电子与原子、离子碰撞过程的相对论效应

在玻恩近似下,建立了高能电子与原子、离于非弹性碰撞过程的相对论性理论计算方法,并以类Li等电子系列为例,阐明了电子与原子、离子非弹性碰撞过程的相对论效应.它包括:1.靶原子的相对论效应,它随原子序数的增加而增大.低z靶(如Li)的相对论效应可以忽略;对Au~(+76)靶的2_3—3p跃迁,广义振子强度相对论性计算值比相应的非相对论性值小27.1%.2.入射电子的相对论效应,它随入射电子能量的增加而增大.对高能入射电子,在特殊角度,要考虑广义振子强度横场项对微分截面的影响.在极端相对论情况下,如入射电子动能 关键词：     

NaNO3掺杂Y2O3材料的制备及电流变性质

利用NaCO3和Y（NO3）3做主要原料，合成了一系列用稀土氧化物（Y2O3）作为基础材料的新型电流变材料——NaNO3掺杂Y2O3材料。对于这些材料的介电性质、微观结构和电流变性能的研究结果表明，NaNO3的掺杂可以明显地提高Y2O3材料的电流变活性。材料在二甲基硅油中的悬浮液的剪切应力随NaNO3在Y2O3中的掺杂程度有明显变化，当Na／Y（物质的量的比）为0．6时材料的电流变性能最好，     

Effect of Hydrogen Implantation on SIMOX SOI Materials

Hydrogen ions were implanted into separation by implantation of oxygen (SIMOX) silicon-on-insulator (SOI) wafers near the oxygen-implantation-induced damage peak under different conditions of energy and dose. It was found that the implanted hydrogen ions not only accelerate the diffusion of oxygen atoms from the annealing ambience into the wafer but also cause an outward diffusion of oxygen atoms in the buried oxide (BOX) layer. Thus, greatly broadened buried oxygen-rich (BOR) layers were formed in our experiments, which are 18%-79% broader than the BOX layer of standard SIMOX SOI wafers under the same conditions of oxygen implantation. The mechanism was discussed. A potential low cost method to fabricate SIMOX SOI wafers is proposed.     

Yb:FAP和Yb:C3S2-FAP晶体光谱的温度特性和选择激发

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运输网络中最小饱和流的求解

运输网络中常常由于流量的不可控易发生堵塞现象.网络发生堵塞时的饱和流值达不到最大流值.最小饱和流是运输网络,尤其是紧急疏散网络设计中很重要的一个参数.通过建立网络的割集矩阵来确定网络的堵塞截面,基于此提出了求解最小饱和流的线性规划模型及算法.举例分析表明,利用该算法计算网络最小饱和流更加简便、更加实用.     

RO-heparin Inhibits L-Selectin-mediated Neutrophils Adhesion to Vascular Endothelium Under Flow Conditions

Introduction Migrationandrecruitmentofleukocytesfromblood toinflammatorylesionsitesaresequentiallyregulated byadhesionmoleculesandtheirreceptors[1].These lectinfamilyplaysamajorroleininitiatingattachement ofneutrophilstotheactivatedendothelium.P selectin,…