(NH4)2MoS4在活性炭上浸渍过程的研究:Ⅱ.干燥机理及模型

（ＮＨ＿４）＿２ＭｏＳ＿４在活性炭上浸渍过程的研究Ⅱ．干燥机理及模型秦慧芳，张成芳，陆岗，俞丰，朱子彬（华东理工大学无机化工研究所，上海２００２３７）２３７）关键词硫代钼酸铵，活性炭，干燥，钼分布，干燥模型负载型催化剂的活性组分在载体上的分布，受浸渍...     

甲基百里(香)酚蓝新负载树脂的特 性及应用

本文以金属指示剂甲基百里(香)酚蓝作为鳌合剂制得具有相应鳌合基团的负载树脂.研究了该树脂的某些分析特性及其在富集天然水中微量铜、钻、镍、锌中的应用.     

Fabrication and Characterization of Ni Thin Films Using Direct-Current Magnetron Sputtering

Ni films are deposited by using ultra high vacuum dc magnetron sputtering onto silicon substrates at room temperature, and the high-quality and high-density films are prepared. The parameters, such as thickness, density and surface roughness, are obtained by using small-angle x-ray diffraction (XRD) analyses with the Marquardt gradient-expansion algorithm. The deposition rate is calculated and the Ni single layer can be fabricated precisely. Based on the fitting results, we can find that the surface roughness of the Ni films is about 0.7nm, the densities of Ni films are around 97% and the deposition rate is 0.26nm/s. The roughness of the surface is also characterized by using an atomic force microscope (AFM). The changing trend of the surface roughness in the simulation of XRD is in good agreement with the AFM measurement.     

等温平台石墨炉原子吸收光谱法测定高纯镍中痕量杂质锑

利用石墨炉原子吸收法，在等温平台条件下直接测定高纯镍中的痕量杂质锑，对石墨炉加热程序中的干燥时间、灰化温度及原子化温度进行了优化，同时考察了介质酸度的影响。试验表明，基体镍对锑的测定有显著的影响，为此进行了标准系列基体匹配。该法的特征质量为6．6pg；相对标准偏差为6．5％；加标回收率为100％-103％。