低电流密度下恒电流法制备的聚苯胺修饰电极

研究了低电流密度下恒电流法制备的聚苯（ＰＡ）修饰电极的性质及其影响因素，探讨了低电流密度聚合的ＰＡ膜的优点。发现此种条件下聚合的ＰＡ膜具有较好的电荷传输能力，它不仅对Ｂｒ＾－，Ｔｌ＾＋／Ｔｌ等电对的氧化还原反应有更好的电催化活性，而且对Ｈ＾＋的Ｎｅｒｎａｓｔ响应也更接近理论值。     

Dicopper(I) oxalate complexes as molecular precursors for the deposition of copper compounds

The synthesis, characterization, and thermal decomposition behavior of dicopper(I) oxalato complexes L₄Cu₂(C₂O₄) (L = CNtBu (2a), CNCMe₂CH₂tBu (2b), CNC₆H₃Me₂-2,6 (2c)) is reported. 2c can be prepared in a straightforward manner by the reaction of stoichiometric amounts of Cu₂O and oxalic acid with four equivalents of CNC₆H₃Me₂-2,6, while those complexes with aliphatic isocyanides are better prepared from a copper(I) oxalato complex with alkine capping ligands (Me₃SiCCSiMe₃)₂Cu₂(C₂O₄) (1) via ligand exchange. Crystallographic and spectroscopic evidence for 2a-c confirms the anticipated dinuclear structure with the oxalate in a μ-1,2,3,4 bridging mode and an essentially σ-character of the terminal isocyanides. In solid form the complexes are stable at room temperature and can be handled in air for some time. Their decomposition was studied by thermal gravimetric analysis coupled with mass spectrometry, and the degradation pathway was shown to depend on the type of isocyanide capping ligand. Decomposition of 2a,b takes place between 150 and 200 °C to give CuCN in a clean process that involves isobutene elimination from the terminal ligands, with elimination of (CN)₂ and conversion to elemental copper at higher temperatures. Heating of 2c leads to CuO (and then to Cu₂O) via release of the intact isocyanide, CO₂, and CO in a well-behaved thermal process around 200-280 °C.     

石墨炉原子吸收光谱法直接测定血样中硒

用石墨炉原子吸收光谱法，以硝酸铜和硝酸铵为基体改进剂，塞曼效应扣背景，采用标准加入法可直接测定血样中硒，回收率为95％～105％，相对标准偏差为5．8％，检出限为96pg，测定结果准确可靠。     

Underpotential deposition of tin(II) on a gold disc electrode and determination of tin in a tin plate sample

This work describes a study of the underpotential deposition (UPD) of Sn²⁺ on a polycrystalline gold disc electrode using cyclic voltammetry (CV) and chronocoulometry (CC). Sn²⁺ ions showed well-defined peaks from UPD and UPD stripping (UPD-S) in 1 mol/L HCl solutions, while bulk deposition (BD) and BD stripping (BD-S) of the ions were also observed. The measured UPD shifts, E_UPD, between the UPD-S and the BD-S peaks were more than 200 mV. The UPD charge and the surface coverage of tin were measured by CC. A new method for determining Sn²⁺ was therefore developed, based on the excellent electrochemical properties of the Au/Sn UPD system. A plot of the UPD-DPASV (differential pulse anodic stripping voltammetry) signal versus the Sn(II) concentration was obtained for [Sn(II)] of 1.98×10^–7 to 3.64×10^–5 M. The method developed here has been applied to determine the tin in a tin plate sample.     

Voltammetric Detection of the DNA Interaction with Toluidine Blue

Binding reactions of toluidine blue (TB) with herring fish DNA in pH 6.0 Britton–Robinson (B–R) buffer solution have been investigated by cyclic voltammetry and linear‐sweep voltammetry at a glassy carbon electrode. TB has a couple of well‐defined redox peaks. The addition of DNA into the TB solution resulted in the decrease of the redox‐peak currents and the shift negatively of the anodic peak potential. The values of the electrochemical parameters such as the electron number of the electrochemical reaction, the electron transfer coefficient and the electrochemical reaction standard rate constant in the absence and presence of DNA, as well as the values of binding constant and binding ratio of DNA with TB were obtained. Almost unchanged values of the electrochemical parameters in the absence and presence of DNA show that nonelectroactive complexes were formed when TB interacted with DNA. DNA concentration can be determined by the decrease of the peak current of TB. The binding mode of TB with DNA was discussed.     

Chemical analysis of acidic silicon etch solutions: I. Titrimetric determination of HNO3, HF, and H2SiF6

The chemical etching of silicon using HF-HNO₃ mixtures is a widely used process in the processing of silicon wafers for microelectronic or photovoltaic applications. The control of the etch bath composition is the necessary condition for an effective bath utilization, for the replenishment of the consumed acids, and to maintain a certain etch rate. The present paper describes two methods for the total analysis of the individual etch bath constituents HF, HNO₃, and H₂SiF₆. Both methods start with an aqueous acid-base titration determining the total acid concentration and the concentration of H₂SiF₆. The first method is an acid-base titration using a 0.1 mol L⁻¹ methanolic solution of cyclohexylamine (CHA) as non-aqueous titrant to determine the content of nitric acid. Then, the amount of hydrofluoric acid is calculated from the difference between the total acid and nitric acid content. The second method is based on the determination of the total fluoride concentration using a fluoride ion-selective electrode (F-ISE). The content of hydrofluoric acid is obtained from the difference between the total fluoride content and the amount of fluoride bound as H₂SiF₆. The amount of nitric acid results finally calculated as difference to the total acid content.     

铜表面腐蚀的激光扫描微区光电压图象的研究

铜表面腐蚀的激光扫描微区光电压图象的研究杨迈之，张雯，蔡生民，任聚杰（北京大学化学系，北京，１０００７１）（河北医学院化学系，石家庄）潘传智，杨勇（浙江工业大学化工系，杭州）（厦门大学化学系，厦门）关键词铜，缓蚀剂，微区光电压图铜的腐蚀与防腐早已引起...     

Adsorption of poly(ethylene glycol)s on mercury/aqueous solution interface 1. Kinetics of PEG 8000 adsorption

In order to study the influence of the adsorption of fulvic compounds on voltammetric signals and to understand better the adsorption of these compounds on hydrophobic natural water interfaces, adsorption studies of macromolecules such as poly(ethylene glycol) (HO(CH₂CH₂O)_n) with molecular weight of 8000 were done on the mercury/water interface by a.c. voltammetry at the potential of zero charge. The maximum surface concentration, adsorption equilibrium constant and adsorption rate constant have been determined from the global adsorption mechanism, controlled by two determining steps: diffusion and kinetics of adsorption at the interface.     

过氧化物模拟酶在介体型生物传感器方面应用初探

meso-四(4-磺基苯)卟啉锰(Ⅲ)作为过氧化物模拟酶可催化H_2O_2与K_4Fe(CN)_6反应。电流响应与H_2O_2浓度在3.0×10~(-4)～1.0×10~(-3)mol/L范围内呈线性关系。重现性和回收率良好。抗坏血酸和DL-半胱氨酸干扰严重。