Ultra-low-loss inverted taper coupler for silicon-on-insulator ridge waveguide

An ultra-low-loss coupler for interfacing a silicon-on-insulator ridge waveguide and a single-mode fiber in both polarizations is presented. The inverted taper coupler, embedded in a polymer waveguide, is optimized for both the transverse-magnetic and transverse-electric modes through tapering the width of the silicon-on-insulator waveguide from 450 nm down to less than 15 nm applying a thermal oxidation process. Two inverted taper couplers are integrated with a 3-mm long silicon-on-insulator ridge waveguide in the fabricated sample. The measured coupling losses of the inverted taper coupler for transverse-magnetic and transverse-electric modes are ∼ 0.36 dB and ∼ 0.66 dB per connection, respectively.     

All polymer asymmetric Mach-Zehnder interferometer waveguide sensor by imprinting bonding and laser polishing

We present an all polymer asymmetric Mach–Zehnder interferometer(AMZI) waveguide sensor based on imprinting bonding and laser polishing method. The fabrication methods are compatible with high accuracy waveguide sensing structure. The rectangle waveguide structure of this sensor has three sensing surfaces contacting the test media, and its sensing accuracy can be increased 5 times compared with that of one surface sensing structure. An AMZI device structure is designed. The single mode condition, the length of the sensing arm, and the length deviation between the sensing arm and the reference arm are optimized. The length deviation is optimized to be 19.8 μm in a refractive index range between1.470 and 1.545. We fabricate the AMZI waveguide by lithography and wet etching method. The imprinting bonding and laser polishing method is proposed and investigated. The insertion loss is between-80.36 dB and-10.63 dB. The average and linear sensitivity are 768.1 d B/RIU and 548.95 dB/RIU, respectively. And the average and linear detection resolution of the sensor are 1.30×10~(-6) RIU(RIU: refractive index unit) and 1.82×10~(-5) RIU, respectively. This sensor has a fast and cost-effective fabrication process which can be used in the cases of requiring portability and disposability.     

Bragg光纤包层制作误差对导模特性的影响

对Bragg光纤中包层制造误差对导模特性的影响进行了深入的分析和研究,给出了一般N层波导中模式场标量波动方程求解的传输矩阵方法,并将其应用在Bragg光纤模式场的分析当中。分别研究了Bragg包层存在折射率误差和厚度误差时对光纤基模模式场的有效折射率、模场半径和芯区功率占比的影响,并利用统计的方法分析了不同制作误差时导模特性的相对变化。折射率误差在1‰的水平时,基模有效折射率、模场半径和芯区功率占比的方差水平为1.55×10~(-4)、1.04×10~(-1)和1.79×10~(-2);厚度误差在2%的水平时模式场参量的方差水平分别为3.61×10~(-5)、1.84×10~(-2)和2.35×10~(-3)。     

用于校准能见度仪的标准散射体定标系统中光学系统的误差分析

为了实现用于校准能见度仪的标准散射体的快速高精度定标,依据标准散射体校准前向散射式能见度仪的校准原理,建立定标系统中光学系统的误差分析方法.分析标准散射体定标系统的工作原理,结合其光学系统、机械结构的加工及装调偏差,建立了标准散射体定标系统的光学系统模型并设计实验证明其正确性.分析影响定标系统中光学系统精度的主要误差,得到标准散射体定标系统中光学系统的误差传递模型.通过对畸变偏差、像面位置偏差、主点位置偏差、像面倾斜偏差和焦距偏差的分析,提出了一种系统综合误差分析的方法并建立了综合偏差模型,对每个偏差单独分析,得出畸变偏差、像面位置偏差、主点位置偏差、像面倾斜偏差和焦距偏差的偏差范围依次为0.024 mm,0.399 mm,0.02 mm,0.28 rad和0.392 mm.该研究为提高用于校准能见度仪的标准散射体定标系统的精度以及校准时误差的来源分析与补偿提供理论依据.     

