Y3Al5O12：Eu^3＋磷光体的溶胶—凝胶法合成及发光特性

以金属烷氧基化合物为原料．采用溶胶-凝胶法在1000℃下合成了Eu^3 掺杂的Y3Al5O12(YAG)磷光体。利用TG-DSC，XRD和发光光谱等对样品进行了表征。结果表明，YAG：Eu^3 的晶相形成温度为991℃。Eu^3 在非晶态和晶态YAG中的发射光谱有明显差异。研究了Eu^3 含量和烧结温度对Eu^3 的^5D0→^7F1和^5D0→^7F2发射峰强度的影响。随煅烧温度的升高和Eu^3 浓度的增加，Eu^3 发射峰强度增强。     

meso-四(2-羟基-5-磺酸苯基)卟啉的合成及其酸碱平衡的研究

本文对 meso-四(2-H-5-SP)P 的提纯方法进行了改进,同时以光度法研究了该试剂在水溶液中的酸碱平衡、测得其 pKa_1、pKa_2、pKa_3、pKa_4分别为2.99,4.21,8.68,10.28。     

甲基百里(香)酚蓝新负载树脂的特 性及应用

本文以金属指示剂甲基百里(香)酚蓝作为鳌合剂制得具有相应鳌合基团的负载树脂.研究了该树脂的某些分析特性及其在富集天然水中微量铜、钻、镍、锌中的应用.     

Fabrication and Characterization of Ni Thin Films Using Direct-Current Magnetron Sputtering

Ni films are deposited by using ultra high vacuum dc magnetron sputtering onto silicon substrates at room temperature, and the high-quality and high-density films are prepared. The parameters, such as thickness, density and surface roughness, are obtained by using small-angle x-ray diffraction (XRD) analyses with the Marquardt gradient-expansion algorithm. The deposition rate is calculated and the Ni single layer can be fabricated precisely. Based on the fitting results, we can find that the surface roughness of the Ni films is about 0.7nm, the densities of Ni films are around 97% and the deposition rate is 0.26nm/s. The roughness of the surface is also characterized by using an atomic force microscope (AFM). The changing trend of the surface roughness in the simulation of XRD is in good agreement with the AFM measurement.