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71.
Effect of particle size of activated clay on the adsorption of paraquat from aqueous solution 总被引:4,自引:0,他引:4
This paper describes the effect of particle size on the process of paraquat adsorption from aqueous solution onto an activated clay surface at 25 degrees C and initial pH 11.0. Measurements of the pore properties of the clay adsorbents with three different particle sizes (0.053-0.074 mm, 0.037-0.053 mm, and <0.037 mm) were carried out. The rates and isotherms of adsorption have been also investigated by batch methods under the controlled conditions. From the experimental results obtained, the adsorption process can be well described with the pseudo-second order model and Freundlich model for adsorption kinetics and adsorption isotherm, respectively. In addition, the effect of the particle size of the clay adsorbent on the adsorption kinetics was found to be of considerable significance; namely, the rate constant (k) of paraquat adsorption by the clay adsorbent decreased with increasing particle size. It was concluded that the pore properties (i.e., surface area and total pore volume) and particle size of the clay adsorbent played a significant role in determining adsorption capacity and adsorption rate, respectively. 相似文献
72.
A novel chiral stationary phase (CSP) was prepared by immobilizing mono(6A-N-allylamino-6A-deoxy)-perphenylcarbamoylated beta-cyclodextrin onto the surface of silica gel via hydrosilylation. The chromatographic properties of this column were tested with a wide range of structurally diverse racemic compounds and drugs under reverse phases. Separation mechanisms involved are also discussed. 相似文献
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The effect of antimony concentration (C(Sb)/mass%) on the surface tension of molten silicon has been determined with the sessile drop method in the temperature range from 1693 to 1773 K and in the range of the oxygen partial pressure, Po(2), in an Ar atmosphere from 10(-23) to 10(-21) MPa. The results show that the surface tension of molten silicon decreases with increasing Sb concentration in the range of C(Sb)<0.9 mass%, which indicates positive adsorption of Sb in molten silicon and can be fairly described with the Szyszkowski's equation. The maximum decrease rate of surface tension is about 65 mN m(-1) (mass% C(Sb))(-1), and the temperature coefficient of surface tension, (partial differential sigma/ partial differential T)C(Sb), increases with increasing C(Sb). The evaporation of the systems was only observed between the melting points of antimony (904 K) and silicon (1683 K), and the surface tension presents no dependence on measuring time above the melting point of silicon. 相似文献
75.
本文报道了K2PtCl6与兔肝Zn7MT-Ⅱ和apoMT-Ⅱ的反应包含一个氧化还原反应和一个取代反应。通过紫外可见光谱、园二向色谱、柱层析和X-光电子能谱研究了该反应的性质、铂在反应产物中的键合位置和氧化态。金属硫蛋白(MT)被氧化成单体、双聚和多聚产物,其中含有分子间和分子内CyS-SCy二硫键。Pt(Ⅳ)被还原成Pt(Ⅱ)然后键合于产物中。随着K2PtCl6与MT的反应摩尔比和反应时间的增加,键合于产物中的Pt(Ⅱ)的计量数增加而蛋白中所含Zn(Ⅱ)的量减少。当Zn7MT与4和超过10摩尔的K2PtCl6反应时,分别得到了Pt4Zn4MT和Pt8MT。当apoMT与7及超过25倍的K2PtCl6在pH 2条件下反应时,分别得到了Pt7MT和Pt15MT。动力学数据表明K2PtCl6与apoMT的反应比与Zn7MT的反应快。 相似文献
76.
Kinetic study on the cleavage of N‐phenylphthalimide (NPhPT) in the presence of 0.05 M NH2NH2 and mixed H2O‐CH3CN solvents reveals the occurrence of reaction scheme where A, B, C, C1, An, E, and F represent NPhPT, o‐CO?2C6H4CONHC6H5, o‐CONHNH2C6H4‐ CONHC6H5, N‐aminophthalimide, aniline, o‐CO?2C6H4CONHNH2, and o‐CONHNH2C6H4‐CONHNH2, respectively. But, in the presence of either nonbuffered ?0.20 M NH2NH2 hydrazine buffer of pH ~7.30–8.26 with total buffer concentration ([Buf]T) of >0.02 M, further conversion of F to 2,3‐dihydrophthalazine‐1,4‐dione (DHPD) has been detected depending upon the length of the reaction time (t), the values of [Buf]T, and pH. It has been shown that the rate of conversion of C1 to F is much faster than that of C to C1 which is much faster than that of F to DHPD. The reaction step A → C involves general base (GB) catalysis, while step C → C1 seems to involve specific base–general acid (GA) and GB‐GB catalysis. © 2005 Wiley Periodicals, Inc. Int J Chem Kinet 37: 147–161, 2005 相似文献
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Bai JZ Bardon O Blum I Breakstone A Burnett T Chen GP Chen HF Chen J Chen SJ Chen SM Chen Y Chen YB Chen YQ Cheng BS Cowan RF Cui HC Cui XZ Ding HL Du ZZ Dunwoodie W Fan XL Fang J Fero M Gao CS Gao ML Gao SQ Gao WX Gratton P Gu JH Gu SD Gu WX Gu YF Guo YN Han SW Han Y Harris FA Hatanaka M He J He KR He M Hitlin DG Hu GY Hu HB Hu T Hu XQ Huang DQ Huang YZ Izen JM Jia QP Jiang CH Jin Y Jones L Kang SH Kelsey MH Kim BK Lai YF Lan HB Lang PF Lankford A Li F Li J Li PQ Li Q Li RB 《Physical review D: Particles and fields》1995,52(7):3781-3784
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