Effect of deposition power and pressure on rate deposition and resistivity of titanium thin films grown by DC magnetron sputtering

ABSTRACT

Based on magnetron sputtering deposition technology, titanium (Ti) thin films are deposited on silicon (Si) substrate using different preparation conditions such as sputtering power and pressure. The influence of altering these conditions on deposition rate and microstructure is studied. The results show that sputtering power significantly affects the rate of deposition and the resistivity. The deposition rate of the Ti thin film increases when the resistivity decreases under sputtering powers of 150–225?W with a pressure of 0.8?Pa and Argon (Ar) flux of 80 sccm. As sputtering power was increased further (from 225 to 250?W), the deposition rate reduced and the resistivity augmented. Pressure also has influence on the deposition rate and resistivity – when pressure increases from 0.6 to 0.8?Pa, the deposition rate escalates while the resistivity reduces; when the pressure is raised from 0.8 to 1.0?Pa with Ar flux of 100 sccm, the deposition rate decreases and resistivity increases. The surface chemical compositions and the structures of the Ti film were studied by using X-ray photoelectron spectroscopy (XPS) and X-ray diffractometer (XRD). Observing the cross-section of the thin-film samples produced by scanning electron microscope (SEM) reveals the influence of the preparation conditions used on the microstructure and confirms the influence of sputtering power and pressure on the resistivity.     

有机薄膜电致发光器件工艺检测的一种简便方法——覆膜加热观测法

提出了一种简便易行、并与有机薄膜电致发光器件制备工艺完全兼容的工艺检测方法－－覆膜加热观测法。这种方法是在器件的制备工艺过程中,同时在铟锡氧化物（ITO）电极的各层有机薄膜上覆盖一层不透气的薄膜（如金属Al膜等）,接着进行快速加热,最后对器件表面进行形貌观测。采用这种方法,观察了器件表面气泡的形成过程,观察了加热温度、ITO表面处理以及有机物纯度对敢泡形成的影响。实验表明,覆膜加热观测法能有效地对工艺进行对比检测,从而达到改进工艺、提高器件质量的目的。     

Fabrication of the high power input coupler for BEPCⅡ superconducting cavities

The BEPCII storage ring adopts two 500 MHz superconducting cavities (SCC). Each one is equipped with a 500 MHz input power coupler. The coupler is to feed 150 kW power in continuous wave (CW) mode with both standing and traveling wave modes. Due to high power feeding and high frequency of the coupler, its fabrication is a big challenge. The fabrication started with two key components, the window and the antenna. Up to now, two sets including windows and antennas have beam made by IHEP. And a 270 kW RF power in CW has passed through the coupler during the high power test. The fabrication details are presented in this paper.     

Single‐crystalline gold microplates grown on substrates by solution‐phase synthesis

Chemically synthesized single‐crystalline gold microplates have been attracting increasing interest because of their potential as high‐quality gold films for nanotechnology. We present the growth of tens of nanometers thick and tens of micrometers large single‐crystalline gold plates directly on solid substrates by solution‐phase synthesis. Compared to microplates deposited on substrates from dispersion phase, substrate‐grown plates exhibit significantly higher quality by avoiding severe small‐particle contamination and aggregation. Substrate‐grown gold plates also open new perspectives to study the growth mechanism via step‐growth and observation cycles of a large number of individual plates. Growth models are proposed to interpret the evolution of thickness, area and shape of the plates. It is found that the plate surface remains smooth after regrowth, implying the applicability of regrowth for producing giant plates as well as unique single‐crystalline nano‐structures.     

Chinese Journal of Catalysis Graphical Contents

Chin. J. Catal., 2014, 35: 1911–1916 doi: 10.1016/S1872‐2067(14)60208‐4 Dehydrogenation of primary aliphatic alcohols to aldehydes over Cu‐Ni bimetallic catalysts Tianliang Lu, Zhongtian Du, Junxia Liu, Chen Chen, Jie Xu * Dalian Institute of Chemical Physics, Chinese Academy of Sciences; University of Chinese Academy of Sciences     

激光干涉光刻法制作100 nm掩模

介绍了一种利用激光干涉光刻技术得到特征图形,并通过离子束刻蚀将图形转移到铬层上,从而获得掩模的方法。针对掩模透光率以及对干涉图形对比度可能产生影响的两个参数分别进行了数值仿真,从而证明此方法的可行性和参数的优化选择。自搭干涉光刻实验系统,用257 nm的激光光源实现光刻,得到特征尺寸为100 nm的图形,再经过离子束刻蚀,最终得到周期200 nm、线宽100 nm的掩模。