修饰硅包银纳米颗粒作为荧光传感器对铜离子的识别作用

制备了一种基于天然产物槲皮素接枝硅包银核壳结构的纳米荧光传感器(Ag@SiO₂@Qc),对铜离子具有好的选择性和灵敏性。Ag@SiO₂@Qc与Cu2+离子结合后,荧光发射强度发生猝灭,并且可通过荧光滴定光谱得到了荧光滴定曲线：y = -32.864x+587.59(R2=0.998),其线性范围分别为：3×10-7~4.8×10-6 mol·L-1,最低检测限为1.0×10-7 mol·L-1。并且将Ag@SiO₂@Qc应用于环境中水样的检测结果的准确度好,精密度高,而且更加环保、方便、快捷,具有很大发展潜力与应用价值。     

吸光度比值-导数光谱法同时测定铜(Ⅱ)和铬(Ⅲ)的研究

提出了运用吸光度比值-导数光谱法同时测定Cr(Ⅲ)与Cu(Ⅱ)含量的新方法。在pH 5.7的HAc-NaAc的缓冲溶液中,Cr3+,Cu2+与铬天青S(CAS)和溴化十六烷基三甲胺(CTMAB)可分别形成蓝色三元络合物。其摩尔吸光系数分别为2.52×105 L·mol-1·cm-1和1.01×105 L·mol-1·cm-1。Cu2+和Cr3+的浓度分别在0.08～1.2 μg·mL-1和0.05～0.52 μg·mL-1范围内符合比尔定律,其检测限分别为0.014和0.013 μg·mL-1。此方法应用于环境水中Cr(Ⅲ),Cu(Ⅱ)的同时测定,取得了满意的结果。     

Adsorption dynamics of O2 on Cu(1 0 0)

We have studied the adsorption of O₂ on the Cu(1 0 0) surface using both static potential energy surface (PES) calculations and ab initio molecular dynamics. The dynamical calculations complement the PES results, revealing steering effects which could not be predicted based on the static calculations only. We study the effect of oxidation and Ag doping on O₂ adsorption dynamics. The results are discussed in the light of recent molecular beam experiments.     

Investigation of the dissociative adsorption for cyclopropane on the copper surface by density functional theory and quantum chemical molecular dynamics method

The dissociative adsorption of cyclopropane on the copper surface was studied using quantum chemical molecular dynamics method with “Colors-Excite” code and density functional theory by Amsterdam Density Functional program (ADF2000). The excited state of cyclopropane was used as adsorbate to simulate the dissociated adsorption under an irradiation energy of ca. 10 eV. One of the C-C bonds in cyclopropane was broken and the two new bonds between cyclopropane and copper surface were formed. The electrons transferred from the copper atoms to cyclopropane with a value of about 0.2e. The shorter distances between the carbons and surface copper atoms showed the existence of strong interaction. Consistently, the results indicated metallacyclopentane was the most possible intermediate species in dissociative adsorption by ADF2000 and “Colors-Excite” method.     

Nanoporous silicon doped by Cu for gas-sensing applications

The effect of hydrogen sulphide on the current–voltage characteristics of metal–insulator–semiconductor (MIS) structures based on nanoporous silicon (Si_nanopor) under copper doping has been investigated. Scanning electron (SEM), atomic force (AFM) and optic microscopes and/or secondary ion mass spectroscopy (SIMS) were used to obtain detailed characterisation of copper cluster distribution present at the surface and pores, respectively. SIMS spectra reveal that finite gradient in copper distribution along the pores and oxidation of nanoporous silicon simultaneously can be obtained successfully under electroless deposition process. It was also shown that the doping of nanoporous silicon by Cu leads to enhanced hydrogen sulphide sensitivity of MIS structures even without catalytic active top electrodes (for example, Pd) at room temperature. Furthermore, for different types of familiar MIS structures based on nanoporous silicon, e.g., MIS structures doped or undoped by copper and by using Pd metal electrodes, the hydrogen sulphide detection at room temperature mainly depends on the modification in the height of barrier of hetero- (Al–Cu–Si_nanopor–c-Si) or Schottky-like (Pd–Cu–Si_nanopor–c-Si) structures resulting the chemical interaction of molecular H₂S gas with copper clusters at the surface and in the pores. It is demonstrated that MIS structures based on the nanoporous silicon with copper doping are more sensitive to H₂S action at room temperature. In addition, the physical mechanism explaining the observed phenomena is also discussed.     

氢化物发生-原子荧光光谱法测定铜精矿中的砷、锑和铋

建立了氢化物发生-原子荧光光谱法同时测定铜精矿中砷、锑、铋的方法,采用了主量元素匹配法来消除基体干扰,优化了反应体系的酸度、还原剂浓度等条件进行了优化。砷、锑、铋的浓度在1—200μg·L~(-1)范围内与荧光强度呈线性关系。方法回收率为92%—101%,相对标准偏差为2.7%—5.5%。     

8-羟基喹啉快速共沉淀分离富集原子吸收光谱法测定啤酒中的Cu和Pb

研究了用8-羟基喹啉-Mg(Ⅱ)共沉淀体系,以Mn(Ⅱ)为内标,快速共沉淀分离富集啤酒中的铜和铅,并用火焰原子吸收光谱(FAAS)测定的方法。共沉淀受pH值、载体镁和内标锰用量的影响。结果显示在pH为9的条件下,能够定量共沉淀试样中的铜和铅。当试液为100 mL时,方法的检出限分别为铜6.28×10-3 μg·mL-1,Pb 2.26×10-2 μg·mL-1回收率为97.6%～103.0%,基本消除了基体干扰,取得了较为满意的结果。该方法无需收集全部沉淀,与传统的共沉淀方法比较,克服了收集沉淀费时的缺点。方法快速、简便、重现性好。     

Intensified removal of copper from waste water using activated watermelon based biosorbent in the presence of ultrasound

Copper is one of the most toxic heavy metals having significant effects on the living organisms and hence effective removal of copper from waste water is crucial. The current work investigates the application of activated watermelon shell based biosorbent for the removal of copper from aqueous solution. The effect of activation using calcium hydroxide and citric acid as well as the effect of operating parameters like contact time, adsorbent dosage, temperature, pH, initial concentration and ultrasonic power on the extent of removal has been investigated. Experiments performed in the presence of ultrasound to investigate the degree of intensification as compared to the conventional agitation based treatment revealed that the adsorption rate significantly increases in the presence of ultrasound and also the time required for reaching the equilibrium reduces from 60 min in conventional approach to only 20 min in the presence of ultrasound. The extent of adsorption of Cu(II) on adsorbents was found to increase with an increase in the operating pH till an optimum value of 5. The extent of adsorption also increased with a decrease in the initial concentration and particle size as well as with an increase in ultrasonic power till an optimum. Kinetics and isotherm study revealed that all the experimental data was found to best fit the pseudo second order kinetics and Langmuir adsorption isotherm model respectively. Maximum adsorption capacity was found to be 31.25 mg/g for watermelon treated with calcium hydroxide and 27.027 mg/g for watermelon treated with citric acid. Overall present study established that activated watermelon is an environmentally friendly, low cost and highly efficient biosorbent that can be successfully applied for the removal of copper from aqueous solution with intensification benefits based on the ultrasound assisted approach.